JP2015038985A5 - - Google Patents

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Publication number
JP2015038985A5
JP2015038985A5 JP2014147560A JP2014147560A JP2015038985A5 JP 2015038985 A5 JP2015038985 A5 JP 2015038985A5 JP 2014147560 A JP2014147560 A JP 2014147560A JP 2014147560 A JP2014147560 A JP 2014147560A JP 2015038985 A5 JP2015038985 A5 JP 2015038985A5
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JP
Japan
Prior art keywords
substrate
detection unit
lithographic apparatus
mark
marks
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JP2014147560A
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English (en)
Japanese (ja)
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JP6391337B2 (ja
JP2015038985A (ja
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Priority to JP2014147560A priority Critical patent/JP6391337B2/ja
Priority claimed from JP2014147560A external-priority patent/JP6391337B2/ja
Publication of JP2015038985A publication Critical patent/JP2015038985A/ja
Publication of JP2015038985A5 publication Critical patent/JP2015038985A5/ja
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Publication of JP6391337B2 publication Critical patent/JP6391337B2/ja
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JP2014147560A 2013-07-19 2014-07-18 リソグラフィ装置、リソグラフィ方法、および物品の製造方法 Active JP6391337B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014147560A JP6391337B2 (ja) 2013-07-19 2014-07-18 リソグラフィ装置、リソグラフィ方法、および物品の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013150721 2013-07-19
JP2013150721 2013-07-19
JP2014147560A JP6391337B2 (ja) 2013-07-19 2014-07-18 リソグラフィ装置、リソグラフィ方法、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015038985A JP2015038985A (ja) 2015-02-26
JP2015038985A5 true JP2015038985A5 (enExample) 2017-08-17
JP6391337B2 JP6391337B2 (ja) 2018-09-19

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Family Applications (1)

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JP2014147560A Active JP6391337B2 (ja) 2013-07-19 2014-07-18 リソグラフィ装置、リソグラフィ方法、および物品の製造方法

Country Status (2)

Country Link
US (1) US9703214B2 (enExample)
JP (1) JP6391337B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111610696A (zh) 2015-02-23 2020-09-01 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
CN111176084B (zh) 2015-02-23 2023-07-28 株式会社尼康 测量装置、曝光装置、光刻系统、测量方法及曝光方法
KR102688211B1 (ko) 2015-02-23 2024-07-24 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 디바이스 제조 방법
JP6700932B2 (ja) * 2016-04-20 2020-05-27 キヤノン株式会社 検出装置、検出方法、プログラム、リソグラフィ装置、および物品製造方法
US10554684B2 (en) * 2017-03-29 2020-02-04 Juniper Networks, Inc. Content-based optimization and pre-fetching mechanism for security analysis on a network device
IT201700079201A1 (it) * 2017-07-13 2019-01-13 Lfoundry Srl Metodo di allineamento di maschere fotolitografiche e relativo procedimento di fabbricazione di circuiti integrati in una fetta di materiale semiconduttore
JP6688273B2 (ja) * 2017-11-13 2020-04-28 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、決定方法及び物品の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267824A (ja) * 1993-03-15 1994-09-22 Nikon Corp 露光方法
US5521036A (en) * 1992-07-27 1996-05-28 Nikon Corporation Positioning method and apparatus
JP3259341B2 (ja) * 1992-07-27 2002-02-25 株式会社ニコン 位置合わせ方法、及びその位置合わせ方法を用いた露光方法、及びその露光方法を用いたデバイス製造方法
JPH10284396A (ja) * 1997-04-03 1998-10-23 Nikon Corp アライメント方法及び重ね合わせ精度計測方法
JPH1154407A (ja) * 1997-08-05 1999-02-26 Nikon Corp 位置合わせ方法
KR20010109212A (ko) * 2000-05-31 2001-12-08 시마무라 테루오 평가방법, 위치검출방법, 노광방법 및 디바이스 제조방법,및 노광장치
JP4905617B2 (ja) * 2001-05-28 2012-03-28 株式会社ニコン 露光方法及びデバイス製造方法
JP2001345243A (ja) * 2000-05-31 2001-12-14 Nikon Corp 評価方法、位置検出方法、露光方法及びデバイス製造方法
JP2003092252A (ja) * 2001-09-18 2003-03-28 Canon Inc 半導体露光方法および半導体露光装置
JP5062933B2 (ja) 2001-09-25 2012-10-31 キヤノン株式会社 露光装置、位置合わせ方法、プログラム、コンピュータ可読媒体、デバイスの製造方法
US20050099628A1 (en) * 2002-03-29 2005-05-12 Nikon Corporation Mark for position detection, mark identification method, position detection method, exposure method, and positional information detection method
US7259828B2 (en) * 2004-05-14 2007-08-21 Asml Netherlands B.V. Alignment system and method and device manufactured thereby
JP2007115758A (ja) * 2005-10-18 2007-05-10 Nikon Corp 露光方法及び露光装置

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