JP2016006859A - 圧電材料、圧電素子、および電子機器 - Google Patents
圧電材料、圧電素子、および電子機器 Download PDFInfo
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- JP2016006859A JP2016006859A JP2015102130A JP2015102130A JP2016006859A JP 2016006859 A JP2016006859 A JP 2016006859A JP 2015102130 A JP2015102130 A JP 2015102130A JP 2015102130 A JP2015102130 A JP 2015102130A JP 2016006859 A JP2016006859 A JP 2016006859A
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- Prior art keywords
- piezoelectric
- piezoelectric material
- piezoelectric element
- electrode
- present
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Images
Classifications
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Abstract
【解決手段】 下記一般式(1)で表わされるペロブスカイト型金属酸化物を含む主成分と、Mnよりなる第1副成分を有する圧電材料であって、前記Mnの含有量が前記金属酸化物1モルに対して0.002モル以上0.015モル以下であることを特徴とする圧電材料。
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3 (1)(式中、0.010≦x≦0.060、0.001≦y≦0.015、0.001≦z≦0.015、0.950≦y/z≦1.050、0.986≦a≦1.020)
【選択図】 図15
Description
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3 (1)
(式中、0.010≦x≦0.060、0.001≦y≦0.015、0.001≦z≦0.015、0.95≦y/z≦1.05、0.986≦a≦1.020)
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3 (1)
(式中、0.010≦x≦0.060、0.001≦y≦0.015、0.001≦z≦0.015、0.950≦y/z≦1.050、0.986≦a≦1.020)
本発明において、ペロブスカイト型金属酸化物とは、岩波理化学辞典 第5版(岩波書店 1998年2月20日発行)に記載されているような、理想的には立方晶構造であるペロブスカイト構造(ペロフスカイト構造とも言う)を持つ金属酸化物を指す。ペロブスカイト構造を持つ金属酸化物は一般にABO3の化学式で表現される。ペロブスカイト型金属酸化物において、元素A、Bは各々イオンの形でAサイト、Bサイトと呼ばれる単位格子の特定の位置を占める。例えば、立方晶系の単位格子であれば、A元素は立方体の頂点、B元素は体心に位置する。O元素は酸素の陰イオンとして立方体の面心位置を占める。
本発明の圧電材料は、前記一般式(1)の範囲のBiとFeを含有すると、圧電定数を損なわずに機械的品質係数が向上する。3価のBiは大部分がAサイト、一部分が結晶粒界に位置すると考えられる。Feは大部分がBサイト、一部分が結晶粒界に位置する。相対的にイオン半径が小さく、Bサイトに位置しやすいFeがBiとほぼ同量存在するため、BiはAサイトに優先的に位置することができる。
TtoおよびTCは試料の温度を変化させながらインピーダンスアナライザ(Agilent Techonologies社製 4194A)で静電容量を測定して求めることができる。同時に誘電正接の温度依存性もインピーダンスアナライザで測定し求めることができる。Ttoとは、結晶系が正方晶(tetragonal)から斜方晶(orthorhombic)に変化する温度である。試料を25℃から−60℃まで冷却しながら誘電率を測定し、誘電率を試料温度で微分した値が最大となる温度を求める事でTtoを決定することができる。TCはキュリー温度であり、強誘電相(正方晶相)と常誘電相(立方体晶相)の相転移温度近傍で誘電率が極大となる温度である。試料を加熱しながら誘電率を測定し、誘電率の値が極大となる温度を求める事で決定することができる。Ttoは、デバイス駆動温度範囲(−30℃から50℃)より低温であることが好ましいが、Ttoが低すぎるとデバイス駆動温度範囲内(−30℃から50℃)での圧電定数が充分でなくなる恐れがある。好ましいTtoの範囲は、−50℃以上−30℃以下である。またTCはデバイス駆動温度範囲(−30℃から50℃)より高温であることが好ましいが、素子化する時に必要な加熱工程を考慮すると、100℃以上であることが好ましい。
前記第1副成分はMnよりなる。前記Mnの含有量は前記ペロブスカイト型金属酸化物1モルに対して0.002モル以上0.015モル以下である。
本発明に係る圧電材料は、前記圧電材料がSiまたはBの少なくとも一方を含む第2副成分を有している。前記第2副成分の含有量が前記一般式(1)で表されるペロブスカイト型金属酸化物100重量部に対して金属換算で0.0010重量部以上4.0000重量部以下であることが好ましい。より好ましくは0.003重量部以上2.000重量部以下である。
本発明に係る圧電材料は、前記圧電材料を構成する結晶粒の平均円相当径が500nm以上10μm以下であることが好ましい。平均円相当径とは、複数の結晶粒の円相当径の平均値を示す。結晶粒の平均円相当径をこの範囲にすることで、本発明の圧電材料は、良好な圧電特性と機械的強度を有することが可能となる。平均円相当径が500nm未満であると、圧電特性が充分でなくなる恐れがある。一方で、10μmより大きくなると機械的強度が低下する恐れがある。より好ましい範囲は500nm以上4.5μm以下である。
本発明の圧電材料は、相対密度が93%以上100%以下であることが好ましい。
本発明に係る圧電材料の形態は限定されず、セラミックス、粉末、単結晶、スラリーなどのいずれの形態でも構わないが、セラミックスであることが好ましい。本明細書中において「セラミックス」とは、基本成分が金属酸化物であり、熱処理によって焼き固められた結晶粒子の凝集体(バルク体とも言う)、いわゆる多結晶を表す。焼結後に加工されたものも含まれる。
本発明に係る圧電材料の製造方法は特に限定されないが、以下に代表的な製造方法を説明する。
圧電材料を製造する場合は、構成元素を含んだ酸化物、炭酸塩、硝酸塩、蓚酸塩などの原料粉末から成形体を作り、その成形体を常圧下で焼結する一般的な手法を採用することができる。原料としては、Ba化合物、Bi化合物、Ti化合物、Zr化合物、Fe化合物、Mn化合物、B化合物とSi化合物等の金属化合物から構成される。
前記成形体とは、前記原料粉末を成形した固形物である。成形方法としては、一軸加圧加工、冷間静水圧加工、温間静水圧加工、鋳込成形と押し出し成形を挙げることができる。成形体を作製する際には、造粒粉を用いることが好ましい。造粒粉を用いた成形体を焼結すると、焼結体の結晶粒の大きさの分布が均一になり易いという利点がある。また、焼結体の絶縁性を上げるという観点で、前記成形体にはSiまたはBの少なくとも一方を含む第2副成分を含むことが好ましい。
前記成形体の焼結方法は特に限定されない。
図1は本発明の圧電素子の構成の一実施形態を示す概略図である。本発明に係る圧電素子は、第一の電極1、圧電材料部2および第二の電極3を少なくとも有する圧電素子であって、前記圧電材料部2を構成する圧電材料が本発明の圧電材料であることを特徴とする。
前記圧電素子は一定方向に分極軸が揃っているものであると、より好ましい。分極軸が一定方向に揃っていることで前記圧電素子の圧電定数は大きくなる。
前記圧電素子の圧電定数および機械的品質係数は、市販のインピーダンスアナライザを用いて得られる共振周波数及び反共振周波数の測定結果から、電子情報技術産業協会規格(JEITA EM−4501)に基づいて、計算により求めることができる。以下、この方法を共振−反共振法と呼ぶ。
次に、本発明の積層圧電素子について説明する。
次に、本発明の液体吐出ヘッドについて説明する。
次に、本発明の液体吐出装置について説明する。本発明の液体吐出装置は、被転写体の載置部と前記液体吐出ヘッドを備えたものである。
次に、本発明の超音波モータについて説明する。本発明に係る超音波モータは、前記圧電素子または前記積層圧電素子を配した振動体と、前記振動体と接触する移動体とを少なくとも有することを特徴とする。
次に、本発明の光学機器について説明する。本発明の光学機器は、駆動部に前記超音波モータを備えたことを特徴とする。
粒子、粉体、液滴の搬送、除去等で利用される振動装置は、電子機器等で広く使用されている。
次に、本発明の撮像装置について説明する。本発明の撮像装置は、前記塵埃除去装置と撮像素子ユニットとを少なくとも有する撮像装置であって、前記塵埃除去装置の振動板を前記撮像素子ユニットの受光面側に設けたことを特徴とする。図12および図13は本発明の撮像装置の好適な実施形態の一例であるデジタル一眼レフカメラを示す図である。
次に、本発明の電子機器について説明する。本発明の電子機器は、前記圧電素子または前記積層圧電素子を備えた圧電音響部品を配したことを特徴とする。圧電音響部品にはスピーカ、ブザー、マイク、表面弾性波(SAW)素子が含まれる。
(実施例1の圧電材料)
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3の一般式(1)にて表現される、以下の組成の圧電材料を作成した。
実施例1と同様の工程で、実施例2から実施例32の圧電材料を作製した。はじめにBa、Bi、Ti、Zr、Feが表1に示すような比率になるように各原料粉末を秤量した。AサイトにおけるBaおよびBiのモル量とBサイトにおけるTi、ZrおよびFeのモル量との比を示すaを調整するために炭酸バリウムおよび酸化チタンを用いた。次に、第1副成分のMnが金属換算で表1に示すような比率となるように二酸化マンガンを秤量した。その際、チタン酸バリウム、ジルコン酸バリウム、鉄酸ビスマス、炭酸バリウムおよび酸化チタンの秤量和(合算値)を(Ba1−yBiy)a(Ti1−x−zZrxFez)O3の化学式に換算した1モルに対し、二酸化マンガンを秤量した。
表1に示す主成分、第1副成分および第2副成分、BiとFeのモル比y/z、AサイトとBサイトとのモル比aの各比率及び焼結時の最高温度Tmaxの条件に従って実施例1から32と同様の工程で比較用の金属酸化物材料を作製した。
(Ba1−y’Cay’)a’TiO3の一般式(2)において、y’=0.100、a=1.004で表わされる組成(Ba0.900Ca0.100)0.990TiO3に相当する原料を以下で述べる要領で秤量した。
次に、本発明の圧電素子を作製した。
実施例1から32の圧電材料を用いて圧電素子を作製した。
次に、比較例1から比較例12の比較用の金属酸化物材料を用いて比較用の素子を実施例1から実施例32と同様の方法で作製および分極処理を行った。
実施例1から32の圧電材料を用いて作製した圧電素子と、比較例1から比較例12の金属酸化物材料を用いて作製した比較用の素子について評価した。
次に実施例14と30の圧電素子と、比較例2と11の比較用の素子を恒温槽に入れ、85℃24時間の高温耐久試験を実施した。高温耐久試験前後に室温(25℃)における圧電定数d31を評価し、高温耐久試験前後の|d31|の変化率を表4に示す。
次に実施例14および30の圧電素子と、比較例2と11の比較用の素子について、キュリー温度Tcを評価した。Tcは、測定温度を変えながら微小交流電界を用いて比誘電率を測定し、比誘電率が極大を示す温度から求めた。恒温槽を用いて、環境温度を一旦室温から5℃刻みで−60℃まで冷却した後に5℃刻みで110℃まで、110℃から2℃刻みで140℃まで変化させた。恒温槽の温度が一定になるよう、各温度で10分以上キープしてから前述の評価を行った。その結果を表4に示す。また、例として、実施例14の圧電素子の環境温度による比誘電率の変化を図15に示す。Tcが118℃、Ttoが−30℃であり、デバイス駆動温度範囲において、比誘電率の変化が小さい。実施例1から13及び実施例15から32の圧電素子についても同様に環境温度による比誘電率の変化を測定したところ、いずれの実施例の圧電素子もTcは101℃から127℃の範囲にあり、Ttoは−50℃から−30℃の範囲にあった。
次に、本発明の積層圧電素子を作製した。
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3の一般式(1)において以下の組成の化合物を作成した。すなわち、x=0.020、y=0.005、z=0.005、a=1.004で表わされる組成(Ba0.995Bi0.005)1.004(Ti0.975Zr0.020Fe0.005)O3に相当する原料を以下で述べる要領で秤量した。
実施例33と同様の工程で積層圧電素子を作製した。ただし、組成は比較例11と同様で、焼成温度は1300℃で、内部電極はAg95%−Pd5%合金(Ag/Pd=19)である。内部電極を走査型電子顕微鏡で観察した。その結果、内部電極は溶解し、島状に点在していた。よって、内部電極が導通していないので分極ができなかった。そのため、圧電特性を評価できなかった。
比較例13と同様に積層圧電素子を作製した。ただし、内部電極はAg5%−Pd95%合金(Ag/Pd=0.05)である。内部電極を走査型電子顕微鏡で観察した。電極材であるAg−Pdと圧電体層との境界に剥離が観られた。分極時に十分な電界が印加できなかったため、分極することができなかった。そのため、圧電特性を評価できなかった。
実施例33の積層圧電素子を用いて、図3に示される液体吐出ヘッドを作製した。入力した電気信号に追随したインクの吐出が確認された。
実施例34の液体吐出ヘッドを用いて、図4に示される液体吐出装置を作製した。入力した電気信号に追随したインクの吐出が被転写体上に確認された。
実施例33の積層圧電素子を用いて、図6(b)に示される超音波モータを作製した。交番電圧の印加に応じたモータの回転が確認された。
実施例36の超音波モータを用いて、図7に示される光学機器を作製した。交番電圧の印加に応じたオートフォーカス動作が確認された。
実施例33の積層圧電素子を用いて、図9に示される塵埃除去装置を作製した。プラスチック製ビーズを散布し、交番電圧を印加したところ、良好な塵埃除去率が確認された。
実施例38の塵埃除去装置を用いて、図12に示される撮像装置を作製した。動作させたところ、撮像ユニットの表面の塵を良好に除去し、塵欠陥の無い画像が得られた。
実施例33の積層圧電素子を用いて、図14に示される電子機器を作製した。交番電圧の印加に応じたスピーカ動作が確認された。
102 個別液室 103 振動板 104 液室隔壁 105 吐出口
106 連通孔107 共通液室 108 バッファ層 1011 第一の電極
1012 圧電材料 1013 第二の電極 201 振動子 202 ロータ
203 出力軸 204 振動子205 ロータ 206 バネ
2011 弾性体リング 2012 圧電素子 2013 有機系接着剤
2041 金属弾性体 2042 積層圧電素子 310 塵埃除去装置
330 圧電素子 320 振動板 330 圧電素子 331 圧電材料
332 第1の電極 333 第2の電極 336 第1の電極面
337 第2の電極面 310 塵埃除去装置320 振動板 330 圧電素子
51 第一の電極 53 第二の電極 54 圧電材料層 55 内部電極
56 積層体 501 第一の電極 503 第二の電極 504 圧電材料層
505a 内部電極 505b 内部電極 506a 外部電極
506b 外部電極 601 カメラ本体 602 マウント部
605 ミラーボックス 606 メインミラー 200 シャッタユニット
300 本体シャーシ 400 撮像ユニット 701 前群レンズ
702 後群レンズ(フォーカスレンズ) 711 着脱マウント
712 固定筒 713 直進案内筒 714 前群鏡筒 715 カム環
716 後群鏡筒 717 カムローラ 718 軸ビス 719 ローラ
720 回転伝達環 722 コロ 724 マニュアルフォーカス環
725 超音波モータ 726 波ワッシャ 727 ボールレース
728 フォーカスキー 729 接合部材 732 ワッシャ
733 低摩擦シート 881 液体吐出装置 882 外装 883 外装
884 外装 885 外装 887 外装 890 回復部 891 記録部
892 キャリッジ 896 装置本体 897 自動給送部 898 排出口
899 搬送部 901 光学装置 908 レリーズボタン
909 ストロボ発光部 912 スピーカ 914 マイク 916 補助光部
931 本体 932 ズームレバー 933 電源ボタン
Claims (17)
- 下記一般式(1)で表わされるペロブスカイト型金属酸化物を含む主成分と、Mnを含む第1副成分を有する圧電材料であって、前記Mnの含有量が前記金属酸化物1モルに対して0.002モル以上0.015モル以下であることを特徴とする圧電材料。
(Ba1−yBiy)a(Ti1−x−zZrxFez)O3 (1)
(式中、0.010≦x≦0.060、0.001≦y≦0.015、0.001≦z≦0.015、0.950≦y/z≦1.050、0.986≦a≦1.020) - 前記圧電材料がSiまたはBの少なくとも一方を含む第2副成分を有しており、前記第2副成分の含有量が前記一般式(1)で表されるペロブスカイト型金属酸化物100重量部に対して金属換算で0.0010重量部以上で、4.0000重量部以下であることを特徴とする請求項1に記載の圧電材料。
- 前記圧電材料を構成する結晶粒の平均円相当径が500nm以上10μm以下であることを特徴とする請求項1または2に記載の圧電材料。
- 前記圧電材料の相対密度が93%以上100%以下であることを特徴とする請求項1乃至3のいずれか一項に記載の圧電材料。
- 前記圧電材料の周波数1kHzにおける誘電正接が0.006以下であることを特徴とする請求項1乃至4のいずれか一項に記載の圧電材料。
- 第一の電極、圧電材料部および第二の電極を少なくとも有する圧電素子であって、前記圧電材料部を構成する圧電材料が請求項1乃至5のいずれか一項に記載の圧電材料であることを特徴とする圧電素子。
- 複数の圧電材料層と、内部電極を含む複数の電極層とが交互に積層された積層圧電素子であって、前記圧電材料層を構成する圧電材料が請求項1乃至5のいずれか一項に記載の圧電材料よりなることを特徴とする積層圧電素子。
- 前記内部電極がAgとPdを含み、前記Agの含有重量M1と前記Pdの含有重量M2との重量比M1/M2が0.25≦M1/M2≦4.0であることを特徴とする請求項7に記載の積層圧電素子。
- 前記内部電極がNiおよびCuの少なくともいずれか1種を含むことを特徴とする請求項7に記載の積層圧電素子。
- 請求項6に記載の圧電素子または請求項7乃至9のいずれか一項に記載の積層圧電素子を備えた振動部を備えた液室と、前記液室と連通する吐出口を少なくとも有することを特徴とする液体吐出ヘッド。
- 被転写体の載置部と請求項10に記載の液体吐出ヘッドを有することを特徴とする液体吐出装置。
- 請求項6に記載の圧電素子または請求項7乃至9のいずれか一項に記載の積層圧電素子を配した振動体と、前記振動体と接触している移動体とを少なくとも有することを特徴とする超音波モータ。
- 駆動部に請求項12に記載の超音波モータを備えた駆動部を有することを特徴とする光学機器。
- 請求項6に記載の圧電素子または請求項7乃至9のいずれか一項に記載の積層圧電素子を、振動板に配した振動体を有することを特徴とする振動装置。
- 請求項14に記載の振動装置を備えた振動部を有することを特徴とする塵埃除去装置。
- 請求項15に記載の塵埃除去装置と撮像素子ユニットとを少なくとも有する撮像装置であって、前記塵埃除去装置の振動板を前記撮像素子ユニットの受光面側に設けたことを特徴とする撮像装置。
- 請求項6に記載の圧電素子または請求項7乃至9のいずれか一項に記載の積層圧電素子を備えた圧電音響部品を有することを特徴とする電子機器。
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Publication number | Priority date | Publication date | Assignee | Title |
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US11545613B2 (en) | 2019-01-22 | 2023-01-03 | Tdk Corporation | Piezoelectric composition and piezoelectric device |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5418725B2 (ja) * | 2011-04-15 | 2014-02-19 | 株式会社村田製作所 | 圧電体薄膜素子 |
TWI550923B (zh) * | 2014-05-30 | 2016-09-21 | 佳能股份有限公司 | 壓電材料、壓電元件、壓電元件的製造方法和電子器件 |
KR20160095383A (ko) * | 2015-02-03 | 2016-08-11 | 삼성전기주식회사 | 유전체 조성물 및 이를 포함하는 적층 세라믹 커패시터 |
US9809720B2 (en) * | 2015-07-06 | 2017-11-07 | University Of Massachusetts | Ferroelectric nanocomposite based dielectric inks for reconfigurable RF and microwave applications |
EP3660109B1 (en) * | 2017-07-28 | 2023-12-27 | Sumitomo Chemical Company Limited | Ink composition, film, and display |
US10839992B1 (en) | 2019-05-17 | 2020-11-17 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
CN111333413B (zh) * | 2020-03-06 | 2021-08-06 | 中国科学院上海硅酸盐研究所 | 铁酸铋-钛酸铅-钛锡酸钡三元体系高温压电陶瓷材料及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005162587A (ja) * | 2002-12-18 | 2005-06-23 | Showa Denko Kk | チタン酸バリウムおよびそれを用いた電子部品 |
JP2009252789A (ja) * | 2008-04-01 | 2009-10-29 | Seiko Epson Corp | 圧電材料および圧電素子 |
JP2010043353A (ja) * | 2008-07-17 | 2010-02-25 | Fujifilm Corp | ペロブスカイト型酸化物、酸化物組成物、酸化物体、圧電素子、及び液体吐出装置 |
JP2013227199A (ja) * | 2012-03-30 | 2013-11-07 | Canon Inc | 圧電セラミックス、圧電セラミックスの製造方法、圧電素子および電子機器 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4988468A (en) * | 1987-01-08 | 1991-01-29 | Murata Manufacturing Co., Ltd. | Method for producing non-reducible dielectric ceramic composition |
JP3435607B2 (ja) * | 1992-05-01 | 2003-08-11 | 株式会社村田製作所 | 非還元性誘電体磁器組成物 |
JP3279856B2 (ja) * | 1995-02-14 | 2002-04-30 | ティーディーケイ株式会社 | 誘電体磁器組成物 |
JPH1160334A (ja) | 1997-08-11 | 1999-03-02 | Kyocera Corp | アクチュエータ用圧電磁器組成物 |
CN100341789C (zh) | 2002-12-18 | 2007-10-10 | 昭和电工株式会社 | 钛酸钡和使用该材料的电子元件 |
TWI228493B (en) * | 2002-12-18 | 2005-03-01 | Showa Denko Kk | Barium titanate and electronic parts using the same |
CN101848879B (zh) | 2007-11-06 | 2013-08-14 | 费罗公司 | 无铅无镉的、低温烧成的x7r介电陶瓷组合物及制备方法 |
JP5344456B2 (ja) * | 2008-03-11 | 2013-11-20 | 独立行政法人物質・材料研究機構 | 非鉛系圧電材料 |
JP5217997B2 (ja) * | 2008-10-20 | 2013-06-19 | Tdk株式会社 | 圧電磁器、振動子及び超音波モータ |
EP2414303B1 (en) | 2009-03-31 | 2016-03-30 | Canon Kabushiki Kaisha | Ceramic, piezoelectric device, and production method thereof |
JP5233922B2 (ja) | 2009-09-03 | 2013-07-10 | 株式会社ニコン | 振動アクチュエータ駆動装置、レンズ鏡筒、及び、光学装置 |
EP2328193B1 (en) * | 2009-11-30 | 2015-03-11 | Canon Kabushiki Kaisha | Piezoelectric ceramic, method for making the same, piezoelectric element, liquid discharge head, and ultrasonic motor |
JP5839157B2 (ja) | 2010-03-02 | 2016-01-06 | セイコーエプソン株式会社 | 液体噴射ヘッド、液体噴射装置、圧電素子、超音波センサー及び赤外センサー |
CN102473838B (zh) | 2010-04-15 | 2014-10-01 | 松下电器产业株式会社 | 压电体薄膜、喷墨头、使用喷墨头形成图像的方法、角速度传感器、使用角速度传感器测定角速度的方法、压电发电元件以及使用压电发电元件的发电方法 |
JP5676910B2 (ja) * | 2010-04-27 | 2015-02-25 | キヤノン株式会社 | セラミクスの製造方法および圧電材料 |
JP2011254610A (ja) * | 2010-06-02 | 2011-12-15 | Funai Electric Co Ltd | 超音波モータの駆動装置 |
KR101179295B1 (ko) | 2010-08-06 | 2012-09-03 | 삼성전기주식회사 | 내환원성 유전체 조성물 및 이를 포함하는 세라믹 전자 부품 |
WO2013005701A1 (en) | 2011-07-05 | 2013-01-10 | Canon Kabushiki Kaisha | Piezoelectric element, multilayered piezoelectric element, liquid discharge head, liquid discharge apparatus, ultrasonic motor, optical apparatus, and electronic apparatus |
WO2013147295A2 (en) * | 2012-03-30 | 2013-10-03 | Canon Kabushiki Kaisha | Piezoelectric ceramics, piezoelectric element, liquid ejection head, ultrasonic motor, and dust removing device |
TWI581472B (zh) | 2012-11-02 | 2017-05-01 | 佳能股份有限公司 | 壓電材料、壓電元件、及電子裝置 |
EP2749550B1 (en) * | 2012-12-28 | 2017-05-17 | Canon Kabushiki Kaisha | Piezoelectric material, piezoelectric element, and electronic apparatus |
CN104956507A (zh) * | 2013-01-29 | 2015-09-30 | 佳能株式会社 | 压电材料、压电元件和电子设备 |
TW201442983A (zh) * | 2013-01-29 | 2014-11-16 | Canon Kk | 壓電材料,壓電裝置,及電子儀器 |
JP6381294B2 (ja) * | 2013-07-12 | 2018-08-29 | キヤノン株式会社 | 圧電材料、圧電素子、および電子機器 |
-
2015
- 2015-05-13 EP EP15001447.0A patent/EP2953177B1/en active Active
- 2015-05-14 TW TW104115389A patent/TW201546021A/zh unknown
- 2015-05-19 JP JP2015102130A patent/JP6537349B2/ja active Active
- 2015-05-28 US US14/723,963 patent/US9673379B2/en active Active
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- 2015-05-29 KR KR1020150076070A patent/KR20150138097A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005162587A (ja) * | 2002-12-18 | 2005-06-23 | Showa Denko Kk | チタン酸バリウムおよびそれを用いた電子部品 |
JP2009252789A (ja) * | 2008-04-01 | 2009-10-29 | Seiko Epson Corp | 圧電材料および圧電素子 |
JP2010043353A (ja) * | 2008-07-17 | 2010-02-25 | Fujifilm Corp | ペロブスカイト型酸化物、酸化物組成物、酸化物体、圧電素子、及び液体吐出装置 |
JP2013227199A (ja) * | 2012-03-30 | 2013-11-07 | Canon Inc | 圧電セラミックス、圧電セラミックスの製造方法、圧電素子および電子機器 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11545613B2 (en) | 2019-01-22 | 2023-01-03 | Tdk Corporation | Piezoelectric composition and piezoelectric device |
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