JPS5629671A - Formation of coating film - Google Patents

Formation of coating film

Info

Publication number
JPS5629671A
JPS5629671A JP10345679A JP10345679A JPS5629671A JP S5629671 A JPS5629671 A JP S5629671A JP 10345679 A JP10345679 A JP 10345679A JP 10345679 A JP10345679 A JP 10345679A JP S5629671 A JPS5629671 A JP S5629671A
Authority
JP
Japan
Prior art keywords
substrate
formation
coating film
chromium
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10345679A
Other languages
Japanese (ja)
Other versions
JPS6048030B2 (en
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP54103456A priority Critical patent/JPS6048030B2/en
Publication of JPS5629671A publication Critical patent/JPS5629671A/en
Publication of JPS6048030B2 publication Critical patent/JPS6048030B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve a pattern on a semiconducter substrate by a method wherein the formation of a coating film of a metal or a metal compound on a surface of the substrate is carried out repeatedly over plural numbers while a coated amount per a time unit is increased or decreased. CONSTITUTION:By carrying out the formation of the coating film by accumulation on the surface of the substrate intermittently or carrying out the increase or the decrease of a coating amount per a time unit repeatedly over plural times, irregularities of a peripheral edge portion of a coated pattern are reduced. For example, in a vacuum vapor depositing apparatus containing the substrate 2 maintained by a rotating holder 3 in a chamber 1 thereof, when a evaporation source 4 of metal chromium is heated and an evaporated amount is reached to 60Angstrom /min. constantly, a shutter 5 is opened for 2min. to deposit a chromium layer with thickness of 120Angstrom and, subsequently, the shutter 5 is closed for several ten sec., thereafter opened again to carry out the deposition. By repeating this procedure five times, a chromium layer with thickness of 600Angstrom is deposited. Subsequently, the deposition is carried out similarly 5 times by using chromium oxide to deposit a 60Angstrom layer thereof. Next, when a mask pattern is fabricated by wet etching, irregularities on a peripheral edge surface are reduced and a sharp edge surface for superior to a conventional one is obtained.
JP54103456A 1979-08-14 1979-08-14 How to form a photomask Expired JPS6048030B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54103456A JPS6048030B2 (en) 1979-08-14 1979-08-14 How to form a photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54103456A JPS6048030B2 (en) 1979-08-14 1979-08-14 How to form a photomask

Publications (2)

Publication Number Publication Date
JPS5629671A true JPS5629671A (en) 1981-03-25
JPS6048030B2 JPS6048030B2 (en) 1985-10-24

Family

ID=14354521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54103456A Expired JPS6048030B2 (en) 1979-08-14 1979-08-14 How to form a photomask

Country Status (1)

Country Link
JP (1) JPS6048030B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283461A (en) * 1985-10-09 1987-04-16 Seiko Epson Corp External parts for timepiece
JP2004046134A (en) * 2002-05-24 2004-02-12 Optical Coating Lab Inc Coating for forming aperture with high sharpness

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283461A (en) * 1985-10-09 1987-04-16 Seiko Epson Corp External parts for timepiece
JP2004046134A (en) * 2002-05-24 2004-02-12 Optical Coating Lab Inc Coating for forming aperture with high sharpness

Also Published As

Publication number Publication date
JPS6048030B2 (en) 1985-10-24

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