JP2015534267A5 - - Google Patents

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JP2015534267A5
JP2015534267A5 JP2015531193A JP2015531193A JP2015534267A5 JP 2015534267 A5 JP2015534267 A5 JP 2015534267A5 JP 2015531193 A JP2015531193 A JP 2015531193A JP 2015531193 A JP2015531193 A JP 2015531193A JP 2015534267 A5 JP2015534267 A5 JP 2015534267A5
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Japan
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measurement
proportionality constant
measuring
quality
measured
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JP2015531193A
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Japanese (ja)
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JP2015534267A (ja
JP6215330B2 (ja
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Priority claimed from US13/834,915 external-priority patent/US9329033B2/en
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JP2015531193A 2012-09-05 2013-09-05 位置ずれ対象の不正確性を概算および補正するための方法 Active JP6215330B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US201261696963P 2012-09-05 2012-09-05
US201261697159P 2012-09-05 2012-09-05
US61/696,963 2012-09-05
US61/697,159 2012-09-05
US201361764441P 2013-02-13 2013-02-13
US61/764,441 2013-02-13
US201361766320P 2013-02-19 2013-02-19
US61/766,320 2013-02-19
US13/834,915 2013-03-15
US13/834,915 US9329033B2 (en) 2012-09-05 2013-03-15 Method for estimating and correcting misregistration target inaccuracy
PCT/US2013/058254 WO2014039674A1 (en) 2012-09-05 2013-09-05 Method for estimating and correcting misregistration target inaccuracy

Publications (3)

Publication Number Publication Date
JP2015534267A JP2015534267A (ja) 2015-11-26
JP2015534267A5 true JP2015534267A5 (enExample) 2016-10-20
JP6215330B2 JP6215330B2 (ja) 2017-10-18

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JP2015531193A Active JP6215330B2 (ja) 2012-09-05 2013-09-05 位置ずれ対象の不正確性を概算および補正するための方法

Country Status (6)

Country Link
US (1) US9329033B2 (enExample)
JP (1) JP6215330B2 (enExample)
KR (1) KR102000746B1 (enExample)
CN (1) CN104736962B (enExample)
TW (1) TWI591342B (enExample)
WO (1) WO2014039674A1 (enExample)

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CN110796107A (zh) * 2019-11-04 2020-02-14 南京北旨智能科技有限公司 电力巡检图像缺陷识别方法和系统、电力巡检无人机
US11487929B2 (en) 2020-04-28 2022-11-01 Kla Corporation Target design process for overlay targets intended for multi-signal measurements
KR20230027089A (ko) 2020-06-25 2023-02-27 케이엘에이 코포레이션 반도체 디바이스의 오정합 및 비대칭을 개선하기 위한 웨이블릿 시스템 및 방법
US12100574B2 (en) 2020-07-01 2024-09-24 Kla Corporation Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures
CN116157708A (zh) * 2020-07-20 2023-05-23 应用材料公司 光学装置和光学装置计量的方法
US11454894B2 (en) * 2020-09-14 2022-09-27 Kla Corporation Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof
US12020970B2 (en) 2021-09-22 2024-06-25 International Business Machines Corporation Metrology data correction
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TWI884023B (zh) * 2024-07-02 2025-05-11 創意電子股份有限公司 掃描捕捉限制的生成裝置及其生成方法

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