JP2014063186A5 - - Google Patents

Download PDF

Info

Publication number
JP2014063186A5
JP2014063186A5 JP2013235744A JP2013235744A JP2014063186A5 JP 2014063186 A5 JP2014063186 A5 JP 2014063186A5 JP 2013235744 A JP2013235744 A JP 2013235744A JP 2013235744 A JP2013235744 A JP 2013235744A JP 2014063186 A5 JP2014063186 A5 JP 2014063186A5
Authority
JP
Japan
Prior art keywords
composition
heptanol
lcd
liquid composition
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013235744A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014063186A (ja
JP6006711B2 (ja
Filing date
Publication date
Priority claimed from KR1020100122001A external-priority patent/KR101089211B1/ko
Application filed filed Critical
Publication of JP2014063186A publication Critical patent/JP2014063186A/ja
Publication of JP2014063186A5 publication Critical patent/JP2014063186A5/ja
Application granted granted Critical
Publication of JP6006711B2 publication Critical patent/JP6006711B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013235744A 2010-12-02 2013-11-14 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 Active JP6006711B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100122001A KR101089211B1 (ko) 2010-12-02 2010-12-02 1차 알칸올 아민을 포함하는 lcd 제조용 포토레지스트 박리액 조성물
KR10-2010-0122001 2010-12-02

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2011187941A Division JP2012118502A (ja) 2010-12-02 2011-08-30 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016176121A Division JP2017040928A (ja) 2010-12-02 2016-09-09 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物

Publications (3)

Publication Number Publication Date
JP2014063186A JP2014063186A (ja) 2014-04-10
JP2014063186A5 true JP2014063186A5 (ru) 2014-10-16
JP6006711B2 JP6006711B2 (ja) 2016-10-12

Family

ID=45505534

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2011187941A Pending JP2012118502A (ja) 2010-12-02 2011-08-30 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物
JP2013235744A Active JP6006711B2 (ja) 2010-12-02 2013-11-14 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物
JP2016176121A Pending JP2017040928A (ja) 2010-12-02 2016-09-09 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2011187941A Pending JP2012118502A (ja) 2010-12-02 2011-08-30 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2016176121A Pending JP2017040928A (ja) 2010-12-02 2016-09-09 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物

Country Status (4)

Country Link
JP (3) JP2012118502A (ru)
KR (1) KR101089211B1 (ru)
CN (2) CN105676602A (ru)
TW (1) TWI465564B (ru)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140100151A1 (en) * 2012-10-08 2014-04-10 Air Products And Chemicals Inc. Stripping and Cleaning Compositions for Removal of Thick Film Resist
KR102032321B1 (ko) * 2012-11-13 2019-10-15 동우 화인켐 주식회사 얼룩 발생 방지용 레지스트 박리액 조성물
KR101668063B1 (ko) * 2013-05-07 2016-10-20 주식회사 엘지화학 포토레지스트 제거용 스트리퍼 조성물 및 이를 사용한 포토레지스트의 박리방법
JP6571524B2 (ja) * 2013-08-22 2019-09-04 日産化学株式会社 横電界駆動型液晶表示素子用液晶配向膜を有する基板の製造方法
KR102012464B1 (ko) 2013-09-06 2019-08-20 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 평판표시장치의 제조방법
KR102009533B1 (ko) 2013-09-06 2019-08-09 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 평판표시장치의 제조방법
TWI518467B (zh) * 2013-11-15 2016-01-21 達興材料股份有限公司 光阻脫除劑和電子元件及其製造方法
KR101764577B1 (ko) * 2015-08-13 2017-08-23 엘티씨 (주) Lcd 제조용 포토레지스트 박리액 조성물
CN111781808B (zh) * 2015-09-16 2024-06-07 东友精细化工有限公司 抗蚀剂剥离液组合物、平板显示器基板及其制造方法
CN106919013B (zh) * 2015-12-28 2021-12-07 安集微电子(上海)有限公司 一种低蚀刻的去除光阻残留物的清洗液
CN106019863B (zh) * 2016-07-14 2019-08-09 江阴江化微电子材料股份有限公司 一种高世代平板铜制程光阻剥离液
WO2018122992A1 (ja) * 2016-12-28 2018-07-05 パナソニックIpマネジメント株式会社 レジスト剥離液
CN108949383B (zh) * 2017-05-17 2021-05-25 东曹株式会社 清洗剂组合物和使用其的清洗方法
CN107577121A (zh) * 2017-08-29 2018-01-12 昆山艾森半导体材料有限公司 一种光刻胶去胶液
KR102224907B1 (ko) * 2018-04-17 2021-03-09 엘티씨 (주) 드라이필름 레지스트 박리액 조성물
KR102324927B1 (ko) * 2019-10-01 2021-11-12 동우 화인켐 주식회사 얼룩 발생 방지용 레지스트 박리액 조성물
KR102334425B1 (ko) 2019-11-21 2021-12-01 엘티씨 (주) 디스플레이 제조용 포토레지스트 박리액 조성물

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE59971B1 (en) * 1986-11-10 1994-05-04 Baker J T Inc Stripping compositions and their use for stripping resists from substrates
JP3167664B2 (ja) * 1997-10-28 2001-05-21 三洋電機株式会社 ディジタルカメラ
US6440326B1 (en) * 1998-08-13 2002-08-27 Mitsubishi Gas Chemical Company, Inc. Photoresist removing composition
KR100268108B1 (ko) * 1998-08-25 2000-12-01 윤종용 포토레지스트용 스트리퍼 조성물
JP4229552B2 (ja) * 1998-12-25 2009-02-25 東京応化工業株式会社 ホトレジスト用剥離液組成物およびこれを用いたホトレジスト剥離方法
JP2001209190A (ja) * 2000-01-25 2001-08-03 Nagase Denshi Kagaku Kk フォトレジスト剥離剤組成物及びその使用方法
KR100360985B1 (ko) * 2000-04-26 2002-11-18 주식회사 동진쎄미켐 레지스트 스트리퍼 조성물
JP2001350276A (ja) * 2000-06-05 2001-12-21 Nagase Kasei Kogyo Kk フォトレジスト剥離剤組成物及びその使用方法
JP2002072505A (ja) * 2000-08-29 2002-03-12 Nagase Kasei Kogyo Kk フォトレジスト剥離剤組成物およびその使用方法
JP4085262B2 (ja) * 2003-01-09 2008-05-14 三菱瓦斯化学株式会社 レジスト剥離剤
TWI315030B (en) * 2003-06-26 2009-09-21 Dongwoo Fine Chem Co Ltd Photoresist stripper composition, and exfoliation method of a photoresist using it
US20050032657A1 (en) * 2003-08-06 2005-02-10 Kane Sean Michael Stripping and cleaning compositions for microelectronics
US7384900B2 (en) * 2003-08-27 2008-06-10 Lg Display Co., Ltd. Composition and method for removing copper-compatible resist
JPWO2005040931A1 (ja) * 2003-10-29 2007-04-19 ナガセケムテックス株式会社 フォトレジスト剥離用組成物及び剥離方法
KR20050110955A (ko) * 2004-05-20 2005-11-24 금호석유화학 주식회사 포토레지스트용 스트리퍼 조성물 및 이를 포토레지스트박리에 사용하는 방법
EP1787168B1 (en) * 2004-07-15 2010-06-16 MALLINCKRODT BAKER, Inc. Non-aqueous microelectronic cleaning compositions containing fructose
JP4846301B2 (ja) * 2004-08-30 2011-12-28 サムスン エレクトロニクス カンパニー リミテッド 薄膜トランジスタ基板の製造方法及びストリッピング組成物
WO2006081406A1 (en) * 2005-01-27 2006-08-03 Advanced Technology Materials, Inc. Compositions for processing of semiconductor substrates
KR20070035722A (ko) * 2005-09-28 2007-04-02 동우 화인켐 주식회사 포토레지스트 박리 조성물 및 이를 이용한 반도체 소자의제조방법
JP2007114519A (ja) * 2005-10-20 2007-05-10 Tokyo Ohka Kogyo Co Ltd ホトレジスト用剥離液
JP2008191631A (ja) * 2006-08-21 2008-08-21 Tosoh Corp レジスト除去用組成物
JP2008133529A (ja) * 2006-08-29 2008-06-12 Rohm & Haas Electronic Materials Llc 剥離方法
KR20080076016A (ko) * 2007-02-14 2008-08-20 동우 화인켐 주식회사 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법
JP4692497B2 (ja) * 2007-02-28 2011-06-01 ナガセケムテックス株式会社 フォトレジスト剥離剤組成物
JP4716225B2 (ja) * 2007-05-15 2011-07-06 ナガセケムテックス株式会社 フォトレジスト剥離剤組成物
JP4962254B2 (ja) * 2007-10-10 2012-06-27 東ソー株式会社 レジスト除去用組成物及びそれを用いたレジスト除去方法
KR101286777B1 (ko) * 2007-10-17 2013-07-17 헨켈 코포레이션 박리액 조성물, 그것을 이용한 수지층의 박리 방법
TWI450052B (zh) * 2008-06-24 2014-08-21 Dynaloy Llc 用於後段製程操作有效之剝離溶液
JP5302334B2 (ja) * 2008-11-28 2013-10-02 出光興産株式会社 防食性フォトレジスト剥離剤組成物

Similar Documents

Publication Publication Date Title
JP2014063186A5 (ru)
JP2012530597A5 (ru)
JP2013541600A5 (ru)
JP2014520090A5 (ru)
JP2013242517A5 (ru)
JP2012204605A5 (ru)
JP2016527319A5 (ru)
JP2013531183A5 (ru)
JP2013189393A5 (ru)
JP2015209406A5 (ru)
JP2013227283A5 (ru)
JP2013010788A5 (ru)
CN302490315S (zh) 空气净化器(普通型)
CN302416426S (zh) 净水器(ep2231)
CN302496734S (zh) 低压无功补偿装置(智能集成)
CN302344276S (zh) 头罩(方型4号)
CN302082376S (zh) 喷头(三层次反射喷头)
CN302290643S (zh) 瓶贴(传养蜂柚2012-2)
CN302354307S (zh) 皮套(“大”型折法)
CN302204683S (zh) 数字化电脑摇头灯(mdp180)
CN302441779S (zh) 净水机(13-01)
CN302384404S (zh) 净水器(清华吉融锌一代)
CN302011837S (zh) 空气净化器(epi808)
TH47647S1 (th) คอมพิวเตอร์แบบพกพา
CN302412430S (zh) 包装盒(TiBAO-A018)