JPS52152881A - Controller of film thickness in equipment for forming coated film - Google Patents
Controller of film thickness in equipment for forming coated filmInfo
- Publication number
- JPS52152881A JPS52152881A JP6931076A JP6931076A JPS52152881A JP S52152881 A JPS52152881 A JP S52152881A JP 6931076 A JP6931076 A JP 6931076A JP 6931076 A JP6931076 A JP 6931076A JP S52152881 A JPS52152881 A JP S52152881A
- Authority
- JP
- Japan
- Prior art keywords
- film
- controller
- equipment
- forming coated
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To carry out remarkably simple and surely the control of film thicness, particularly the control to the direction of width which has been regarded as difficult formerly and to make possible to obtain the thickness being uniform to the direction of width, by establishing the slit in the mask to be interposed between the substrate and the vapor generating source at the underside of the substrate to an appropriate shape in advance.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6931076A JPS52152881A (en) | 1976-06-15 | 1976-06-15 | Controller of film thickness in equipment for forming coated film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6931076A JPS52152881A (en) | 1976-06-15 | 1976-06-15 | Controller of film thickness in equipment for forming coated film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52152881A true JPS52152881A (en) | 1977-12-19 |
Family
ID=13398848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6931076A Pending JPS52152881A (en) | 1976-06-15 | 1976-06-15 | Controller of film thickness in equipment for forming coated film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52152881A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55103267U (en) * | 1978-12-27 | 1980-07-18 | ||
FR2581793A1 (en) * | 1985-05-07 | 1986-11-14 | Duruy Nicolas | Method and device for manufacturing electronic or optoelectronic components with vacuum evaporation deposition. |
-
1976
- 1976-06-15 JP JP6931076A patent/JPS52152881A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55103267U (en) * | 1978-12-27 | 1980-07-18 | ||
FR2581793A1 (en) * | 1985-05-07 | 1986-11-14 | Duruy Nicolas | Method and device for manufacturing electronic or optoelectronic components with vacuum evaporation deposition. |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51135461A (en) | Exposing-method | |
JPS51124739A (en) | An air fuel ratio control apparatus | |
JPS52152881A (en) | Controller of film thickness in equipment for forming coated film | |
JPS52111942A (en) | Equipment for applying paint | |
JPS52138073A (en) | Gas jetting apparatus | |
JPS5376748A (en) | Forming method of insulation fulm | |
JPS51138394A (en) | Semiconductor device | |
JPS546878A (en) | Continuous vapor deposition apparatus | |
JPS5286983A (en) | Ion plating apparatus | |
JPS5331934A (en) | Variable phase-shift circuit | |
JPS5214374A (en) | Treatment equpment for ion beam | |
JPS5219070A (en) | Distribution method | |
JPS5230844A (en) | Coating roll | |
JPS52140274A (en) | Pressure-reduction vapor growth method | |
JPS5348458A (en) | Production of semiconductor device | |
JPS5432978A (en) | Correcting method for pattern | |
JPS51124735A (en) | A control apparatus for the fuel amount control apparatus | |
JPS5413778A (en) | Production of semiconductor device | |
JPS5417944A (en) | Article to be coated in electrodeposit coating | |
JPS5384469A (en) | Electrode formation method | |
JPS51140889A (en) | A vapor phase growth apparatus | |
JPS5384563A (en) | Thin film pattern forming method | |
JPS51146541A (en) | Coating method and apparatus | |
JPS5313881A (en) | Ion plating apparatus | |
JPS51143589A (en) | A process and the apparatus for poly- olefine form |