JP2013535819A5 - - Google Patents

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Publication number
JP2013535819A5
JP2013535819A5 JP2013520058A JP2013520058A JP2013535819A5 JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5 JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013520058 A JP2013520058 A JP 2013520058A JP 2013535819 A5 JP2013535819 A5 JP 2013535819A5
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Japan
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model
overlay error
asymmetry
model structure
target
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JP2013520058A
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Japanese (ja)
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JP6008851B2 (ja
JP2013535819A (ja
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Priority claimed from PCT/EP2011/061822 external-priority patent/WO2012010458A1/en
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Publication of JP2013535819A5 publication Critical patent/JP2013535819A5/ja
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JP2013520058A 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置 Active JP6008851B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36553810P 2010-07-19 2010-07-19
US61/365,538 2010-07-19
PCT/EP2011/061822 WO2012010458A1 (en) 2010-07-19 2011-07-12 Method and apparatus for determining an overlay error

Publications (3)

Publication Number Publication Date
JP2013535819A JP2013535819A (ja) 2013-09-12
JP2013535819A5 true JP2013535819A5 (enExample) 2014-08-28
JP6008851B2 JP6008851B2 (ja) 2016-10-19

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JP2013520058A Active JP6008851B2 (ja) 2010-07-19 2011-07-12 オーバレイ誤差を決定する方法及び装置

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US (2) US8908147B2 (enExample)
JP (1) JP6008851B2 (enExample)
KR (1) KR101793538B1 (enExample)
CN (1) CN103003754B (enExample)
IL (2) IL223965A (enExample)
NL (1) NL2007088A (enExample)
TW (1) TWI430333B (enExample)
WO (1) WO2012010458A1 (enExample)

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CN107771271B (zh) * 2015-04-21 2020-11-06 Asml荷兰有限公司 量测方法和设备、计算机程序及光刻系统
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US9779202B2 (en) * 2015-06-22 2017-10-03 Kla-Tencor Corporation Process-induced asymmetry detection, quantification, and control using patterned wafer geometry measurements
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