JP5192120B2 - 半導体レジスト用共重合体におけるパーティクルの増加防止方法 - Google Patents
半導体レジスト用共重合体におけるパーティクルの増加防止方法 Download PDFInfo
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- JP5192120B2 JP5192120B2 JP2004266755A JP2004266755A JP5192120B2 JP 5192120 B2 JP5192120 B2 JP 5192120B2 JP 2004266755 A JP2004266755 A JP 2004266755A JP 2004266755 A JP2004266755 A JP 2004266755A JP 5192120 B2 JP5192120 B2 JP 5192120B2
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- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000001153 fluoro group Chemical class F* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XBFJAVXCNXDMBH-UHFFFAOYSA-N tetracyclo[6.2.1.1(3,6).0(2,7)]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1 XBFJAVXCNXDMBH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/001—Removal of residual monomers by physical means
- C08F6/003—Removal of residual monomers by physical means from polymer solutions, suspensions, dispersions or emulsions without recovery of the polymer therefrom
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Description
共重合体10重量部、クロム(III)アセチルアセトナート1重量部を重アセトン20重量部に溶解し、試料溶液を調製した。この試料溶液をNMRチューブに入れ、13C−NMR(Bruker製400MHz)を用いて分析した。
共重合体4重量部をテトラヒドロフラン(以下、THF)100重量部に溶解し、試料溶液を調製した。この試料溶液20μLを、GPCカラム(昭和電工製KF−804L×4本)を備えたGPC装置(東ソー製GPC8220)にTHFを溶離液として注入し、溶出した液を示差屈折率(RI)検出器にて検出した。MwとMw/Mnは、あらかじめ標準ポリスチレンを用いて作成した検量線に基づいて算出した。
共重合体60重量部、プロピレングリコールモノエチルエーテルアセテート(以下、「PGMEA」と記す)360重量部からなる15重量%PGMEA溶液に、光酸発生剤としてトリフルオロメタンスルホン酸トリフェニルスルホニウム1.0重量部、トリエタノールアミン0.1重量部を加えて溶解し、日本マイクロリシス製オプチマイザーD(孔径0.05μmのポリエチレン製メンブレンフィルター)でろ過して、レジスト組成物を調製した。このレジスト組成物を2つに分け、一方は当日、もう一方は3ヶ月間室温にて保管した後、リオン社製液中パーティクルカウンターKS−40Bを用いて、パーティクルサイズ0.2μm以上の1mL中の液中パーティクル数を測定した。
窒素雰囲気に保った原料調製槽にメチルエチルケトン(以下、「MEK」と記す)61.0kg、α−メタクリロイルオキシ−γブチロラクトン(以下、「GBLM」と記す)13.3kg、2メチル−2−アダマンチルメタクリレート(以下、「MAM」と記す) 19.7kg、3−ヒドロキシ−1−アダマンチルメタクリレート(以下、「HAM」と記す) 9.0kgを仕込み、20〜25℃で攪拌して単量体溶液を調製した。又、窒素雰囲気に保った別の容器にMEK11.0kg、アゾビスイソブチロニトリル1.1kgを仕込み、10〜20℃で攪拌して溶解させて開始剤溶液を調製した。窒素雰囲気に保った重合槽にMEK25.0kgを仕込み、攪拌しながら80℃に加熱した後、室温(約20℃)に保った開始剤溶液と温度25〜30℃に加温した単量体溶液を、80℃に保った重合槽内に同時に供給開始し、各々一定速度で4時間かけて供給した。供給終了後、重合温度を80℃に保ったまま2時間熟成させ、室温まで冷却して重合液を取り出した。得られた重合液を水5重量%を含むメタノール700kgに滴下してポリマーを沈殿させ、ろ過した後、得られたウエットケーキを、水5重量%を含むメタノール700kgで洗浄してろ過する操作を2回繰り返した。得られたウエットケーキの一部をサンプリングして減圧乾燥機で乾燥させ、得られた白色粉体を13C−NMRとGPCにて分析した。13C−NMRで求めた共重合体組成は、GBLM/MAM/HAM=40/41/19であった。又、GPCで求めたMwは10,400、Mw/Mnは1.85であった。残りのウエットケーキは、MEKに再溶解し、共重合体10重量%を含むMEK溶液を調製した。
上記合成例で得られたMEK溶液を、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液を、日本ポール製ウルチプリーツP−ナイロン(孔径0.04μmのナイロン66製メンブレンフィルター)に通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液を、キュノ製エレクトロポアEF(孔径0.04μmの正のゼータ電位を付加したナイロン66製メンブレンフィルター)に通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、キュノ製ゼータプラス020GN(公称孔径0.2μmの、正のゼータ電位を含む樹脂が珪藻土、セルロース等のろ材と共に繊維上に担持されたフィルター)に通過させた後、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。このPGMEA溶液を、日本ポール製ウルチプリーツP−ナイロンを通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、キュノ製エレクトロポアEFを通過させた後、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液を、日本ポール製ウルチプリーツP−ナイロンに通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液により、前記(3)レジスト組成物中のパーティクル数の測定方法に従ってレジスト組成物を調製し、当該レジスト組成物中のパーティクル数を、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
比較例1で調製したPGMEA溶液に、前記(3)レジスト組成物中のパーティクル数の測定方法に従ってトリフルオロメタンスルホン酸トリフェニルスルホニウム及びトリエタノールアミンを加えてレジスト組成物を調製した後、キュノ製ゼータプラス020を通過させた。当該レジスト組成物中のパーティクル数を、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
キュノ製ゼータプラス020GNを、日本ポール製ウルチプリーツP−ナイロンに変更した以外は、比較例2と同様に行い、レジスト組成物中のパーティクル数を測定した。結果を表1に示す。
キュノ製ゼータプラス020GNを、キュノ製エレクトロポアEFに変更した以外は、比較例2と同様に行い、レジスト組成物中のパーティクル数を測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液を、日本マイクロリシス製オプチマイザーDに通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
上記合成例で得られたMEK溶液を、減圧下で加熱してMEKを追い出しながらPGMEAを投入し、共重合体15重量%を含むPGMEA溶液を調製した。得られたPGMEA溶液を、日本ポール製イオンクリーンAQ(メーカー公称孔径無しのイオン交換基修飾ポリエチレン製メンブレンフィルター)に通過させた後、前記(3)レジスト組成物中のパーティクル数の測定方法に従って測定した。結果を表1に示す。
Claims (5)
- 半導体レジスト用樹脂組成物を調製するための半導体レジスト用共重合体におけるパーティクルの増加防止方法であって、ラクトン構造を有する繰り返し単位及び/又は水酸基を有する繰り返し単位と脂環構造を有する繰り返し単位とを有する半導体レジスト用共重合体を含み、且つ、イオン性添加剤を含まない半導体レジスト用共重合体溶液(但し、半導体レジスト用樹脂組成物の樹脂濃度より小さい樹脂濃度に調製した共重合体溶液を除く。)を、ナイロン66、ナイロン6、ナイロン46から選ばれるポリアミド樹脂を含むフィルターに通過させることを特徴とする半導体レジスト用共重合体におけるパーティクルの増加防止方法。
- ナイロン66、ナイロン6、ナイロン46から選ばれるポリアミド樹脂を含むフィルターが、正のゼータ電位を有する樹脂でコーティングされたフィルターである請求項1に記載の半導体レジスト用共重合体におけるパーティクルの増加防止方法。
- ラクトン構造を有する繰り返し単位及び/又は水酸基を有する繰り返し単位と脂環構造を有する繰り返し単位とを有する半導体レジスト用共重合体を含み、且つ、イオン性添加剤を含まない半導体レジスト用共重合体溶液を、ナイロン66、ナイロン6、ナイロン46から選ばれるポリアミド樹脂を含むフィルターに通過させる工程と、正のゼータ電位を有するアミノ基又はアミド結合を有する樹脂を含むフィルターを通過させる工程に付すことを特徴とする半導体レジスト用共重合体におけるパーティクルの増加防止方法。
- ナイロン66、ナイロン6、ナイロン46から選ばれるポリアミド樹脂を含むフィルターが、正のゼータ電位を有する樹脂でコーティングされたフィルターである請求項3に記載の半導体レジスト用共重合体におけるパーティクルの増加防止方法。
- 請求項1〜4のいずれか1項に記載した半導体レジスト用共重合体におけるパーティクルの増加防止方法を適用することを特徴とする半導体レジスト用共重合体の製造方法。
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TW094127915A TW200617593A (en) | 2004-09-14 | 2005-08-16 | Method for preventing increase of particle in copolymer for semiconductor resist |
US11/224,510 US7342087B2 (en) | 2004-09-14 | 2005-09-12 | Method for prevention of increase in particles in copolymer for semiconductor resist |
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JP2013061426A (ja) * | 2011-09-12 | 2013-04-04 | Nomura Micro Sci Co Ltd | フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置 |
JP6075124B2 (ja) * | 2012-03-15 | 2017-02-08 | Jsr株式会社 | 現像液の精製方法 |
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JP2016164977A (ja) * | 2015-02-27 | 2016-09-08 | キヤノン株式会社 | ナノインプリント用液体材料、ナノインプリント用液体材料の製造方法、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、および電子部品の製造方法 |
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