|
US9927718B2
(en)
*
|
2010-08-03 |
2018-03-27 |
Kla-Tencor Corporation |
Multi-layer overlay metrology target and complimentary overlay metrology measurement systems
|
|
US10890436B2
(en)
|
2011-07-19 |
2021-01-12 |
Kla Corporation |
Overlay targets with orthogonal underlayer dummyfill
|
|
NL2011477A
(en)
*
|
2012-10-10 |
2014-04-14 |
Asml Netherlands Bv |
Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method.
|
|
WO2014062972A1
(en)
*
|
2012-10-18 |
2014-04-24 |
Kla-Tencor Corporation |
Symmetric target design in scatterometry overlay metrology
|
|
WO2015018625A1
(en)
|
2013-08-07 |
2015-02-12 |
Asml Netherlands B.V. |
Metrology method and apparatus, lithographic system and device manufacturing method
|
|
SG11201703585RA
(en)
*
|
2014-11-25 |
2017-06-29 |
Kla Tencor Corp |
Analyzing and utilizing landscapes
|
|
KR102109059B1
(ko)
|
2014-11-26 |
2020-05-12 |
에이에스엠엘 네델란즈 비.브이. |
계측 방법, 컴퓨터 제품 및 시스템
|
|
JP6510658B2
(ja)
|
2015-02-04 |
2019-05-08 |
エーエスエムエル ネザーランズ ビー．ブイ． |
メトロロジの方法及び装置、コンピュータプログラム、並びにリソグラフィシステム
|
|
KR102028712B1
(ko)
|
2015-04-10 |
2019-10-04 |
에이에스엠엘 네델란즈 비.브이. |
검사와 계측을 위한 방법 및 장치
|
|
JP6524256B2
(ja)
*
|
2015-04-21 |
2019-06-05 |
エーエスエムエル ネザーランズ ビー．ブイ． |
メトロロジ方法及び装置、コンピュータプログラム、並びにリソグラフィシステム
|
|
TWI656409B
(zh)
*
|
2015-09-09 |
2019-04-11 |
美商克萊譚克公司 |
基於輔助電磁場之引入之一階散射測量疊加之新方法
|
|
CN108028210B
(zh)
*
|
2015-09-21 |
2022-07-12 |
科磊股份有限公司 |
用于使用灵活取样的过程控制的方法及系统
|
|
WO2017108453A1
(en)
|
2015-12-24 |
2017-06-29 |
Asml Netherlands B.V. |
Methods of controlling a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus
|
|
CN108700824B
(zh)
|
2016-02-19 |
2021-02-02 |
Asml荷兰有限公司 |
测量结构的方法、检查设备、光刻系统、器件制造方法和其中使用的波长选择滤光器
|
|
KR102188711B1
(ko)
*
|
2016-02-26 |
2020-12-09 |
에이에스엠엘 네델란즈 비.브이. |
구조체를 측정하는 방법, 검사 장치, 리소그래피 시스템 및 디바이스 제조 방법
|
|
US12142535B2
(en)
|
2016-03-01 |
2024-11-12 |
Asml Netherlands B.V. |
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
|
|
CN109073992B
(zh)
*
|
2016-04-22 |
2021-09-28 |
Asml荷兰有限公司 |
堆叠差异的确定和使用堆叠差异的校正
|
|
US10115621B2
(en)
|
2016-05-13 |
2018-10-30 |
Globalfoundries Inc. |
Method for in-die overlay control using FEOL dummy fill layer
|
|
KR102201794B1
(ko)
*
|
2016-06-10 |
2021-01-13 |
아이엠이씨 브이제트더블유 |
반도체 제조 프로세스를 위한 계측 방법 및 장치
|
|
KR102221760B1
(ko)
|
2016-07-15 |
2021-03-04 |
에이에스엠엘 네델란즈 비.브이. |
메트롤로지 타겟 필드의 디자인을 위한 장치 및 방법
|
|
US10048132B2
(en)
|
2016-07-28 |
2018-08-14 |
Kla-Tencor Corporation |
Simultaneous capturing of overlay signals from multiple targets
|
|
EP3293574A1
(en)
|
2016-09-09 |
2018-03-14 |
ASML Netherlands B.V. |
Metrology method, apparatus and computer program
|
|
IL265585B
(en)
|
2016-09-27 |
2022-09-01 |
Asml Netherlands Bv |
Metrology recipe selection
|
|
EP3299890A1
(en)
|
2016-09-27 |
2018-03-28 |
ASML Netherlands B.V. |
Metrology recipe selection
|
|
CN110140087B
(zh)
*
|
2016-11-10 |
2021-08-13 |
Asml荷兰有限公司 |
使用叠层差异的设计和校正
|
|
EP3333631A1
(en)
|
2016-12-06 |
2018-06-13 |
ASML Netherlands B.V. |
Method of measuring a target, metrology apparatus, polarizer assembly
|
|
EP3333632A1
(en)
|
2016-12-08 |
2018-06-13 |
ASML Netherlands B.V. |
Metrology apparatus
|
|
US10983005B2
(en)
|
2016-12-15 |
2021-04-20 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Spectroscopic overlay metrology
|
|
EP3336607A1
(en)
|
2016-12-16 |
2018-06-20 |
ASML Netherlands B.V. |
Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method
|
|
EP3358413A1
(en)
*
|
2017-02-02 |
2018-08-08 |
ASML Netherlands B.V. |
Metrology method, apparatus and computer program
|
|
US10656535B2
(en)
*
|
2017-03-31 |
2020-05-19 |
Imec Vzw |
Metrology method for a semiconductor manufacturing process
|
|
WO2018197198A1
(en)
|
2017-04-28 |
2018-11-01 |
Asml Netherlands B.V. |
Metrology method and apparatus and associated computer program
|
|
WO2018202388A1
(en)
|
2017-05-03 |
2018-11-08 |
Asml Netherlands B.V. |
Metrology parameter determination and metrology recipe selection
|
|
EP3399371A1
(en)
*
|
2017-05-05 |
2018-11-07 |
ASML Netherlands B.V. |
Method of measuring a parameter of interest, device manufacturing method, metrology apparatus, and lithographic system
|
|
KR102432667B1
(ko)
|
2017-05-15 |
2022-08-17 |
삼성전자주식회사 |
오버레이 보정방법 및 제어 시스템
|
|
EP3422103A1
(en)
|
2017-06-26 |
2019-01-02 |
ASML Netherlands B.V. |
Method of determining a performance parameter of a process
|
|
EP3422105A1
(en)
*
|
2017-06-30 |
2019-01-02 |
ASML Netherlands B.V. |
Metrology parameter determination and metrology recipe selection
|
|
EP3435162A1
(en)
|
2017-07-28 |
2019-01-30 |
ASML Netherlands B.V. |
Metrology method and apparatus and computer program
|
|
EP3454126A1
(en)
*
|
2017-09-08 |
2019-03-13 |
ASML Netherlands B.V. |
Method for estimating overlay
|
|
KR102390687B1
(ko)
*
|
2017-09-11 |
2022-04-26 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 프로세스들에서의 계측
|
|
EP3462239A1
(en)
*
|
2017-09-27 |
2019-04-03 |
ASML Netherlands B.V. |
Metrology in lithographic processes
|
|
EP3457211A1
(en)
*
|
2017-09-13 |
2019-03-20 |
ASML Netherlands B.V. |
A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus
|
|
WO2019057578A1
(en)
|
2017-09-22 |
2019-03-28 |
Asml Netherlands B.V. |
METHOD FOR DETERMINING A PARAMETER OF PATTERN CREATION PROCESS
|
|
EP3460574A1
(en)
|
2017-09-22 |
2019-03-27 |
ASML Netherlands B.V. |
Method to determine a patterning process parameter
|
|
US10795268B2
(en)
|
2017-09-29 |
2020-10-06 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method and apparatus for measuring overlay errors using overlay measurement patterns
|
|
WO2019081211A1
(en)
*
|
2017-10-26 |
2019-05-02 |
Asml Netherlands B.V. |
METHOD FOR DETERMINING A VALUE OF A PARAMETER OF INTEREST, METHOD FOR CLEANING A SIGNAL CONTAINING INFORMATION REGARDING THIS PARAMETER OF INTEREST
|
|
EP3492985A1
(en)
*
|
2017-12-04 |
2019-06-05 |
ASML Netherlands B.V. |
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
|
|
US10705435B2
(en)
|
2018-01-12 |
2020-07-07 |
Globalfoundries Inc. |
Self-referencing and self-calibrating interference pattern overlay measurement
|
|
EP3518040A1
(en)
|
2018-01-30 |
2019-07-31 |
ASML Netherlands B.V. |
A measurement apparatus and a method for determining a substrate grid
|
|
CN112005157B
(zh)
*
|
2018-02-27 |
2023-03-03 |
Asml荷兰有限公司 |
用于确定衬底上的一个或更多个结构的特性的量测设备和方法
|
|
NL2021848A
(en)
|
2018-04-09 |
2018-11-06 |
Stichting Vu |
Holographic metrology apparatus.
|
|
EP3557327A1
(en)
*
|
2018-04-18 |
2019-10-23 |
ASML Netherlands B.V. |
Method of determining a value of a parameter of interest of a target formed by a patterning process
|
|
WO2019233738A1
(en)
|
2018-06-08 |
2019-12-12 |
Asml Netherlands B.V. |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
|
|
EP3579052A1
(en)
|
2018-06-08 |
2019-12-11 |
ASML Netherlands B.V. |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
|
|
EP3605230A1
(en)
|
2018-08-01 |
2020-02-05 |
Stichting VU |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
|
|
NL2021852A
(en)
|
2018-08-01 |
2018-11-09 |
Asml Netherlands Bv |
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
|
|
WO2020058388A1
(en)
|
2018-09-19 |
2020-03-26 |
Asml Netherlands B.V. |
Metrology method and apparatus thereof
|
|
CN113260924B
(zh)
|
2018-12-31 |
2025-02-18 |
Asml荷兰有限公司 |
用于重叠量测的方法及其设备
|
|
CN113227908B
(zh)
|
2018-12-31 |
2024-08-02 |
Asml荷兰有限公司 |
量测方法
|
|
EP3731018A1
(en)
|
2019-04-23 |
2020-10-28 |
ASML Netherlands B.V. |
A method for re-imaging an image and associated metrology apparatus
|
|
KR102841633B1
(ko)
|
2019-07-10 |
2025-07-31 |
삼성전자주식회사 |
오버레이 보정 방법, 및 그 보정 방법을 기초로 한 포토리소그라피 방법, 반도체 소자 제조방법 및 스캐너 시스템
|
|
EP3770682A1
(en)
|
2019-07-25 |
2021-01-27 |
ASML Netherlands B.V. |
Method and system for determining information about a target structure
|
|
WO2021028174A1
(en)
|
2019-08-14 |
2021-02-18 |
Asml Netherlands B.V. |
Method and metrology tool for determining information about a target structure, and cantilever probe
|
|
JP7611921B2
(ja)
|
2019-12-17 |
2025-01-10 |
エーエスエムエル ネザーランズ ビー．ブイ． |
暗視野デジタルホログラフィ顕微鏡および関連する計測方法
|
|
EP3839635A1
(en)
|
2019-12-17 |
2021-06-23 |
ASML Netherlands B.V. |
Dark field digital holographic microscope and associated metrology method
|
|
EP3876036A1
(en)
|
2020-03-04 |
2021-09-08 |
ASML Netherlands B.V. |
Vibration isolation system and associated applications in lithography
|
|
WO2021210052A1
(ja)
*
|
2020-04-13 |
2021-10-21 |
株式会社ニコン |
計測装置、露光装置、および計測方法
|
|
US12429781B2
(en)
|
2020-06-24 |
2025-09-30 |
Asml Netherlands B.V. |
Metrology method and associated metrology and lithographic apparatuses
|
|
WO2022008135A1
(en)
*
|
2020-07-09 |
2022-01-13 |
Asml Netherlands B.V. |
Metrology method and apparatus and computer program
|
|
EP3964892A1
(en)
|
2020-09-02 |
2022-03-09 |
Stichting VU |
Illumination arrangement and associated dark field digital holographic microscope
|
|
US20240020575A1
(en)
*
|
2020-11-30 |
2024-01-18 |
Nec Corporation |
Information processing device, information processing method, and recording medium
|
|
EP4224254A1
(en)
|
2022-02-04 |
2023-08-09 |
ASML Netherlands B.V. |
Metrology method and associated metrology device
|
|
WO2023174648A1
(en)
|
2022-03-18 |
2023-09-21 |
Stichting Vu |
Illumination arrangement for a metrology device and associated method
|
|
EP4246231A1
(en)
|
2022-03-18 |
2023-09-20 |
Stichting VU |
A method for determining a vertical position of a structure on a substrate and associated apparatuses
|
|
EP4246232A1
(en)
|
2022-03-18 |
2023-09-20 |
Stichting VU |
Illumination arrangement for a metrology device and associated method
|
|
CN114678282B
(zh)
*
|
2022-05-27 |
2022-08-02 |
湖北三维半导体集成创新中心有限责任公司 |
一种键合补偿方法及装置、芯片再布线方法、键合结构
|
|
EP4318131A1
(en)
|
2022-08-01 |
2024-02-07 |
ASML Netherlands B.V. |
Sensor module, illuminator, metrology device and associated metrology method
|
|
EP4332678A1
(en)
|
2022-09-05 |
2024-03-06 |
ASML Netherlands B.V. |
Holographic metrology apparatus and method
|
|
WO2025131523A1
(en)
|
2023-12-21 |
2025-06-26 |
Asml Netherlands B.V. |
Metrology method for a digital holographic microscope and associated computer program
|
|
WO2025203521A1
(ja)
*
|
2024-03-28 |
2025-10-02 |
株式会社ニコン |
マーク計測方法、計測装置、露光装置、演算装置、プログラム及び記憶媒体
|
|
WO2025233088A1
(en)
|
2024-05-08 |
2025-11-13 |
Asml Netherlands B.V. |
Semiconductor bonding alignment systems and methods
|
|
CN118299285B
(zh)
*
|
2024-06-06 |
2024-08-16 |
华芯程(杭州)科技有限公司 |
多重图形蚀刻补偿方法、装置、介质、程序产品及终端
|
|
WO2025261742A1
(en)
|
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2025-12-26 |
Stichting Nederlandse Wetenschappelijk Onderzoek Instituten |
Method of improving an image
|
|
WO2026017503A1
(en)
|
2024-07-17 |
2026-01-22 |
Stichting Nederlandse Wetenschappelijk Onderzoek Instituten |
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|
|
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(en)
|
2024-10-18 |
2026-04-23 |
Stichting Vu |
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|
|
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(en)
|
2024-10-23 |
2026-04-29 |
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|