JP2016504214A - 無機粒子を含む保護コーティング層が積層されたガスバリヤ性フィルム - Google Patents
無機粒子を含む保護コーティング層が積層されたガスバリヤ性フィルム Download PDFInfo
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- JP2016504214A JP2016504214A JP2015544002A JP2015544002A JP2016504214A JP 2016504214 A JP2016504214 A JP 2016504214A JP 2015544002 A JP2015544002 A JP 2015544002A JP 2015544002 A JP2015544002 A JP 2015544002A JP 2016504214 A JP2016504214 A JP 2016504214A
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- XQMTUIZTZJXUFM-UHFFFAOYSA-N tetraethoxy silicate Chemical compound CCOO[Si](OOCC)(OOCC)OOCC XQMTUIZTZJXUFM-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- 125000005106 triarylsilyl group Chemical group 0.000 description 1
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Abstract
Description
基材層として厚さが約100μmであり、WVTR(Water Vapor Transmission rate)が約4g/m2.day程度であるポリカーボネートフィルムを用いた。前記基材層上にテトラエトキシオルソシリケート(tetraethoxy orthosilicate)50gと3−グリシドキシプロピルトリメトキシシラン(3−glycidoxypropyltrimethoxysilane)50gをエタノール150gに希釈して、水56.4g、0.1N、HCl、1.6gを添加して室温で1日間反応したゾル状態のコーティング組成物溶液をバーコーティング法でコーティングし、120℃で10分間熱硬化し、約0.6μmの厚さの平坦化コーティング層を形成した。
保護層の形成時に用いたコーティング液内でバインダーとシリカ粒子の合計重量を基準としたシリカ粒子の重量比が約60重量%となるようにしたこと以外は実施例1と同様の方法でガスバリヤ性フィルムを製造した。
保護層の形成時に、平均直径が約50nmである球状シリカ粒子を用いたことを除いては、実施例1と同様の方法でガスバリヤ性フィルムを製造した。
保護層の形成時に用いたコーティング液内でバインダーとシリカ粒子の合計重量を基準としたシリカ粒子の重量比が約40重量%となるようにしたこと以外は実施例1と同様の方法でガスバリヤ性フィルムを製造した。
バインダーとしてペンタエリスリトールトリアクリレート、3−イソシアネートプロピルトリエトキシシラン付加物(3−isocyanatopropyltriethoxysilane adduct)及び3−グリシドキシプロピルトリメトキシシラン(3−gylcidoxypropyltrimethoxysilane)を含み、開始剤としてはIrgacure127及びIrgacure250を含む(バインダーとシリカ粒子の合計重量を基準とした前記シリカ粒子の割合が約50重量%)バインダーを用いたことを除いては、実施例1と同様の方法でフィルムを製造した。
保護層の形成時にシリカ粒子を用いないことを除いては、実施例1と同様にガスバリヤ性フィルムを製造した。
保護層の形成時に用いたコーティング液内でバインダーとシリカ粒子の合計重量を基準としたシリカ粒子の重量比が約30重量%となるようにしたこと以外は実施例1と同様の方法でガスバリヤ性フィルムを製造した。
保護層の形成時に用いたコーティング液内でバインダーとシリカ粒子の合計重量を基準としたシリカ粒子の重量比が約80重量%となるようにしたこと以外は実施例1と同様の方法でガスバリヤ性フィルムを製造した。
前記実施例1〜4および比較例1〜3で製造したガスバリヤ性フィルムの水蒸気透過率、光透過度、およびヘイズを下記方法で測定した。
1)水蒸気透過率(WVTR):Aquatran Mode11を用いてASTM F1249の方法で100%の相対湿度で38℃で48時間測定した。
2)光透過度(Tt):Shimadzu社のUV−3600を用いて可視光線領域である380〜780nmの範囲で測定した。
3)ヘイズ(Haze):Murakami Color Research Laboratory社のHM−150で測定した。
11、21 保護層
12、22 バリヤ層
13、23 中間層
14、24 基材層
Claims (14)
- 基材層と、
前記基材層上に形成されているバリヤ層と、
前記バリヤ層上に前記バリヤ層と接して形成されていて、ナノ粒子及びバインダーを含み、前記ナノ粒子の割合が前記ナノ粒子と前記バインダーの合計重量を基準に40重量%〜70重量%である保護層とを含むガスバリヤ性フィルム。 - 前記ナノ粒子は球状ナノ粒子である請求項1に記載のガスバリヤ性フィルム。
- 前記ナノ粒子の平均直径が100nm以下である請求項1に記載のガスバリヤ性フィルム。
- 前記ナノ粒子は、シリカ粒子、アルミナ粒子、チタニア粒子、ジルコニア粒子、酸化アンチモン粒子または酸化亜鉛粒子である請求項1に記載のガスバリヤ性フィルム。
- 前記バインダーは、ラジカル硬化性化合物及びカチオン硬化性化合物からなる群から選択された一つ以上を含む請求項1に記載のガスバリヤ性フィルム。
- 前記保護層がラジカル開始剤またはカチオン開始剤をさらに含む請求項5に記載のガスバリヤ性フィルム。
- 前記保護層は、厚さが0.2μm〜2μmである請求項1に記載のガスバリヤ性フィルム。
- 前記バリヤ層は、SiO2、Al2O3、ZnO、ZnS、HfO2、HfON、AlN、又はSi3N4を含む請求項1に記載のガスバリヤ性フィルム。
- 前記バリヤ層は、原子層堆積層である請求項1に記載のガスバリヤ性フィルム。
- 前記バリヤ層は、厚さが2nm〜100nmである請求項1に記載のガスバリヤ性フィルム。
- 前記バリヤ層と前記基材層の間に中間層をさらに含む請求項1に記載のガスバリヤ性フィルム。
- 基材層上に形成されたバリヤ層上に、ナノ粒子及びバインダー前駆体を含み、前記ナノ粒子の割合が前記ナノ粒子と前記バインダー前駆体の合計重量を基準に40重量%〜70重量%であるコーティング層を前記バリヤ層と接するように形成して保護層を形成することを含むガスバリヤ性フィルムの製造方法。
- 前記バリヤ層は、原子層堆積方式で形成する請求項12に記載のガスバリヤ性フィルムの製造方法。
- 請求項1のガスバリヤ性フィルムを含む電子装置。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0137344 | 2012-11-29 | ||
KR20120137344 | 2012-11-29 | ||
PCT/KR2013/011041 WO2014084686A1 (ko) | 2012-11-29 | 2013-11-29 | 무기 입자를 포함하는 보호코팅층이 적층된 가스차단성 필름 |
KR1020130147869A KR101640643B1 (ko) | 2012-11-29 | 2013-11-29 | 무기 입자를 포함하는 보호코팅층이 적층된 가스차단성 필름 |
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JP6524702B2 (ja) | 2015-02-26 | 2019-06-05 | 凸版印刷株式会社 | ガスバリア性フィルムの製造方法及びガスバリア性フィルム |
JPWO2016167348A1 (ja) | 2015-04-16 | 2018-02-08 | 凸版印刷株式会社 | 積層体、及びガスバリアフィルム |
WO2017130617A1 (ja) * | 2016-01-25 | 2017-08-03 | 東レフィルム加工株式会社 | ガスバリアフィルム |
US20210325777A1 (en) * | 2020-04-20 | 2021-10-21 | Applied Materials, Inc. | Methods for increasing the refractive index of high-index nanoimprint lithography films |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007090803A (ja) * | 2005-09-30 | 2007-04-12 | Fujifilm Corp | ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子 |
US20080138538A1 (en) * | 2006-12-06 | 2008-06-12 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
JP2010511267A (ja) * | 2006-11-06 | 2010-04-08 | エージェンシー フォー サイエンス,テクノロジー アンド リサーチ | ナノ粒子カプセル封入バリアスタック |
JP2011020335A (ja) * | 2009-07-15 | 2011-02-03 | Dainippon Printing Co Ltd | ガスバリア性シート、ガスバリア性シートの製造方法、封止体、及び装置 |
JP2011511403A (ja) * | 2008-01-30 | 2011-04-07 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 電子構成素子を作製する方法および電子構成素子 |
JP2011073417A (ja) * | 2009-10-02 | 2011-04-14 | Konica Minolta Holdings Inc | バリアフィルム、バリアフィルムの製造方法及び有機光電変換素子 |
JP2011173261A (ja) * | 2010-02-23 | 2011-09-08 | Toppan Printing Co Ltd | ガスバリアフィルムおよびその製造方法 |
JP2011194653A (ja) * | 2010-03-18 | 2011-10-06 | Dainippon Printing Co Ltd | 防湿性積層体 |
JP2011194652A (ja) * | 2010-03-18 | 2011-10-06 | Dainippon Printing Co Ltd | 防湿性積層体 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US142362A (en) | 1873-09-02 | Improvement in animal-traps | ||
US3708225A (en) | 1971-06-09 | 1973-01-02 | Mbt Corp | Coated synthetic plastic lens |
US4177315A (en) | 1977-03-04 | 1979-12-04 | E. I. Du Pont De Nemours And Company | Coated Polymeric substrates |
US4229228A (en) * | 1978-10-04 | 1980-10-21 | American Optical Corporation | Coating composition |
US4198465A (en) | 1978-11-01 | 1980-04-15 | General Electric Company | Photocurable acrylic coated polycarbonate articles |
US4436851A (en) | 1978-11-30 | 1984-03-13 | General Electric Company | Silicone resin coating composition containing an ultraviolet light absorbing agent |
US4309319A (en) | 1978-11-30 | 1982-01-05 | General Electric Company | Silicone resin coating composition |
US4455205A (en) | 1981-06-01 | 1984-06-19 | General Electric Company | UV Curable polysiloxane from colloidal silica, methacryloyl silane, diacrylate, resorcinol monobenzoate and photoinitiator |
JP3788101B2 (ja) | 1998-04-24 | 2006-06-21 | 凸版印刷株式会社 | 紫外線カット性を有する透明性ガスバリア複合フィルム材料およびそれを用いた包装体 |
KR100677831B1 (ko) | 2000-01-27 | 2007-02-05 | 주식회사 새 한 | 경화피막이 적층된 디스플레이용 필름 |
DE60126353T2 (de) | 2001-08-07 | 2007-10-18 | Teijin Dupont Films Japan Ltd. | Biaxial orientierte schichtförmige polyesterfolie und folie mit harter überzugsschicht |
GB0208506D0 (en) | 2002-04-12 | 2002-05-22 | Dupont Teijin Films Us Ltd | Film coating |
DE10231856C5 (de) * | 2002-07-12 | 2014-06-12 | Krones Ag | Beschichteter Hohlkörper, Verfahren zu seiner Herstellung und die Verwendung einer Nanopartikel enthaltenden Zusammensetzung |
AU2003255336A1 (en) * | 2003-07-31 | 2005-03-16 | Krones Ag | Coated hollow body |
CN1922534A (zh) * | 2004-09-24 | 2007-02-28 | Lg化学株式会社 | 具有多层结构的用于lcd的光学补偿膜 |
US7575621B2 (en) * | 2005-01-14 | 2009-08-18 | Cabot Corporation | Separation of metal nanoparticles |
KR20070103204A (ko) * | 2006-04-18 | 2007-10-23 | 주식회사 동진쎄미켐 | 우수한 열전도도를 갖는 광경화성 수지 조성물 |
KR101284958B1 (ko) * | 2008-01-03 | 2013-07-10 | 주식회사 엘지화학 | 치수 안정성과 가스차단 특성이 우수한 다층 구조의플라스틱 기판 및 그 제조방법 |
AU2009234506B2 (en) * | 2008-04-09 | 2013-11-21 | Agency For Science, Technology And Research | Multilayer film for encapsulating oxygen and/or moisture sensitive electronic devices |
EP2437939B1 (en) * | 2009-06-02 | 2016-09-28 | Agency For Science, Technology And Research | Multilayer barrier film |
JP5334900B2 (ja) * | 2010-03-25 | 2013-11-06 | 富士フイルム株式会社 | ガスバリアフィルムおよびデバイス |
JP2012096432A (ja) * | 2010-11-01 | 2012-05-24 | Sony Corp | バリアフィルム及びその製造方法 |
JP2012136614A (ja) * | 2010-12-27 | 2012-07-19 | Three Bond Co Ltd | ガスバリア性光硬化型樹脂組成物 |
JP2012182303A (ja) * | 2011-03-01 | 2012-09-20 | Toppan Printing Co Ltd | 太陽電池バックシート |
JP2014198376A (ja) * | 2011-08-02 | 2014-10-23 | コニカミノルタ株式会社 | 機能性フィルム |
WO2014061279A1 (ja) * | 2012-10-19 | 2014-04-24 | 日本化薬株式会社 | 熱線遮蔽シート |
-
2013
- 2013-11-29 CN CN201380062623.5A patent/CN104903098B/zh active Active
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- 2013-11-29 WO PCT/KR2013/011041 patent/WO2014084686A1/ko active Application Filing
- 2013-11-29 TW TW102143973A patent/TWI501870B/zh active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007090803A (ja) * | 2005-09-30 | 2007-04-12 | Fujifilm Corp | ガスバリアフィルム、並びに、これを用いた画像表示素子および有機エレクトロルミネッセンス素子 |
JP2010511267A (ja) * | 2006-11-06 | 2010-04-08 | エージェンシー フォー サイエンス,テクノロジー アンド リサーチ | ナノ粒子カプセル封入バリアスタック |
US20080138538A1 (en) * | 2006-12-06 | 2008-06-12 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
JP2011511403A (ja) * | 2008-01-30 | 2011-04-07 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 電子構成素子を作製する方法および電子構成素子 |
JP2011020335A (ja) * | 2009-07-15 | 2011-02-03 | Dainippon Printing Co Ltd | ガスバリア性シート、ガスバリア性シートの製造方法、封止体、及び装置 |
JP2011073417A (ja) * | 2009-10-02 | 2011-04-14 | Konica Minolta Holdings Inc | バリアフィルム、バリアフィルムの製造方法及び有機光電変換素子 |
JP2011173261A (ja) * | 2010-02-23 | 2011-09-08 | Toppan Printing Co Ltd | ガスバリアフィルムおよびその製造方法 |
JP2011194653A (ja) * | 2010-03-18 | 2011-10-06 | Dainippon Printing Co Ltd | 防湿性積層体 |
JP2011194652A (ja) * | 2010-03-18 | 2011-10-06 | Dainippon Printing Co Ltd | 防湿性積層体 |
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KR20140070481A (ko) | 2014-06-10 |
EP2926991A4 (en) | 2016-05-25 |
CN104903098A (zh) | 2015-09-09 |
US20160281229A1 (en) | 2016-09-29 |
EP2926991B1 (en) | 2019-02-27 |
KR101640643B1 (ko) | 2016-07-18 |
CN104903098B (zh) | 2016-12-07 |
JP6108136B2 (ja) | 2017-04-05 |
US10882275B2 (en) | 2021-01-05 |
EP2926991A1 (en) | 2015-10-07 |
TW201438906A (zh) | 2014-10-16 |
TWI501870B (zh) | 2015-10-01 |
WO2014084686A1 (ko) | 2014-06-05 |
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