JP2014514450A5 - - Google Patents

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Publication number
JP2014514450A5
JP2014514450A5 JP2014503119A JP2014503119A JP2014514450A5 JP 2014514450 A5 JP2014514450 A5 JP 2014514450A5 JP 2014503119 A JP2014503119 A JP 2014503119A JP 2014503119 A JP2014503119 A JP 2014503119A JP 2014514450 A5 JP2014514450 A5 JP 2014514450A5
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JP
Japan
Prior art keywords
measurement
detector
evaporator
substrate
measurement system
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JP2014503119A
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English (en)
Japanese (ja)
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JP6140681B2 (ja
JP2014514450A (ja
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Priority claimed from EP11161343.6A external-priority patent/EP2508645B1/en
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Publication of JP2014514450A publication Critical patent/JP2014514450A/ja
Publication of JP2014514450A5 publication Critical patent/JP2014514450A5/ja
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Publication of JP6140681B2 publication Critical patent/JP6140681B2/ja
Expired - Fee Related legal-status Critical Current
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JP2014503119A 2011-04-06 2012-04-03 測定ユニットを備えた蒸発システム Expired - Fee Related JP6140681B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11161343.6A EP2508645B1 (en) 2011-04-06 2011-04-06 Evaporation system with measurement unit
EP11161343.6 2011-04-06
PCT/EP2012/056107 WO2012136673A1 (en) 2011-04-06 2012-04-03 Evaporation system with measurement unit

Publications (3)

Publication Number Publication Date
JP2014514450A JP2014514450A (ja) 2014-06-19
JP2014514450A5 true JP2014514450A5 (https=) 2015-05-28
JP6140681B2 JP6140681B2 (ja) 2017-05-31

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Family Applications (1)

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JP2014503119A Expired - Fee Related JP6140681B2 (ja) 2011-04-06 2012-04-03 測定ユニットを備えた蒸発システム

Country Status (6)

Country Link
US (2) US20120258239A1 (https=)
EP (1) EP2508645B1 (https=)
JP (1) JP6140681B2 (https=)
KR (1) KR101877458B1 (https=)
CN (1) CN103476964B (https=)
WO (1) WO2012136673A1 (https=)

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JP6411675B2 (ja) * 2015-06-17 2018-10-24 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 堆積速度を測定するための方法及び堆積速度制御システム
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JP6815390B2 (ja) * 2016-05-10 2021-01-20 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 堆積装置を操作する方法、蒸発した源材料を基板に堆積する方法、及び堆積装置
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WO2020108743A1 (en) * 2018-11-28 2020-06-04 Applied Materials, Inc. Deposition source for depositing evaporated material, deposition apparatus, and methods therefor
KR20210078567A (ko) * 2018-12-14 2021-06-28 어플라이드 머티어리얼스, 인코포레이티드 측정 조립체, 증착 소스, 증착 장치 및 방법
KR102245087B1 (ko) * 2019-07-08 2021-04-28 엘지전자 주식회사 증착 장비용 박막 두께 측정장치
EP3869534A1 (en) * 2020-02-20 2021-08-25 Bühler Alzenau GmbH In-situ etch rate or deposition rate measurement system
WO2021230859A1 (en) * 2020-05-12 2021-11-18 Applied Materials, Inc. Evaporation source, evaporation system, and method of monitoring material deposition on a substrate
CN111549319B (zh) * 2020-05-20 2022-03-29 武汉天马微电子有限公司 一种真空蒸镀系统及真空蒸镀方法
EP4143362B1 (en) * 2020-06-30 2025-04-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Method for controlling a flux distribution of evaporated source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation
CN115917033A (zh) * 2020-06-30 2023-04-04 马克思-普朗克科学促进协会 控制源材料的蒸发速率的方法、测量在源表面上反射的电磁辐射的检测器及利用电磁辐射进行热蒸发的系统
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