JPS5751262A - Detection of thickness of vapor deposited film - Google Patents

Detection of thickness of vapor deposited film

Info

Publication number
JPS5751262A
JPS5751262A JP12433380A JP12433380A JPS5751262A JP S5751262 A JPS5751262 A JP S5751262A JP 12433380 A JP12433380 A JP 12433380A JP 12433380 A JP12433380 A JP 12433380A JP S5751262 A JPS5751262 A JP S5751262A
Authority
JP
Japan
Prior art keywords
crystal resonators
vapor deposited
film thickness
detecting
metals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12433380A
Other languages
Japanese (ja)
Inventor
Josuke Nozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12433380A priority Critical patent/JPS5751262A/en
Publication of JPS5751262A publication Critical patent/JPS5751262A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To decrease the peeling accidents between vapor deposited metals and decrease the occurrence of troubles in a vapor deposited film thickness control section by performing film thickness detection corresponding to each metal by a turret system provided with a number of detecting parts detecting film thickness in a method for detecting the thickness of vapor deposited films in a metallizing process. CONSTITUTION:This method consists of setting respective crystal resonators (h) on a crystal resonator stage desk (o), fixing a shield cover body (g) for the crystal resonators (h) and the parts continous to this, rotating the desk (o) and stopping the same in the position of each crystal resonators (h), wherein lower electrodes (i), (j), (n), (e) are fixed at one point and are brought in sliding contact with the electrodes (j) from the respective crystal resonators (h). This decreases the frequencies of exchanging the crystal resonators (h) and improves working efficiency in the case of the lamination of a single metal layer, and decreases the occurrence of peeling accidents between the vapor deposited metals and the troubles in the deposited film thickness control part by a method of making the common use of the crystal resonators (h) corresponding to respective metals of different materials in the case of the lamination of multiple metal layers.
JP12433380A 1980-09-08 1980-09-08 Detection of thickness of vapor deposited film Pending JPS5751262A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12433380A JPS5751262A (en) 1980-09-08 1980-09-08 Detection of thickness of vapor deposited film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12433380A JPS5751262A (en) 1980-09-08 1980-09-08 Detection of thickness of vapor deposited film

Publications (1)

Publication Number Publication Date
JPS5751262A true JPS5751262A (en) 1982-03-26

Family

ID=14882737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12433380A Pending JPS5751262A (en) 1980-09-08 1980-09-08 Detection of thickness of vapor deposited film

Country Status (1)

Country Link
JP (1) JPS5751262A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6982797B2 (en) * 2002-02-01 2006-01-03 Leybold Optics Gmbh Apparatus for devices for determining properties of applied layers
JP2007270332A (en) * 2006-03-31 2007-10-18 Showa Shinku:Kk Vacuum deposition apparatus
US20120258239A1 (en) * 2011-04-06 2012-10-11 Applied Materials, Inc. Evaporation system with measurement unit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6982797B2 (en) * 2002-02-01 2006-01-03 Leybold Optics Gmbh Apparatus for devices for determining properties of applied layers
JP2007270332A (en) * 2006-03-31 2007-10-18 Showa Shinku:Kk Vacuum deposition apparatus
JP4737760B2 (en) * 2006-03-31 2011-08-03 株式会社昭和真空 Vacuum deposition equipment
US20120258239A1 (en) * 2011-04-06 2012-10-11 Applied Materials, Inc. Evaporation system with measurement unit

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