JP2015197509A - 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物 - Google Patents

感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物 Download PDF

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Publication number
JP2015197509A
JP2015197509A JP2014074550A JP2014074550A JP2015197509A JP 2015197509 A JP2015197509 A JP 2015197509A JP 2014074550 A JP2014074550 A JP 2014074550A JP 2014074550 A JP2014074550 A JP 2014074550A JP 2015197509 A JP2015197509 A JP 2015197509A
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sensitive
filter
radiation
resin composition
resin
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JP2014074550A
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English (en)
Japanese (ja)
Inventor
藤森　亨
Toru Fujimori
亨 藤森
弘喜 森
Hiroyoshi Mori
弘喜 森
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2014074550A priority Critical patent/JP2015197509A/ja
Priority to CN201580013849.5A priority patent/CN106104386A/zh
Priority to KR1020187017514A priority patent/KR20180071425A/ko
Priority to KR1020167025956A priority patent/KR20160124864A/ko
Priority to PCT/JP2015/057454 priority patent/WO2015151765A1/ja
Priority to TW104109270A priority patent/TWI699391B/zh
Publication of JP2015197509A publication Critical patent/JP2015197509A/ja
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2014074550A 2014-03-31 2014-03-31 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物 Abandoned JP2015197509A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014074550A JP2015197509A (ja) 2014-03-31 2014-03-31 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物
CN201580013849.5A CN106104386A (zh) 2014-03-31 2015-03-13 感光化射线性或感放射线性树脂组合物的制造方法及感光化射线性或感放射线性树脂组合物
KR1020187017514A KR20180071425A (ko) 2014-03-31 2015-03-13 감활성광선성 또는 감방사선성 수지 조성물의 제조 방법 및 감활성광선성 또는 감방사선성 수지 조성물
KR1020167025956A KR20160124864A (ko) 2014-03-31 2015-03-13 감활성광선성 또는 감방사선성 수지 조성물의 제조 방법 및 감활성광선성 또는 감방사선성 수지 조성물
PCT/JP2015/057454 WO2015151765A1 (ja) 2014-03-31 2015-03-13 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物
TW104109270A TWI699391B (zh) 2014-03-31 2015-03-24 樹脂組成物的製造方法及樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014074550A JP2015197509A (ja) 2014-03-31 2014-03-31 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物

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JP2014074550A Abandoned JP2015197509A (ja) 2014-03-31 2014-03-31 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物

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JP (1) JP2015197509A (zh)
KR (2) KR20160124864A (zh)
CN (1) CN106104386A (zh)
TW (1) TWI699391B (zh)
WO (1) WO2015151765A1 (zh)

Cited By (2)

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KR20180100631A (ko) * 2016-03-24 2018-09-11 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물, 감활성광선성 또는 감방사선성 조성물의 정제 방법, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
WO2021060071A1 (ja) * 2019-09-27 2021-04-01 富士フイルム株式会社 感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019022174A1 (ja) * 2017-07-26 2019-01-31 富士フイルム株式会社 ろ過装置、精製装置、薬液の製造装置、ろ過済み被精製物、薬液、及び、感活性光線性又は感放射線性樹脂組成物
CN111902773A (zh) * 2018-03-26 2020-11-06 富士胶片株式会社 感光性树脂组合物及其制造方法、抗蚀剂膜、图案形成方法以及电子器件的制造方法
WO2020203246A1 (ja) * 2019-03-29 2020-10-08 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法
JP2021076841A (ja) * 2019-11-11 2021-05-20 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法

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Cited By (7)

* Cited by examiner, † Cited by third party
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KR20180100631A (ko) * 2016-03-24 2018-09-11 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물, 감활성광선성 또는 감방사선성 조성물의 정제 방법, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
JPWO2017163922A1 (ja) * 2016-03-24 2018-11-08 富士フイルム株式会社 感活性光線性又は感放射線性組成物、感活性光線性又は感放射線性組成物の精製方法、パターン形成方法、及び電子デバイスの製造方法
KR102212733B1 (ko) * 2016-03-24 2021-02-05 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 조성물, 감활성광선성 또는 감방사선성 조성물의 정제 방법, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
US11156915B2 (en) 2016-03-24 2021-10-26 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive composition, method for purifying actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
WO2021060071A1 (ja) * 2019-09-27 2021-04-01 富士フイルム株式会社 感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法
JPWO2021060071A1 (zh) * 2019-09-27 2021-04-01
JP7262601B2 (ja) 2019-09-27 2023-04-21 富士フイルム株式会社 感放射線性樹脂組成物の製造方法、パターン形成方法、電子デバイスの製造方法

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CN106104386A (zh) 2016-11-09
WO2015151765A1 (ja) 2015-10-08
TWI699391B (zh) 2020-07-21
KR20160124864A (ko) 2016-10-28
TW201536842A (zh) 2015-10-01
KR20180071425A (ko) 2018-06-27

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