TW200617593A - Method for preventing increase of particle in copolymer for semiconductor resist - Google Patents

Method for preventing increase of particle in copolymer for semiconductor resist

Info

Publication number
TW200617593A
TW200617593A TW094127915A TW94127915A TW200617593A TW 200617593 A TW200617593 A TW 200617593A TW 094127915 A TW094127915 A TW 094127915A TW 94127915 A TW94127915 A TW 94127915A TW 200617593 A TW200617593 A TW 200617593A
Authority
TW
Taiwan
Prior art keywords
copolymer
particles
semiconductor resists
preventing
increase
Prior art date
Application number
TW094127915A
Other languages
English (en)
Other versions
TWI379156B (zh
Inventor
Takanori Yamagishi
Kazuhiko Mizuno
Original Assignee
Maruzen Petrochem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochem Co Ltd filed Critical Maruzen Petrochem Co Ltd
Publication of TW200617593A publication Critical patent/TW200617593A/zh
Application granted granted Critical
Publication of TWI379156B publication Critical patent/TWI379156B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/001—Removal of residual monomers by physical means
    • C08F6/003—Removal of residual monomers by physical means from polymer solutions, suspensions, dispersions or emulsions without recovery of the polymer therefrom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW094127915A 2004-09-14 2005-08-16 Method for preventing increase of particle in copolymer for semiconductor resist TW200617593A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004266755A JP5192120B2 (ja) 2004-09-14 2004-09-14 半導体レジスト用共重合体におけるパーティクルの増加防止方法

Publications (2)

Publication Number Publication Date
TW200617593A true TW200617593A (en) 2006-06-01
TWI379156B TWI379156B (zh) 2012-12-11

Family

ID=36034948

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094127915A TW200617593A (en) 2004-09-14 2005-08-16 Method for preventing increase of particle in copolymer for semiconductor resist

Country Status (4)

Country Link
US (1) US7342087B2 (zh)
JP (1) JP5192120B2 (zh)
KR (1) KR101242320B1 (zh)
TW (1) TW200617593A (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101109808B1 (ko) * 2005-05-13 2012-02-15 제이에스알 가부시끼가이샤 감방사선성 수지 조성물의 제조 방법
JP5155541B2 (ja) * 2006-09-22 2013-03-06 富士フイルム株式会社 絶縁膜形成用組成物の製造方法、該製造方法により製造された絶縁膜形成用組成物、絶縁膜および電子デバイス
JP4984067B2 (ja) * 2007-07-23 2012-07-25 信越化学工業株式会社 フォトレジスト組成物用高分子化合物の合成方法
JP5786855B2 (ja) * 2010-03-31 2015-09-30 住友ベークライト株式会社 ポジ型感光性樹脂組成物の製造方法
KR20140015618A (ko) * 2011-07-06 2014-02-06 미쓰이 가가쿠 가부시키가이샤 성형체, 성형 재료, 광학 부품 및 성형 재료의 제조방법
JP2013061426A (ja) * 2011-09-12 2013-04-04 Nomura Micro Sci Co Ltd フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置
JP6075124B2 (ja) * 2012-03-15 2017-02-08 Jsr株式会社 現像液の精製方法
JP5914241B2 (ja) * 2012-08-07 2016-05-11 株式会社ダイセル 高分子化合物の製造方法、高分子化合物、及びフォトレジスト用樹脂組成物
JP2015197509A (ja) 2014-03-31 2015-11-09 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物
CN114975098A (zh) * 2015-02-27 2022-08-30 佳能株式会社 纳米压印液体材料及其制造方法、固化产物图案的制造方法和电路板的制造方法
JP2016164977A (ja) * 2015-02-27 2016-09-08 キヤノン株式会社 ナノインプリント用液体材料、ナノインプリント用液体材料の製造方法、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、および電子部品の製造方法
JP6886592B2 (ja) * 2016-12-15 2021-06-16 Dic株式会社 レジスト用感光性樹脂組成物の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4747399B2 (ja) * 2000-07-31 2011-08-17 Ｊｓｒ株式会社 脂環族系重合体中の金属除去方法
US6641670B2 (en) * 2000-10-12 2003-11-04 Toray Industries, Inc. Leaf coater for producing leaf type coated substrates
JP3694685B2 (ja) * 2002-10-24 2005-09-14 丸善石油化学株式会社 レジスト用ポリマー及び感放射線性レジスト組成物
JP4637476B2 (ja) * 2002-12-19 2011-02-23 東京応化工業株式会社 ホトレジスト組成物の製造方法
CN100555079C (zh) * 2003-02-06 2009-10-28 东京应化工业株式会社 精制抗蚀剂用粗树脂的方法

Also Published As

Publication number Publication date
KR20060051296A (ko) 2006-05-19
JP2006083214A (ja) 2006-03-30
US20060058433A1 (en) 2006-03-16
JP5192120B2 (ja) 2013-05-08
TWI379156B (zh) 2012-12-11
US7342087B2 (en) 2008-03-11
KR101242320B1 (ko) 2013-03-11

Similar Documents

Publication Publication Date Title
TW200617593A (en) Method for preventing increase of particle in copolymer for semiconductor resist
MX2021002948A (es) Composiciones que contienen hidroxido de calcio y metodos y sistemas asociados.
TWI599589B (zh) 形成定向自組裝圖案之方法
US10576432B2 (en) Polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter device
MXPA05014158A (es) Estructuras absorbentes que comprenden particulas polimericas superabsorbentes recubiertas.
MX2013006344A (es) Nanoestructuras electricamente conductivas, metodo para hacer tales nanoestructuras, peliculas de polimero electricamente conductivas que contienen tales nanoestructuras y dispositivos electronicos que contienen tales peliculas.
TW200636095A (en) Plating device, plating method, semiconductor device, and method for manufacturing semiconductor device
DE602005009224D1 (de) Verfahren zur herstellung von partikeln aus thermoplastischen polymeren und daraus gewonnenes pulver
TW201726928A (zh) 鎳粉末的製造方法
US20240100482A1 (en) Filtering device, purification device, and method for manufacturing chemical liquid
ATE458762T1 (de) Carboxylierte latexteilchen
TW200516091A (en) Production process of copolymer for semiconductor lithography
TWI295587B (en) Mixed bed ion exchange resins
TW200628491A (en) Process for preparing enlarged latex particles
Sun et al. Removal of chromium (VI) from wastewater using weakly and strongly basic magnetic adsorbents: adsorption/desorption property and mechanism comparative studies
TW202039067A (zh) 微粒子除去裝置及微粒子除去方法
CN103933955A (zh) 一种以二乙烯三胺为原料的煤基螯合吸附剂的制备方法
WO2011096736A3 (ko) 토너의 제조방법
BR112021023193A8 (pt) Método de preparação de composição de polímero superabsorvente
ATE523276T1 (de) Verfahren zur herstellung von kettenmetallpulvern,dadurch hergestellte kettenmetallpulver und durch verwendung der pulver hergestellte anisotrope leitende filme
BR112021023200A2 (pt) Método de preparação de composição de polímero superabsorvente
KR20130102737A (ko) 나노 사이즈의 무기 필러를 포함하는 ｅｍｃ 몰드 세정용 조성물
TW201144943A (en) Positive photosensitive resin composition and method of forming pattern with the same composition
WO2010129623A3 (en) Process for reducing residual surface material from porous polymers
ATE432297T1 (de) Verfahren zur herstellung von polymerisatpulvern aus wässrigen polymerisatdispersionen