GB1529418A - Coating substrates - Google Patents

Coating substrates

Info

Publication number
GB1529418A
GB1529418A GB2187777A GB2187777A GB1529418A GB 1529418 A GB1529418 A GB 1529418A GB 2187777 A GB2187777 A GB 2187777A GB 2187777 A GB2187777 A GB 2187777A GB 1529418 A GB1529418 A GB 1529418A
Authority
GB
United Kingdom
Prior art keywords
substrates
movement
oscillating
speed
substrate holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2187777A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Heraeus Verwaltung GmbH
Original Assignee
Leybold Heraeus Verwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Verwaltung GmbH filed Critical Leybold Heraeus Verwaltung GmbH
Publication of GB1529418A publication Critical patent/GB1529418A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to a process for the uniform coating of sheet-like substrates by vacuum vapour deposition during repeated passage of the substrates through the vapour jet of an evaporator. The substrates are passed through by means of a continuously rotating substrate holder with simultaneous oscillating relative movement between substrate holder and evaporator. The oscillating movement takes place at right angles to the movement of the substrate holder through the vapour jet. To achieve the object of keeping differences in layer thickness in the edge regions of the substrates as small as possible, according to the invention the speed of the oscillating relative movement is controlled in such a way that the speed in the region of the points of reversal of the oscillating movement is reduced markedly below the speed in the case of a harmonic oscillating movement. Preferably, the oscillating movement is interrupted for a limited time in the region of the points of reversal.
GB2187777A 1976-06-02 1977-05-24 Coating substrates Expired GB1529418A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762624700 DE2624700A1 (en) 1976-06-02 1976-06-02 METHOD AND DEVICE FOR UNIFORM COATING OF FLAT SUBSTRATES

Publications (1)

Publication Number Publication Date
GB1529418A true GB1529418A (en) 1978-10-18

Family

ID=5979603

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2187777A Expired GB1529418A (en) 1976-06-02 1977-05-24 Coating substrates

Country Status (5)

Country Link
CH (1) CH630417A5 (en)
DE (1) DE2624700A1 (en)
FR (1) FR2353649A1 (en)
GB (1) GB1529418A (en)
IT (1) IT1076194B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043248A1 (en) * 1980-07-01 1982-01-06 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Process for the bulk production of alloys and apparatus therefor
DE4026174A1 (en) * 1989-08-16 1991-02-21 Qpl Ltd DEVICES FOR VACUUM VAMPING
EP1167566A1 (en) * 2000-06-22 2002-01-02 Matsushita Electric Works, Ltd. Apparatus for and method of vacuum vapor deposition and organic electroluminescent device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
DE3067724D1 (en) * 1980-02-07 1984-06-14 Matsushita Electric Ind Co Ltd Method of forming a glass spacer in the magnetic gap of a magnetic head
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film
DE19643702B4 (en) * 1996-10-23 2007-11-29 Ald Vacuum Technologies Ag Vacuum coating device for coating a substrate on all sides by rotation of the substrate in the material flow

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0043248A1 (en) * 1980-07-01 1982-01-06 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Process for the bulk production of alloys and apparatus therefor
DE4026174A1 (en) * 1989-08-16 1991-02-21 Qpl Ltd DEVICES FOR VACUUM VAMPING
US5121707A (en) * 1989-08-16 1992-06-16 Qpl Limited Apparatus for coating materials in a vacuum chamber
GB2234988B (en) * 1989-08-16 1993-12-08 Qpl Limited Improvements in vacuum deposition machines
EP1167566A1 (en) * 2000-06-22 2002-01-02 Matsushita Electric Works, Ltd. Apparatus for and method of vacuum vapor deposition and organic electroluminescent device
US6696096B2 (en) 2000-06-22 2004-02-24 Matsushita Electric Works, Ltd. Apparatus for and method of vacuum vapor deposition and organic electroluminescent device
CN100422380C (en) * 2000-06-22 2008-10-01 松下电工株式会社 Equipment and method for vacuum evaporation plating and organic fluorescent device

Also Published As

Publication number Publication date
IT1076194B (en) 1985-04-27
FR2353649A1 (en) 1977-12-30
FR2353649B3 (en) 1980-07-18
CH630417A5 (en) 1982-06-15
DE2624700A1 (en) 1977-12-15

Similar Documents

Publication Publication Date Title
DE3370832D1 (en) Photo-assisted cvd
FR2371524A1 (en) PROCESS FOR DEPOSITING A THIN LAYER BY DECOMPOSITION OF A GAS IN A PLASMA
ES483941A1 (en) Semiconductor processing
TW357404B (en) Apparatus and method for processing of plasma
IT1049804B (en) PROCESS AND APPARATUS TO PRODUCE THIN COMPOUND FURS FOR DEPOSITION FROM THE GASEOUS PHASE
GB1529418A (en) Coating substrates
GB1005588A (en) Methods of delineating patterns on surfaces
GB1393496A (en) Vacuum plant for the deposition of layer
FR2083740A5 (en) Laser applied surface film
FR2288793A1 (en) Vapour deposition in vacuum on substrates sensitive to heat - using electron beam device suitable for glass and plastic substrates
Shimizu et al. Laser-induced MOCVD of ZnO thin films
JPS5435176A (en) Depositing method by vacuum evaporation
JPS5462984A (en) Masking deposition method
FR2352066A1 (en) MASK-FORMING COATING FOR DEPOSIT OF DIELECTRIC LAYERS ON SUBSTRATES, BY VACUUM SPRAYING OR CATHODIC SPRAYING
GB1199006A (en) Arrangements for Depositing Interference Layers onto Concavely Curved Surfaces of Rotation
JPS5317583A (en) Process for forming vacuum evaporation layer on largeesized substrate surface
JPS5591971A (en) Thin film forming method
JPS5399082A (en) High frequency sputtering apparatus
JPS5629671A (en) Formation of coating film
JPS5620162A (en) Vapor depositing method
CH473907A (en) Process for depositing a metal layer on a substrate by vacuum evaporation
JPS5785970A (en) Formation of thin film
JPS5210872A (en) Apparatus for production of compound thin films
JPS5541911A (en) Vapor deposition apparatus
JPS56147656A (en) Vibrating blade coater

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee