JPS5286983A - Ion plating apparatus - Google Patents

Ion plating apparatus

Info

Publication number
JPS5286983A
JPS5286983A JP317776A JP317776A JPS5286983A JP S5286983 A JPS5286983 A JP S5286983A JP 317776 A JP317776 A JP 317776A JP 317776 A JP317776 A JP 317776A JP S5286983 A JPS5286983 A JP S5286983A
Authority
JP
Japan
Prior art keywords
ion plating
plating apparatus
substrate
film
alternating current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP317776A
Other languages
Japanese (ja)
Other versions
JPS5514140B2 (en
Inventor
Yoshito Fukube
Kazuo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP317776A priority Critical patent/JPS5286983A/en
Publication of JPS5286983A publication Critical patent/JPS5286983A/en
Publication of JPS5514140B2 publication Critical patent/JPS5514140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form the film on the substrate at low temperature, by impressing low alternating current voltage between the evaporation source and the substrate in treating room, connected to the vacuum exhaust system.
JP317776A 1976-01-16 1976-01-16 Ion plating apparatus Granted JPS5286983A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP317776A JPS5286983A (en) 1976-01-16 1976-01-16 Ion plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP317776A JPS5286983A (en) 1976-01-16 1976-01-16 Ion plating apparatus

Publications (2)

Publication Number Publication Date
JPS5286983A true JPS5286983A (en) 1977-07-20
JPS5514140B2 JPS5514140B2 (en) 1980-04-14

Family

ID=11550095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP317776A Granted JPS5286983A (en) 1976-01-16 1976-01-16 Ion plating apparatus

Country Status (1)

Country Link
JP (1) JPS5286983A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11707063B2 (en) 2016-08-23 2023-07-25 Bosquet Silicon Corp. Compound, production method therefor, and hydrogen supply method
WO2019021769A1 (en) 2017-07-27 2019-01-31 国立大学法人大阪大学 Drug and production method therefor
JP6893586B2 (en) 2019-01-24 2021-06-23 国立大学法人大阪大学 Drugs and their manufacturing methods

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974178A (en) * 1972-11-18 1974-07-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974178A (en) * 1972-11-18 1974-07-17

Also Published As

Publication number Publication date
JPS5514140B2 (en) 1980-04-14

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