JP2014140065A5 - - Google Patents

Download PDF

Info

Publication number
JP2014140065A5
JP2014140065A5 JP2014075479A JP2014075479A JP2014140065A5 JP 2014140065 A5 JP2014140065 A5 JP 2014140065A5 JP 2014075479 A JP2014075479 A JP 2014075479A JP 2014075479 A JP2014075479 A JP 2014075479A JP 2014140065 A5 JP2014140065 A5 JP 2014140065A5
Authority
JP
Japan
Prior art keywords
substrate
photodiode
region
type
substrate according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014075479A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014140065A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2014140065A publication Critical patent/JP2014140065A/ja
Publication of JP2014140065A5 publication Critical patent/JP2014140065A5/ja
Pending legal-status Critical Current

Links

JP2014075479A 2008-08-29 2014-04-01 半導体基板用集積フォトダイオード Pending JP2014140065A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9329208P 2008-08-29 2008-08-29
US61/093,292 2008-08-29

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2011525243A Division JP5734854B2 (ja) 2008-08-29 2009-08-28 半導体基板用集積フォトダイオード

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016060064A Division JP6346911B2 (ja) 2008-08-29 2016-03-24 半導体基板用集積フォトダイオード

Publications (2)

Publication Number Publication Date
JP2014140065A JP2014140065A (ja) 2014-07-31
JP2014140065A5 true JP2014140065A5 (enExample) 2015-04-02

Family

ID=41722320

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2011525243A Expired - Fee Related JP5734854B2 (ja) 2008-08-29 2009-08-28 半導体基板用集積フォトダイオード
JP2014075479A Pending JP2014140065A (ja) 2008-08-29 2014-04-01 半導体基板用集積フォトダイオード
JP2016060064A Expired - Fee Related JP6346911B2 (ja) 2008-08-29 2016-03-24 半導体基板用集積フォトダイオード

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2011525243A Expired - Fee Related JP5734854B2 (ja) 2008-08-29 2009-08-28 半導体基板用集積フォトダイオード

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2016060064A Expired - Fee Related JP6346911B2 (ja) 2008-08-29 2016-03-24 半導体基板用集積フォトダイオード

Country Status (5)

Country Link
US (3) US8410568B2 (enExample)
JP (3) JP5734854B2 (enExample)
KR (2) KR101627684B1 (enExample)
TW (1) TW201013953A (enExample)
WO (1) WO2010025391A2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8410568B2 (en) 2008-08-29 2013-04-02 Tau-Metrix, Inc. Integrated photodiode for semiconductor substrates
JP5387212B2 (ja) * 2009-07-31 2014-01-15 富士通セミコンダクター株式会社 半導体装置及びその製造方法
US8787752B2 (en) * 2009-08-21 2014-07-22 California Institute Of Technology Systems and methods for optically powering transducers and related transducers
US8586403B2 (en) * 2011-02-15 2013-11-19 Sunpower Corporation Process and structures for fabrication of solar cells with laser ablation steps to form contact holes
US8486746B2 (en) * 2011-03-29 2013-07-16 Sunpower Corporation Thin silicon solar cell and method of manufacture
US9559228B2 (en) 2011-09-30 2017-01-31 Sunpower Corporation Solar cell with doped groove regions separated by ridges
US8992803B2 (en) 2011-09-30 2015-03-31 Sunpower Corporation Dopant ink composition and method of fabricating a solar cell there from
US8586397B2 (en) 2011-09-30 2013-11-19 Sunpower Corporation Method for forming diffusion regions in a silicon substrate
TWI427783B (zh) * 2011-10-28 2014-02-21 Ti Shiue Biotech Inc 應用於分子檢測與鑑別的多接面結構之光二極體及其製造方法
WO2013130257A1 (en) 2012-03-01 2013-09-06 California Institute Of Technology Methods of modulating microlasers at ultralow power levels, and systems thereof
JP2015530564A (ja) 2012-07-25 2015-10-15 カリフォルニア インスティチュート オブ テクノロジー 機能ゲート及びベース電極を有するナノピラー電界効果型及び接合型トランジスタ
US9252234B2 (en) * 2012-09-06 2016-02-02 International Business Machines Corporation Partially-blocked well implant to improve diode ideality with SiGe anode
WO2014074180A1 (en) 2012-11-09 2014-05-15 California Institute Of Technology Nanopillar field-effect and junction transistors
US11837669B2 (en) * 2013-03-15 2023-12-05 ActLight SA Photo detector systems and methods of operating same
WO2014201286A1 (en) 2013-06-12 2014-12-18 Popovic Milos A Optical modulator from standard fabrication processing
DE102014218772A1 (de) * 2014-09-18 2016-03-24 Technische Universität Dresden Photovoltaisches Element
FR3029373B1 (fr) * 2014-12-02 2018-01-12 Sunpartner Technologies Dispositif electronique associe a un module photovoltaique pour optimiser le debit d'une transmission bidirectionnelle de type vlc
US11105974B2 (en) * 2015-06-30 2021-08-31 Massachusetts Institute Of Technology Waveguide-coupled silicon-germanium photodetectors and fabrication methods for same
CN110931578B (zh) * 2018-09-20 2024-05-28 台湾积体电路制造股份有限公司 光电探测器及其形成方法
EP3850665B1 (en) * 2019-01-30 2023-11-15 Yangtze Memory Technologies Co., Ltd. Capacitor structure having vertical diffusion plates
US10892373B2 (en) * 2019-02-07 2021-01-12 Newport Fab, Llc Germanium photodiode with silicon cap
US11251217B2 (en) * 2019-04-17 2022-02-15 ActLight SA Photodetector sensor arrays
US12474453B2 (en) 2022-01-20 2025-11-18 ActLight SA Control techniques for photodetector systems
CN115206940B (zh) * 2022-06-30 2024-11-29 上海韦尔半导体股份有限公司 一种用于插指形光电二极管电势分析的测试结构与测试方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5181586A (enExample) * 1975-01-13 1976-07-16 Nippon Electric Co
JPS5526661A (en) * 1978-08-15 1980-02-26 Sharp Corp Photo-semiconductor device
JPS57100761A (en) * 1980-12-16 1982-06-23 Fujitsu Ltd Semiconductor light sensitive device
JPS6355980A (ja) * 1986-08-26 1988-03-10 Matsushita Electric Works Ltd フオトダイオ−ドアレイの製法
JPS6481522A (en) * 1987-09-24 1989-03-27 Agency Ind Science Techn Optical control circuit and semiconductor device constituting said circuit
JP3029497B2 (ja) * 1991-12-20 2000-04-04 ローム株式会社 フォトダイオードアレイおよびその製造法
JPH06268247A (ja) * 1993-03-15 1994-09-22 Matsushita Electric Works Ltd 光結合型半導体リレー
US5360987A (en) * 1993-11-17 1994-11-01 At&T Bell Laboratories Semiconductor photodiode device with isolation region
JPH09260501A (ja) * 1996-03-25 1997-10-03 Sanyo Electric Co Ltd ホトダイオード内蔵半導体集積回路
JPH09260715A (ja) * 1996-03-25 1997-10-03 Sanyo Electric Co Ltd ホトダイオード内蔵半導体集積回路
JPH1051017A (ja) * 1996-08-02 1998-02-20 Sanyo Electric Co Ltd 半導体装置
JP2970580B2 (ja) * 1997-03-21 1999-11-02 日本電気株式会社 半導体チップ、光受信モジュールおよび光受信モジュールの製造方法
US6529018B1 (en) * 1998-08-28 2003-03-04 International Business Machines Corporation Method for monitoring defects in polysilicon gates in semiconductor devices responsive to illumination by incident light
JP2001077400A (ja) * 1999-08-31 2001-03-23 Tokai Rika Co Ltd 半導体フォトデバイス
TW419834B (en) 1999-09-01 2001-01-21 Opto Tech Corp Photovoltaic generator
JP2001135849A (ja) * 1999-11-05 2001-05-18 Matsushita Electronics Industry Corp 受光装置
JP2003007975A (ja) * 2001-06-27 2003-01-10 Sony Corp 半導体装置およびその製造方法
US20030015705A1 (en) 2001-07-17 2003-01-23 Motorola, Inc. Structure and method for fabricating semiconductor structures and devices with an energy source
JP3859480B2 (ja) 2001-10-17 2006-12-20 株式会社ルネサステクノロジ 検査方法
JP2004006778A (ja) * 2002-04-04 2004-01-08 Toshiba Corp Mosfet、その製造方法及びそれを用いた光半導体リレー装置
GB0216075D0 (en) 2002-07-11 2002-08-21 Qinetiq Ltd Photodetector circuits
KR20040057238A (ko) 2002-12-26 2004-07-02 삼성전기주식회사 포토다이오드, 이를 구비한 광전자 집적회로장치 및 그제조방법
JP2005086063A (ja) 2003-09-10 2005-03-31 Keio Gijuku フォトダイオード及び集積化光受信器
JP2005158834A (ja) 2003-11-21 2005-06-16 Sanyo Electric Co Ltd 光半導体装置
TWI226137B (en) 2004-01-09 2005-01-01 Integrated Crystal Technology Structure of dual-pad high speed photodiode
US7535089B2 (en) 2005-11-01 2009-05-19 Massachusetts Institute Of Technology Monolithically integrated light emitting devices
US7928317B2 (en) * 2006-06-05 2011-04-19 Translucent, Inc. Thin film solar cell
US8410568B2 (en) 2008-08-29 2013-04-02 Tau-Metrix, Inc. Integrated photodiode for semiconductor substrates

Similar Documents

Publication Publication Date Title
JP2014140065A5 (enExample)
JP2012501554A5 (enExample)
WO2010025391A3 (en) Integrated photodiode for semiconductor substrates
EP3712945A3 (en) Stacked backside illuminated spad array
JP2016529698A5 (enExample)
JP2015188049A5 (enExample)
JP2015122525A5 (enExample)
EP2306507A3 (en) Semiconductor device
EA201890167A1 (ru) Светодиоды и фотодетекторы, сформированные из нанопроводников/нанопирамид
WO2016064134A3 (en) Light emitting device and method of fabricating the same
CA2999401C (en) LIGHT EMITTING DEVICE, INTEGRATED LIGHT EMITTING DEVICE AND LIGHT EMITTING MODULE
MX362141B (es) Fabricacion de una region del emisor de celdas solares mediante el uso de implantacion ionica.
WO2011135471A3 (en) Light emitting diode with trenches and a top contact
EP2597680A3 (en) Semiconductor device
MX363099B (es) Metodos y aparato para fabricar obleas semiconductoras delgadas con regiones controladas localmente que son relativamente mas gruesas que otras regiones y esas obleas.
JP2013171888A5 (enExample)
MY181161A (en) Solar cell and method for producing solar cell
WO2013083528A3 (de) Halbleiterleuchte
MA39682B2 (fr) Substrat de câblage et dispositif photovoltaique.
WO2016053414A3 (en) Radiation-detecting structures and fabrication methods thereof
EA201692520A1 (ru) Фотоэлектрический элемент
JP2015119093A5 (enExample)
WO2012156215A3 (de) Fotodiode und herstellungsverfahren
JP2013055245A5 (enExample)
FR2977984B1 (fr) Generateur thermoelectrique integre, et circuit integre comprenant un tel generateur