BR112017015636A2 - processo para produção de laminados orgânico-inorgânicos flexíveis. - Google Patents

processo para produção de laminados orgânico-inorgânicos flexíveis.

Info

Publication number
BR112017015636A2
BR112017015636A2 BR112017015636A BR112017015636A BR112017015636A2 BR 112017015636 A2 BR112017015636 A2 BR 112017015636A2 BR 112017015636 A BR112017015636 A BR 112017015636A BR 112017015636 A BR112017015636 A BR 112017015636A BR 112017015636 A2 BR112017015636 A2 BR 112017015636A2
Authority
BR
Brazil
Prior art keywords
flexible organic
inorganic
production
laminates
inorganic laminates
Prior art date
Application number
BR112017015636A
Other languages
English (en)
Inventor
Frank Juergen
Ahlf Maraike
KLOTZ Stephan
ADERMANN Torben
Original Assignee
Basf Coatings Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP15151839.6A external-priority patent/EP3048185A1/en
Application filed by Basf Coatings Gmbh filed Critical Basf Coatings Gmbh
Publication of BR112017015636A2 publication Critical patent/BR112017015636A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45534—Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/30—Organic light-emitting transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Wrappers (AREA)

Abstract

processo para produção de laminados orgânico-inorgânicos flexíveis. a presente invenção encontra-se na área de processos para produção de laminados orgânicos/inorgânicos flexíveis, bem como películas de barreira que compreendem laminados orgânicos/inorgânicos flexíveis por meio de depósito de camada atômica. em particular, a presente invenção se refere a um processo para a produção de um laminado que compreende: (a) depósito de uma camada inorgânica por meio de um processo de depósito de camada atômica, e (b) depósito de uma camada orgânica que compreende selênio por meio de um processo de depósito de camada molecular.
BR112017015636A 2015-01-20 2015-12-22 processo para produção de laminados orgânico-inorgânicos flexíveis. BR112017015636A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15151839.6A EP3048185A1 (en) 2015-01-20 2015-01-20 Process for producing flexible organic-inorganic laminates
EP15161121 2015-03-26
PCT/EP2015/080988 WO2016116245A1 (en) 2015-01-20 2015-12-22 Process for producing flexible organic-inorganic laminates

Publications (1)

Publication Number Publication Date
BR112017015636A2 true BR112017015636A2 (pt) 2018-03-13

Family

ID=55027749

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017015636A BR112017015636A2 (pt) 2015-01-20 2015-12-22 processo para produção de laminados orgânico-inorgânicos flexíveis.

Country Status (12)

Country Link
US (1) US10988844B2 (pt)
EP (1) EP3247819A1 (pt)
JP (2) JP2018505968A (pt)
KR (1) KR20170103827A (pt)
CN (1) CN107208265B (pt)
BR (1) BR112017015636A2 (pt)
CA (1) CA2971016A1 (pt)
MX (1) MX2017009473A (pt)
RU (1) RU2736197C2 (pt)
SG (1) SG11201705023SA (pt)
TW (1) TW201708610A (pt)
WO (1) WO2016116245A1 (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102439664B1 (ko) * 2014-06-12 2022-09-02 바스프 코팅스 게엠베하 가요성 유기물-무기물 라미네이트의 제조 방법
CA2971016A1 (en) 2015-01-20 2016-07-28 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
US11286561B2 (en) 2015-03-25 2022-03-29 Basf Coatings Gmbh Process for producing flexible organic-inorganic laminates
EP3531462A1 (en) * 2018-02-23 2019-08-28 BASF Coatings GmbH Transparent conductive film
CN108666421A (zh) * 2018-05-23 2018-10-16 京东方科技集团股份有限公司 柔性基底、有机电致发光二极管显示基板和显示装置

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Also Published As

Publication number Publication date
CN107208265A (zh) 2017-09-26
KR20170103827A (ko) 2017-09-13
US10988844B2 (en) 2021-04-27
JP2018505968A (ja) 2018-03-01
MX2017009473A (es) 2017-11-02
JP2021091969A (ja) 2021-06-17
RU2017129456A (ru) 2019-02-22
TW201708610A (zh) 2017-03-01
US20180010249A1 (en) 2018-01-11
EP3247819A1 (en) 2017-11-29
CA2971016A1 (en) 2016-07-28
CN107208265B (zh) 2021-03-23
RU2736197C2 (ru) 2020-11-12
SG11201705023SA (en) 2017-07-28
WO2016116245A1 (en) 2016-07-28
RU2017129456A3 (pt) 2019-07-17

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Legal Events

Date Code Title Description
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]