JP2014216465A - 半導体装置 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 195
- 238000002955 isolation Methods 0.000 claims abstract description 115
- 239000000758 substrate Substances 0.000 claims abstract description 62
- 230000036413 temperature sense Effects 0.000 claims abstract description 23
- 239000012212 insulator Substances 0.000 claims description 60
- 238000001514 detection method Methods 0.000 abstract description 14
- 230000007547 defect Effects 0.000 description 32
- 230000003071 parasitic effect Effects 0.000 description 16
- 239000012535 impurity Substances 0.000 description 15
- 230000003321 amplification Effects 0.000 description 11
- 238000003199 nucleic acid amplification method Methods 0.000 description 11
- 238000005121 nitriding Methods 0.000 description 9
- 239000000969 carrier Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910004541 SiN Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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Abstract
【解決手段】 半導体装置10は、電力用半導体素子部14と温度センスダイオード部12が設けられた半導体基板11を備える。温度センスダイオード部12は第1半導体領域50と、第2半導体領域54と、第1ベース領域60と、第1ドリフト領域32aを備える。半導体基板11には、第1ベース領域60を貫通して第1ドリフト領域32aにまで延びており、温度センスダイオード部12の外周を取り囲む分離トレンチ62が形成されている。分離トレンチ62の一方の側壁62bの少なくとも一部は電力用半導体素子部14と接しており、分離トレンチ62の他方の側壁62aは温度センスダイオード部12と接している。
【選択図】図1
Description
11:半導体基板
12:温度センスダイオード部
14:絶縁ゲート型半導体素子部
32a、32b:ドリフト領域
36:ベース領域
38:コンタクト領域
40:ソース領域
50:アノード領域
54:カソード領域
60:ベース領域
62:分離トレンチ
62a、62b:側壁
Claims (7)
- 電力用半導体素子部と温度センスダイオード部が設けられた半導体基板を備えており、
温度センスダイオード部は、
第1導電型であり、半導体基板の上面に臨む範囲に配置されている第1半導体領域と、
第2導電型であり、半導体基板の上面に臨む範囲に配置されている第2半導体領域と、
第1導電型であり、半導体基板の上面に臨む範囲に配置されており、第1半導体領域及び第2半導体領域に接するとともにこれらを取り囲んでいる第1ベース領域と、
第2導電型であり、第1ベース領域の下面に接しており、第1ベース領域によって第1半導体領域及び第2半導体領域から分離されている第1ドリフト領域と、を備えており、
半導体基板には、第1ベース領域を貫通して第1ドリフト領域にまで延びており、温度センスダイオード部の外周を取り囲む分離トレンチが形成されており、
分離トレンチの一方の側壁の少なくとも一部は電力用半導体素子部と接しており、分離トレンチの他方の側壁は温度センスダイオード部と接していることを特徴とする半導体装置。 - 分離トレンチの内部全体には絶縁体が充填されていることを特徴とする、請求項1に記載の半導体装置。
- 電力用半導体素子部は、
第1導電型であり、半導体基板の上面に臨む範囲に配置されている第3半導体領域と、
第2導電型であり、半導体基板の上面に臨む範囲に配置されている第4半導体領域と、
第1導電型であり、第3半導体領域と第4半導体領域の下面に接している第2ベース領域と、
第2導電型であり、第2ベース領域の下方に位置しており、第2ベース領域によって第3半導体領域及び第4半導体領域から分離されている第2ドリフト領域と、
第2ベース領域を貫通して第2ドリフト領域にまで延びるゲートトレンチ内に配置され、第4半導体領域と第2ドリフト領域とを分離している範囲の第2ベース領域と対向している第1ゲート電極と、
第1ゲート電極とゲートトレンチの内壁との間に配置されている第1絶縁体と、を備えており、
分離トレンチ内には、分離トレンチの一方の側壁側で、第4半導体領域と第2ドリフト領域を分離している範囲の第2ベース領域と対向するとともに、分離トレンチの他方の側壁側で第1ベース領域と対向している第2ゲート電極と、第2ゲート電極と分離トレンチの内壁との間に配置されている第2絶縁体と、が配置されており、
分離トレンチの他方の側壁における第2絶縁体の厚みは、分離トレンチの一方の側壁における第2絶縁体の厚みよりも厚いことを特徴とする、請求項1に記載の半導体装置。 - 温度センスダイオード部は、
第1ドリフト領域の上面に接するとともに第1ベース領域の下面と接している第1導電型の埋込み層を備えており、
埋込み層は、分離トレンチの少なくとも他方の側壁と接することを特徴とする、請求項1〜3のいずれか一項に記載の半導体装置。 - 温度センスダイオード部は、
第1ドリフト領域の上面に接するとともに第1ベース領域の下面と接している第1導電型の埋込み層を備えており、
埋込み層と分離トレンチとの間には第1ドリフト領域が配置されていることを特徴とする、請求項1〜3のいずれか一項に記載の半導体装置。 - 第1ベース領域にはライフタイムキラーが含まれていることを特徴とする、請求項1〜5のいずれか一項に記載の半導体装置。
- 半導体基板はSiCを材料とすることを特徴とする請求項1〜6のいずれか一項に記載の半導体装置。
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2017005153A (ja) * | 2015-06-11 | 2017-01-05 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP2017174863A (ja) * | 2016-03-18 | 2017-09-28 | トヨタ自動車株式会社 | 半導体装置 |
JP2017183581A (ja) * | 2016-03-31 | 2017-10-05 | ルネサスエレクトロニクス株式会社 | 半導体デバイス及び半導体装置 |
WO2017208735A1 (ja) * | 2016-06-03 | 2017-12-07 | 富士電機株式会社 | 半導体装置 |
WO2019106948A1 (ja) * | 2017-11-30 | 2019-06-06 | 住友電気工業株式会社 | ゲート絶縁型トランジスタ |
JP2019106507A (ja) * | 2017-12-14 | 2019-06-27 | 富士電機株式会社 | 炭化シリコン半導体装置及びその製造方法 |
JP2019149569A (ja) * | 2019-05-09 | 2019-09-05 | ローム株式会社 | 半導体装置および半導体モジュール |
JP2020087990A (ja) * | 2018-11-16 | 2020-06-04 | 株式会社 日立パワーデバイス | 半導体装置およびそれを用いた電力変換装置 |
CN111354779A (zh) * | 2018-12-21 | 2020-06-30 | 三菱电机株式会社 | 半导体装置及半导体装置的制造方法 |
JP2021002683A (ja) * | 2020-10-02 | 2021-01-07 | ローム株式会社 | 半導体装置および半導体モジュール |
US11257812B2 (en) | 2015-02-13 | 2022-02-22 | Rohm Co., Ltd. | Semiconductor device and semiconductor module |
Families Citing this family (13)
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US20100117117A1 (en) * | 2008-11-10 | 2010-05-13 | Infineon Technologies Ag | Vertical IGBT Device |
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