JPS57101665A - Apparatus for preparing vapor deposition film - Google Patents

Apparatus for preparing vapor deposition film

Info

Publication number
JPS57101665A
JPS57101665A JP15029381A JP15029381A JPS57101665A JP S57101665 A JPS57101665 A JP S57101665A JP 15029381 A JP15029381 A JP 15029381A JP 15029381 A JP15029381 A JP 15029381A JP S57101665 A JPS57101665 A JP S57101665A
Authority
JP
Japan
Prior art keywords
substrate material
transferred
vapor deposition
containers
directions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15029381A
Other languages
Japanese (ja)
Other versions
JPS5914106B2 (en
Inventor
Toru Ochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP15029381A priority Critical patent/JPS5914106B2/en
Publication of JPS57101665A publication Critical patent/JPS57101665A/en
Publication of JPS5914106B2 publication Critical patent/JPS5914106B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide the titled apparatus capable of forming a metal thin film with a multi- layered structure within a short time and enhancing productivity thereof to a large extent which carries out vapor deposition of different kinds of vapor deposition substances against a film like substrate material when said substrate material is transferred to either forward and backward directions. CONSTITUTION:Between times when a film like substrate material 4 is transferred to forward and backward directions, a pair of evaporation source containers 6A. 6A' provided to left and right sides of a separating plate 5 are constituted so as to be replaced with other pair of evaporation source containers 6B, 6B'. Then, when the substrate material 4 is transferred from a supply roll 12 to a winding roll 13, slide plates 16, 16' are slid to mutually parted directions and, thereby, as shown in a Figure B, electron beams 11, 11' are irradiated to the evaporation substances 7, 7' in the containers 6A, 6A' to carry out vapor deposition of the substrate material 4. On the other hand, when the substrate material 4 is transferred to a direction revers to said direction, the slide plates 16, 16' are slid to mutually approached directions. Thereby, as shown in a Figure C, the substances 7, 7' in the containers 6B, 6B' are irradiated with electron beams 11, 11' and, therefore, even when the substrate material 4 is transferred to the reverse direction vapor deposition of a metal thin film is carried out under a condition similar to the condition when transferred to the forward direction.
JP15029381A 1981-09-22 1981-09-22 Vapor-deposited film manufacturing equipment Expired JPS5914106B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15029381A JPS5914106B2 (en) 1981-09-22 1981-09-22 Vapor-deposited film manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15029381A JPS5914106B2 (en) 1981-09-22 1981-09-22 Vapor-deposited film manufacturing equipment

Publications (2)

Publication Number Publication Date
JPS57101665A true JPS57101665A (en) 1982-06-24
JPS5914106B2 JPS5914106B2 (en) 1984-04-03

Family

ID=15493819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15029381A Expired JPS5914106B2 (en) 1981-09-22 1981-09-22 Vapor-deposited film manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS5914106B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158861A (en) * 1985-12-28 1987-07-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating device
JP2009230935A (en) * 2008-03-19 2009-10-08 Iwate Univ Forming method of multilayered film, multilayered film, and semiconductor device or liquid crystal device
WO2020025153A1 (en) * 2018-07-30 2020-02-06 Applied Materials, Inc. System and process for coating a substrate

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60142894U (en) * 1984-02-29 1985-09-21 ソニー株式会社 cassette tape recorder
JPS60194769U (en) * 1984-05-31 1985-12-25 シャープ株式会社 Small floppy disk drive unit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62158861A (en) * 1985-12-28 1987-07-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating device
JP2009230935A (en) * 2008-03-19 2009-10-08 Iwate Univ Forming method of multilayered film, multilayered film, and semiconductor device or liquid crystal device
WO2020025153A1 (en) * 2018-07-30 2020-02-06 Applied Materials, Inc. System and process for coating a substrate
WO2020025102A1 (en) * 2018-07-30 2020-02-06 Applied Materials, Inc. Method of coating a flexible substrate with a stack of layers, layer stack, and deposition apparatus for coating a flexible substrate with a stack of layers
CN112513318A (en) * 2018-07-30 2021-03-16 应用材料公司 System and process for coating a substrate

Also Published As

Publication number Publication date
JPS5914106B2 (en) 1984-04-03

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