JP2015056452A - 半導体記憶装置及びその製造方法 - Google Patents
半導体記憶装置及びその製造方法 Download PDFInfo
- Publication number
- JP2015056452A JP2015056452A JP2013187675A JP2013187675A JP2015056452A JP 2015056452 A JP2015056452 A JP 2015056452A JP 2013187675 A JP2013187675 A JP 2013187675A JP 2013187675 A JP2013187675 A JP 2013187675A JP 2015056452 A JP2015056452 A JP 2015056452A
- Authority
- JP
- Japan
- Prior art keywords
- contact
- layer
- memory device
- semiconductor memory
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 76
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 58
- 238000003860 storage Methods 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims description 66
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000003475 lamination Methods 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 21
- 229910052710 silicon Inorganic materials 0.000 description 21
- 239000010703 silicon Substances 0.000 description 21
- 239000012535 impurity Substances 0.000 description 15
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 13
- 229910052796 boron Inorganic materials 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000000926 separation method Methods 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000001020 plasma etching Methods 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/20—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
- H10B43/23—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
- H10B43/27—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/535—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including internal interconnections, e.g. cross-under constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66833—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a charge trapping gate insulator, e.g. MNOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
- H01L29/7926—Vertical transistors, i.e. transistors having source and drain not in the same horizontal plane
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/10—EEPROM devices comprising charge-trapping gate insulators characterised by the top-view layout
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/20—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/40—EEPROM devices comprising charge-trapping gate insulators characterised by the peripheral circuit region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/50—EEPROM devices comprising charge-trapping gate insulators characterised by the boundary region between the core and peripheral circuit regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
【解決手段】実施形態の半導体記憶装置によれば、積層体は、基板上にそれぞれ交互に積層された複数層の電極層と複数層の絶縁層とを有する。チャネルボディは、複数層の電極層を貫通して積層体の積層方向に延びている。メモリ膜は、電極層とチャネルボディとの間に設けられ、電荷蓄積膜を含む。複数のコンタクト部は、複数層の電極層のそれぞれの端部に凸状に設けられている。複数のコンタクト部は、それぞれが積層方向に重ならずに基板の面方向に位置がずれている。複数のプラグは、それぞれのコンタクト部からそれぞれの回路配線に向けて延び、それぞれのコンタクト部とそれぞれの回路配線とを接続している。
【選択図】図2
Description
また、図4は、Y−Z断面において、メモリセルが設けられた部分の拡大図を表す。
すなわち、複数の回路配線51a〜51fが、Y方向に配列されている。
図37は、図36におけるB−B断面図である。
図36は、図37において、上から2層目の電極層WL及びその上の絶縁層40の部分で突出部130を切断した断面を表す。
図43に示される階段構造部140は、図44に示す階段構造部140における上から2層目の電極層WLより下の積層体(上から2層目の電極層WLを含む)の断面を表す。
Claims (6)
- 基板と、
前記基板上に設けられた複数の回路配線と、
前記基板上にそれぞれ交互に積層された複数層の電極層と複数層の絶縁層とを有する積層体と、
前記複数層の電極層を貫通して前記積層体の積層方向に延びるチャネルボディと、
前記電極層と前記チャネルボディとの間に設けられ、電荷蓄積膜を含むメモリ膜と、
前記複数層の電極層のそれぞれの端部に凸状に設けられた複数のコンタクト部であって、それぞれが前記積層方向に重ならずに、前記基板の面方向に位置がずれている複数のコンタクト部と、
それぞれの前記コンタクト部からそれぞれの前記回路配線に向けて延び、それぞれの前記コンタクト部とそれぞれの前記回路配線とを接続する複数のプラグと、
を備えた半導体記憶装置。 - 前記プラグは、前記コンタクト部の上面及び端面に接している請求項1記載の半導体記憶装置。
- 前記コンタクト部は、前記電極層の上面に対して傾斜した斜面を有し、
前記プラグは、前記コンタクト部の端面に接し、さらに前記コンタクト部の前記斜面及び上面の少なくともいずれかに接している請求項1記載の半導体記憶装置。 - 前記メモリセルアレイ領域において、前記積層体は複数のブロックに第1の方向に分断され、
前記メモリセルアレイ領域の外側の領域において、前記積層体は前記第1の方向に分断されずに、つながっており、
前記複数のコンタクト部は、前記メモリセルアレイ領域の外側の領域で、前記第1の方向に対して交差する第2の方向に突出し、前記第1の方向に配列されている請求項1〜3のいずれか1つに記載の半導体記憶装置。 - 前記プラグは、前記コンタクト部より上の上部と、前記コンタクト部より下の下部と、を有する柱状に形成され、
前記上部の直径は前記下部の直径よりも小さい請求項1〜4のいずれか1つに記載の半導体記憶装置。 - 複数の回路配線が形成された基板上に、それぞれ交互に積層された複数層の電極層と複数層の絶縁層とを有する積層体を形成する工程と、
前記複数層の電極層を貫通し前記積層体の積層方向に延びるホールを形成する工程と、
前記ホールの側壁に、電荷蓄積膜を含むメモリ膜を形成する工程と、
前記ホール内における前記メモリ膜の側壁に、チャネルボディを形成する工程と、
前記複数層の電極層のそれぞれの端部に凸状に設けられ、それぞれが前記積層方向に重ならずに、前記基板の面方向に位置がずれている複数のコンタクト部を形成する工程と、
それぞれの前記コンタクト部からそれぞれの前記回路配線に向けて延び、それぞれの前記コンタクト部とそれぞれの前記回路配線とを接続する複数のプラグを形成する工程と、
を備えた半導体記憶装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013187675A JP2015056452A (ja) | 2013-09-10 | 2013-09-10 | 半導体記憶装置及びその製造方法 |
US14/204,512 US9029938B2 (en) | 2013-09-10 | 2014-03-11 | Semiconductor memory device and method for manufacturing same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013187675A JP2015056452A (ja) | 2013-09-10 | 2013-09-10 | 半導体記憶装置及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2015056452A true JP2015056452A (ja) | 2015-03-23 |
Family
ID=52624728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013187675A Pending JP2015056452A (ja) | 2013-09-10 | 2013-09-10 | 半導体記憶装置及びその製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9029938B2 (ja) |
JP (1) | JP2015056452A (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016213428A (ja) * | 2015-04-30 | 2016-12-15 | 株式会社東芝 | 記憶装置及びその製造方法 |
US9633945B1 (en) | 2016-01-27 | 2017-04-25 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing semiconductor device |
JP2017174868A (ja) * | 2016-03-18 | 2017-09-28 | 東芝メモリ株式会社 | 半導体記憶装置 |
JP2018513559A (ja) * | 2015-04-24 | 2018-05-24 | ソニーセミコンダクタソリューションズ株式会社 | 3次元メモリのソケット構造 |
US10650894B2 (en) | 2018-09-19 | 2020-05-12 | Toshiba Memory Corporation | Semiconductor memory device and control method thereof |
US10748923B2 (en) | 2018-04-20 | 2020-08-18 | Samsung Electronics Co., Ltd. | Vertical memory devices and methods of manufacturing the same |
WO2020188775A1 (ja) * | 2019-03-19 | 2020-09-24 | キオクシア株式会社 | 半導体記憶装置 |
US10790229B2 (en) | 2018-03-15 | 2020-09-29 | Toshiba Memory Corporation | Semiconductor memory device |
US11189638B2 (en) | 2019-09-18 | 2021-11-30 | Kioxia Corporation | Semiconductor memory device including three-dimensionally stacked memory cells |
WO2021260792A1 (ja) * | 2020-06-23 | 2021-12-30 | キオクシア株式会社 | 半導体記憶装置 |
JP2022539644A (ja) * | 2020-06-05 | 2022-09-13 | 長江存儲科技有限責任公司 | 3次元メモリデバイス内の階段構造およびそれを形成するための方法 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9196567B1 (en) * | 2015-01-14 | 2015-11-24 | Macronix International Co., Ltd. | Pad structure |
US10147735B2 (en) * | 2015-03-13 | 2018-12-04 | Toshiba Memory Corporation | Semiconductor memory device and production method thereof |
KR102333478B1 (ko) | 2015-03-31 | 2021-12-03 | 삼성전자주식회사 | 3차원 반도체 장치 |
CN106887434B (zh) * | 2015-12-15 | 2019-07-05 | 旺宏电子股份有限公司 | 三维存储器元件 |
US9768233B1 (en) * | 2016-03-01 | 2017-09-19 | Toshiba Memory Corporation | Semiconductor device and method of manufacturing the same |
KR102613511B1 (ko) | 2016-06-09 | 2023-12-13 | 삼성전자주식회사 | 수직형 메모리 소자를 구비한 집적회로 소자 및 그 제조 방법 |
KR20180090932A (ko) * | 2017-02-03 | 2018-08-14 | 삼성전자주식회사 | 3차원 반도체 메모리 소자 |
US10192929B2 (en) | 2017-03-24 | 2019-01-29 | Sandisk Technologies Llc | Three-dimensional memory devices having through-stack contact via structures and method of making thereof |
KR102632482B1 (ko) | 2018-04-09 | 2024-02-02 | 삼성전자주식회사 | 수직형 메모리 장치 및 그 제조 방법 |
KR102639721B1 (ko) | 2018-04-13 | 2024-02-26 | 삼성전자주식회사 | 3차원 반도체 메모리 장치 |
JP6798730B2 (ja) * | 2018-12-13 | 2020-12-09 | ウルトラメモリ株式会社 | 半導体モジュール及びその製造方法 |
CN110391242B (zh) * | 2019-07-31 | 2021-08-20 | 中国科学院微电子研究所 | L形台阶状字线结构及其制作方法及三维存储器 |
US11495540B2 (en) * | 2019-10-22 | 2022-11-08 | Tokyo Electron Limited | Semiconductor apparatus having stacked devices and method of manufacture thereof |
KR102640175B1 (ko) | 2019-11-18 | 2024-02-23 | 삼성전자주식회사 | 반도체 장치 |
KR20210095390A (ko) | 2020-01-23 | 2021-08-02 | 삼성전자주식회사 | 폴리 실리콘과 메탈을 포함하는 워드 라인을 갖는 3차원 메모리 소자 및 이의 제조 방법 |
WO2021243703A1 (en) | 2020-06-05 | 2021-12-09 | Yangtze Memory Technologies Co., Ltd. | Staircase structure in three-dimensional memory device and method for forming the same |
KR20230004039A (ko) * | 2021-06-30 | 2023-01-06 | 에스케이하이닉스 주식회사 | 반도체 메모리 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010045205A (ja) * | 2008-08-13 | 2010-02-25 | Toshiba Corp | 不揮発性半導体記憶装置、及びその製造方法 |
JP2010114153A (ja) * | 2008-11-04 | 2010-05-20 | Toshiba Corp | 不揮発性半導体記憶装置 |
JP2011199131A (ja) * | 2010-03-23 | 2011-10-06 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5016832B2 (ja) | 2006-03-27 | 2012-09-05 | 株式会社東芝 | 不揮発性半導体記憶装置及びその製造方法 |
JP4768557B2 (ja) * | 2006-09-15 | 2011-09-07 | 株式会社東芝 | 不揮発性半導体記憶装置及びその製造方法 |
JP5091526B2 (ja) | 2007-04-06 | 2012-12-05 | 株式会社東芝 | 半導体記憶装置及びその製造方法 |
JP5142692B2 (ja) | 2007-12-11 | 2013-02-13 | 株式会社東芝 | 不揮発性半導体記憶装置 |
JP2011003833A (ja) | 2009-06-22 | 2011-01-06 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法 |
US8525335B2 (en) | 2009-07-03 | 2013-09-03 | Teramikros, Inc. | Semiconductor construct and manufacturing method thereof as well as semiconductor device and manufacturing method thereof |
KR101702060B1 (ko) * | 2010-02-19 | 2017-02-02 | 삼성전자주식회사 | 3차원 반도체 장치의 배선 구조체 |
JP2011187794A (ja) | 2010-03-10 | 2011-09-22 | Toshiba Corp | 半導体記憶装置及びその製造方法 |
JP2012151187A (ja) * | 2011-01-17 | 2012-08-09 | Toshiba Corp | 半導体記憶装置の製造方法 |
JP2013069932A (ja) * | 2011-09-22 | 2013-04-18 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法 |
-
2013
- 2013-09-10 JP JP2013187675A patent/JP2015056452A/ja active Pending
-
2014
- 2014-03-11 US US14/204,512 patent/US9029938B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010045205A (ja) * | 2008-08-13 | 2010-02-25 | Toshiba Corp | 不揮発性半導体記憶装置、及びその製造方法 |
JP2010114153A (ja) * | 2008-11-04 | 2010-05-20 | Toshiba Corp | 不揮発性半導体記憶装置 |
JP2011199131A (ja) * | 2010-03-23 | 2011-10-06 | Toshiba Corp | 不揮発性半導体記憶装置及びその製造方法 |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018513559A (ja) * | 2015-04-24 | 2018-05-24 | ソニーセミコンダクタソリューションズ株式会社 | 3次元メモリのソケット構造 |
JP2016213428A (ja) * | 2015-04-30 | 2016-12-15 | 株式会社東芝 | 記憶装置及びその製造方法 |
US9633945B1 (en) | 2016-01-27 | 2017-04-25 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing semiconductor device |
JP2017174868A (ja) * | 2016-03-18 | 2017-09-28 | 東芝メモリ株式会社 | 半導体記憶装置 |
US10418551B2 (en) | 2016-03-18 | 2019-09-17 | Toshiba Memory Corporation | Semiconductor memory device |
US10790229B2 (en) | 2018-03-15 | 2020-09-29 | Toshiba Memory Corporation | Semiconductor memory device |
US10748923B2 (en) | 2018-04-20 | 2020-08-18 | Samsung Electronics Co., Ltd. | Vertical memory devices and methods of manufacturing the same |
US11696442B2 (en) | 2018-04-20 | 2023-07-04 | Samsung Electronics Co., Ltd. | Vertical memory devices and methods of manufacturing the same |
US10650894B2 (en) | 2018-09-19 | 2020-05-12 | Toshiba Memory Corporation | Semiconductor memory device and control method thereof |
WO2020188775A1 (ja) * | 2019-03-19 | 2020-09-24 | キオクシア株式会社 | 半導体記憶装置 |
JPWO2020188775A1 (ja) * | 2019-03-19 | 2021-10-21 | キオクシア株式会社 | 半導体記憶装置 |
JP7214835B2 (ja) | 2019-03-19 | 2023-01-30 | キオクシア株式会社 | 半導体記憶装置 |
US11189638B2 (en) | 2019-09-18 | 2021-11-30 | Kioxia Corporation | Semiconductor memory device including three-dimensionally stacked memory cells |
JP2022539644A (ja) * | 2020-06-05 | 2022-09-13 | 長江存儲科技有限責任公司 | 3次元メモリデバイス内の階段構造およびそれを形成するための方法 |
JP7317989B2 (ja) | 2020-06-05 | 2023-07-31 | 長江存儲科技有限責任公司 | 3次元メモリデバイス内の階段構造およびそれを形成するための方法 |
WO2021260792A1 (ja) * | 2020-06-23 | 2021-12-30 | キオクシア株式会社 | 半導体記憶装置 |
Also Published As
Publication number | Publication date |
---|---|
US20150069499A1 (en) | 2015-03-12 |
US9029938B2 (en) | 2015-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2015056452A (ja) | 半導体記憶装置及びその製造方法 | |
US9431419B2 (en) | Semiconductor memory device and method for manufacturing same | |
CN109148461B (zh) | 3d存储器件及其制造方法 | |
US8592890B2 (en) | Semiconductor memory device and method for manufacturing same | |
US8921921B2 (en) | Nonvolatile memory device and method for fabricating the same | |
CN110277401B (zh) | 半导体装置 | |
US10651185B2 (en) | Semiconductor device and method of manufacturing the same | |
US20170047341A1 (en) | Semiconductor device and method for manufacturing same | |
KR102285788B1 (ko) | 메모리 소자의 제조 방법 | |
JP2020035921A (ja) | 半導体記憶装置 | |
US10483277B2 (en) | Semiconductor memory device and method for manufacturing the same | |
JP2014187191A (ja) | 半導体記憶装置の製造方法及び半導体記憶装置 | |
CN102683291A (zh) | 制造3d非易失性存储器件的方法 | |
JP2011035343A (ja) | 半導体装置の製造方法 | |
KR20130072663A (ko) | 3차원 불휘발성 메모리 소자와, 이를 포함하는 메모리 시스템과, 그 제조방법 | |
US20160079069A1 (en) | Semiconductor memory device and method for manufacturing the same | |
US8836011B2 (en) | Nonvolatile semiconductor memory device | |
US20140284685A1 (en) | Nonvolatile semiconductor memory device and method for manufacturing same | |
JP2013187337A (ja) | 不揮発性半導体記憶装置 | |
JP2020035932A (ja) | 半導体記憶装置 | |
US20180197874A1 (en) | Semiconductor device and method for manufacturing same | |
CN103489868A (zh) | 半导体装置及其制造方法和存储器系统 | |
US9012976B2 (en) | Semiconductor device and method for manufacturing the same | |
CN104347638A (zh) | 非易失性存储装置 | |
KR20130072523A (ko) | 3차원 불휘발성 메모리 소자 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150812 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160208 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160405 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160830 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20170316 |