JP2014514450A5 - - Google Patents
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- JP2014514450A5 JP2014514450A5 JP2014503119A JP2014503119A JP2014514450A5 JP 2014514450 A5 JP2014514450 A5 JP 2014514450A5 JP 2014503119 A JP2014503119 A JP 2014503119A JP 2014503119 A JP2014503119 A JP 2014503119A JP 2014514450 A5 JP2014514450 A5 JP 2014514450A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- detector
- evaporator
- substrate
- measurement system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP11161343.6 | 2011-04-06 | ||
| EP11161343.6A EP2508645B1 (en) | 2011-04-06 | 2011-04-06 | Evaporation system with measurement unit |
| PCT/EP2012/056107 WO2012136673A1 (en) | 2011-04-06 | 2012-04-03 | Evaporation system with measurement unit |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014514450A JP2014514450A (ja) | 2014-06-19 |
| JP2014514450A5 true JP2014514450A5 (https=) | 2015-05-28 |
| JP6140681B2 JP6140681B2 (ja) | 2017-05-31 |
Family
ID=44533347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014503119A Expired - Fee Related JP6140681B2 (ja) | 2011-04-06 | 2012-04-03 | 測定ユニットを備えた蒸発システム |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20120258239A1 (https=) |
| EP (1) | EP2508645B1 (https=) |
| JP (1) | JP6140681B2 (https=) |
| KR (1) | KR101877458B1 (https=) |
| CN (1) | CN103476964B (https=) |
| WO (1) | WO2012136673A1 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100233353A1 (en) * | 2009-03-16 | 2010-09-16 | Applied Materials, Inc. | Evaporator, coating installation, and method for use thereof |
| KR20120061394A (ko) * | 2010-12-03 | 2012-06-13 | 삼성모바일디스플레이주식회사 | 증발원 및 유기물 증착 방법 |
| EP2699710A1 (en) * | 2011-04-20 | 2014-02-26 | Koninklijke Philips N.V. | Measurement device and method for vapour deposition applications |
| KR101938365B1 (ko) * | 2012-07-31 | 2019-04-12 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 증착량 측정 방법 |
| US9062368B2 (en) * | 2012-10-16 | 2015-06-23 | The Regents Of The University Of Michigan | Method of monitoring photoactive organic molecules in-situ during gas-phase deposition of the photoactive organic molecules |
| CN105765101A (zh) * | 2013-11-16 | 2016-07-13 | 纽升股份有限公司 | 用于监测真空反应器设备中的硒蒸气的方法 |
| CN106133184B (zh) * | 2014-03-21 | 2020-03-17 | 应用材料公司 | 用于有机材料的蒸发源 |
| BR112016020156A2 (pt) * | 2014-05-08 | 2018-05-08 | Halliburton Energy Services Inc | sistema, e, métodos para fabricar e para formar um dispositivo de película ótica fina |
| DE102014014970B4 (de) * | 2014-10-14 | 2020-01-02 | NICE Solar Energy GmbH | Vorrichtung und Verfahren zur Schichtdickenmessung für Dampfabscheideverfahren |
| JP6594986B2 (ja) * | 2014-11-07 | 2019-10-23 | アプライド マテリアルズ インコーポレイテッド | 真空堆積のための材料源アレンジメント及び材料分配アレンジメント |
| CN107709604A (zh) * | 2015-06-17 | 2018-02-16 | 应用材料公司 | 用于测量沉积速率的方法及沉积速率控制系统 |
| CN107810410A (zh) * | 2015-06-17 | 2018-03-16 | 应用材料公司 | 用于测量沉积速率的测量组件及其方法 |
| US20180372650A1 (en) * | 2016-01-15 | 2018-12-27 | Applied Materials, Inc. | Optical inspection system, processing system for processing of a material on a flexible substrate, and methods of inspecting a flexible substrate |
| JP6815390B2 (ja) * | 2016-05-10 | 2021-01-20 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 堆積装置を操作する方法、蒸発した源材料を基板に堆積する方法、及び堆積装置 |
| US10100410B2 (en) * | 2016-08-05 | 2018-10-16 | Industrial Technology Research Institute | Film thickness monitoring system and method using the same |
| CN109715846B (zh) * | 2016-12-14 | 2024-07-23 | 应用材料公司 | 沉积系统 |
| CN107779822B (zh) * | 2017-10-30 | 2019-12-03 | 深圳市华星光电半导体显示技术有限公司 | 蒸镀装置与蒸镀方法 |
| WO2020108743A1 (en) * | 2018-11-28 | 2020-06-04 | Applied Materials, Inc. | Deposition source for depositing evaporated material, deposition apparatus, and methods therefor |
| CN112996948A (zh) * | 2018-12-14 | 2021-06-18 | 应用材料公司 | 用于测量沉积速率的测量组件及其方法 |
| KR102245087B1 (ko) * | 2019-07-08 | 2021-04-28 | 엘지전자 주식회사 | 증착 장비용 박막 두께 측정장치 |
| EP3869534A1 (en) * | 2020-02-20 | 2021-08-25 | Bühler Alzenau GmbH | In-situ etch rate or deposition rate measurement system |
| WO2021230859A1 (en) * | 2020-05-12 | 2021-11-18 | Applied Materials, Inc. | Evaporation source, evaporation system, and method of monitoring material deposition on a substrate |
| CN111549319B (zh) * | 2020-05-20 | 2022-03-29 | 武汉天马微电子有限公司 | 一种真空蒸镀系统及真空蒸镀方法 |
| EP4143362B1 (en) * | 2020-06-30 | 2025-04-30 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for controlling a flux distribution of evaporated source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation |
| US20230175892A1 (en) * | 2020-06-30 | 2023-06-08 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for controlling an evaporation rate of source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation |
| WO2025133674A1 (en) * | 2023-12-19 | 2025-06-26 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate of an evaporation source, evaporation source, deposition apparatus, and method of measuring a disposition rate |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55500588A (https=) * | 1978-08-18 | 1980-09-04 | ||
| JPS5751262A (en) * | 1980-09-08 | 1982-03-26 | Nec Corp | Detection of thickness of vapor deposited film |
| DD202897A1 (de) * | 1981-07-31 | 1983-10-05 | Ulrike Ehrlich | Einrichtung zum wechseln von testglaesern in vakuum-bedampfungsanlagen |
| JPS62142766A (ja) * | 1985-12-16 | 1987-06-26 | Matsushita Electric Ind Co Ltd | 薄膜形成方法 |
| DE3604624A1 (de) * | 1986-02-14 | 1987-08-20 | Leybold Heraeus Gmbh & Co Kg | Testglaswechsler zur optischen messung von schichteigenschaften in vakuumbeschichtungsanlagen |
| DE69309505T2 (de) * | 1992-01-17 | 1997-07-24 | Matsushita Electric Ind Co Ltd | Verfahren und Gerät zur Herstellung mehrschichtiger Filme |
| JP3298682B2 (ja) * | 1992-01-17 | 2002-07-02 | 松下電器産業株式会社 | 多層膜の成膜装置並びに光学特性の測定方法及び成膜方法 |
| JPH074922A (ja) * | 1993-06-21 | 1995-01-10 | Jasco Corp | 半導体多層薄膜膜厚測定装置およびその測定方法 |
| US6338775B1 (en) * | 2000-08-07 | 2002-01-15 | Advanced Ion Beam Technology, Inc. | Apparatus and method for uniformly depositing thin films over substrates |
| GB0019848D0 (en) * | 2000-08-11 | 2000-09-27 | Rtc Systems Ltd | Apparatus and method for coating substrates |
| US6558735B2 (en) * | 2001-04-20 | 2003-05-06 | Eastman Kodak Company | Reusable mass-sensor in manufacture of organic light-emitting devices |
| US6798499B2 (en) * | 2001-07-18 | 2004-09-28 | Alps Electric Co., Ltd. | Method of forming optical thin films on substrate at high accuracy and apparatus therefor |
| TW591202B (en) * | 2001-10-26 | 2004-06-11 | Hermosa Thin Film Co Ltd | Dynamic film thickness control device/method and ITS coating method |
| DE10204075B4 (de) * | 2002-02-01 | 2006-09-07 | Leybold Optics Gmbh | Vorrichtung für Einrichtungen zur Bestimmung von Eigenschaften aufgebrachter Schichten |
| JP3802846B2 (ja) * | 2002-06-20 | 2006-07-26 | 株式会社エイコー・エンジニアリング | 薄膜堆積用分子線源セル |
| JP2005001699A (ja) * | 2003-06-11 | 2005-01-06 | S T Chem Co Ltd | 容器体 |
| CN100482856C (zh) * | 2005-05-24 | 2009-04-29 | 鸿富锦精密工业（深圳）有限公司 | 镀膜设备及其镀膜方法 |
| JP2007051347A (ja) * | 2005-08-18 | 2007-03-01 | Pentax Corp | 多層膜とその形成装置及び形成方法、及び多層膜を有する光学素子 |
| JP4737760B2 (ja) * | 2006-03-31 | 2011-08-03 | 株式会社昭和真空 | 真空蒸着装置 |
| JP4813292B2 (ja) * | 2006-08-25 | 2011-11-09 | 株式会社昭和真空 | 有機薄膜の膜厚測定装置及び有機薄膜形成装置 |
| JP2008115410A (ja) * | 2006-11-01 | 2008-05-22 | Canon Inc | 蒸着装置 |
| JP5024075B2 (ja) * | 2008-01-28 | 2012-09-12 | パナソニック株式会社 | 真空蒸着装置 |
| JP2009228090A (ja) * | 2008-03-25 | 2009-10-08 | Canon Inc | 蒸着装置及び蒸着源 |
| KR101018644B1 (ko) * | 2008-09-05 | 2011-03-03 | 에스엔유 프리시젼 주식회사 | 증착장치 및 이를 이용한 증착방법 |
| EP2261388A1 (en) * | 2009-06-12 | 2010-12-15 | Applied Materials Inc. a Corporation of the State of Delaware | Deposition rate monitor device, evaporator, coating installation, method for applying vapor to a substrate and method of operating a deposition rate monitor device |
| EP2469268A1 (en) * | 2010-12-23 | 2012-06-27 | Applied Materials, Inc. | Evaporation system with measurement unit |
-
2011
- 2011-04-06 EP EP11161343.6A patent/EP2508645B1/en not_active Not-in-force
- 2011-04-12 US US13/084,984 patent/US20120258239A1/en not_active Abandoned
-
2012
- 2012-04-03 WO PCT/EP2012/056107 patent/WO2012136673A1/en not_active Ceased
- 2012-04-03 JP JP2014503119A patent/JP6140681B2/ja not_active Expired - Fee Related
- 2012-04-03 CN CN201280018968.6A patent/CN103476964B/zh not_active Expired - Fee Related
- 2012-04-03 KR KR1020137029191A patent/KR101877458B1/ko not_active Expired - Fee Related
-
2016
- 2016-10-05 US US15/286,270 patent/US20170066010A1/en not_active Abandoned
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