JPS57101666A - Apparatus for preparing vapor deposition film - Google Patents

Apparatus for preparing vapor deposition film

Info

Publication number
JPS57101666A
JPS57101666A JP15029481A JP15029481A JPS57101666A JP S57101666 A JPS57101666 A JP S57101666A JP 15029481 A JP15029481 A JP 15029481A JP 15029481 A JP15029481 A JP 15029481A JP S57101666 A JPS57101666 A JP S57101666A
Authority
JP
Japan
Prior art keywords
film
dimension
vapor deposition
substrate material
deposition film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15029481A
Other languages
Japanese (ja)
Inventor
Toru Ochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP15029481A priority Critical patent/JPS57101666A/en
Publication of JPS57101666A publication Critical patent/JPS57101666A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Abstract

PURPOSE:To enable to flatten a film thickness of a metal thin film in a width direction thereof, in an evaporation source container containing an evaporation substance, by a method wherein a dimension between inner surfaces thereof in a running direction of a film-like substrate material is formed so as to be made larger in both end parts thereof than the dimension in a central part. CONSTITUTION:A dimension between inner surfaces 14 of an evaporation source container 8 in a running direction of a film-like substrate material is formed in such a manner that a dimension WB of both end parts B thereof is made larger than a dimension WA of a central part A thereof. Thereby, equalization in a width direction of a metal thin film formed on a surface of the film-like substrate material can be attained simply and efficiently and quality of a vapor deposition film is enhanced.
JP15029481A 1981-09-22 1981-09-22 Apparatus for preparing vapor deposition film Pending JPS57101666A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15029481A JPS57101666A (en) 1981-09-22 1981-09-22 Apparatus for preparing vapor deposition film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15029481A JPS57101666A (en) 1981-09-22 1981-09-22 Apparatus for preparing vapor deposition film

Publications (1)

Publication Number Publication Date
JPS57101666A true JPS57101666A (en) 1982-06-24

Family

ID=15493844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15029481A Pending JPS57101666A (en) 1981-09-22 1981-09-22 Apparatus for preparing vapor deposition film

Country Status (1)

Country Link
JP (1) JPS57101666A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059064A (en) * 1983-08-20 1985-04-05 ライボルト・アクチエンゲゼルシャフト Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process
KR100467805B1 (en) * 2002-01-22 2005-01-24 학교법인연세대학교 Linear or planar type evaporator for the controllable film thickness profile
KR100504477B1 (en) * 2002-11-05 2005-08-03 엘지전자 주식회사 Heating source apparatus for Organic electron luminescence
KR100794343B1 (en) 2006-08-01 2008-01-15 세메스 주식회사 Evaporator source of organic thin film vapor deposition apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059064A (en) * 1983-08-20 1985-04-05 ライボルト・アクチエンゲゼルシャフト Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process
KR100467805B1 (en) * 2002-01-22 2005-01-24 학교법인연세대학교 Linear or planar type evaporator for the controllable film thickness profile
KR100504477B1 (en) * 2002-11-05 2005-08-03 엘지전자 주식회사 Heating source apparatus for Organic electron luminescence
KR100794343B1 (en) 2006-08-01 2008-01-15 세메스 주식회사 Evaporator source of organic thin film vapor deposition apparatus

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