JP2014063186A5 - - Google Patents
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- Publication number
- JP2014063186A5 JP2014063186A5 JP2013235744A JP2013235744A JP2014063186A5 JP 2014063186 A5 JP2014063186 A5 JP 2014063186A5 JP 2013235744 A JP2013235744 A JP 2013235744A JP 2013235744 A JP2013235744 A JP 2013235744A JP 2014063186 A5 JP2014063186 A5 JP 2014063186A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- heptanol
- lcd
- liquid composition
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100122001A KR101089211B1 (ko) | 2010-12-02 | 2010-12-02 | 1차 알칸올 아민을 포함하는 lcd 제조용 포토레지스트 박리액 조성물 |
KR10-2010-0122001 | 2010-12-02 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011187941A Division JP2012118502A (ja) | 2010-12-02 | 2011-08-30 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016176121A Division JP2017040928A (ja) | 2010-12-02 | 2016-09-09 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014063186A JP2014063186A (ja) | 2014-04-10 |
JP2014063186A5 true JP2014063186A5 (ru) | 2014-10-16 |
JP6006711B2 JP6006711B2 (ja) | 2016-10-12 |
Family
ID=45505534
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011187941A Pending JP2012118502A (ja) | 2010-12-02 | 2011-08-30 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
JP2013235744A Active JP6006711B2 (ja) | 2010-12-02 | 2013-11-14 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
JP2016176121A Pending JP2017040928A (ja) | 2010-12-02 | 2016-09-09 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011187941A Pending JP2012118502A (ja) | 2010-12-02 | 2011-08-30 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016176121A Pending JP2017040928A (ja) | 2010-12-02 | 2016-09-09 | 1級アルカノールアミンを含むlcd製造用フォトレジスト剥離液組成物 |
Country Status (4)
Country | Link |
---|---|
JP (3) | JP2012118502A (ru) |
KR (1) | KR101089211B1 (ru) |
CN (2) | CN105676602A (ru) |
TW (1) | TWI465564B (ru) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20140100151A1 (en) * | 2012-10-08 | 2014-04-10 | Air Products And Chemicals Inc. | Stripping and Cleaning Compositions for Removal of Thick Film Resist |
KR102032321B1 (ko) * | 2012-11-13 | 2019-10-15 | 동우 화인켐 주식회사 | 얼룩 발생 방지용 레지스트 박리액 조성물 |
KR101668063B1 (ko) * | 2013-05-07 | 2016-10-20 | 주식회사 엘지화학 | 포토레지스트 제거용 스트리퍼 조성물 및 이를 사용한 포토레지스트의 박리방법 |
JP6571524B2 (ja) * | 2013-08-22 | 2019-09-04 | 日産化学株式会社 | 横電界駆動型液晶表示素子用液晶配向膜を有する基板の製造方法 |
KR102012464B1 (ko) | 2013-09-06 | 2019-08-20 | 동우 화인켐 주식회사 | 레지스트 박리액 조성물 및 이를 이용한 평판표시장치의 제조방법 |
KR102009533B1 (ko) | 2013-09-06 | 2019-08-09 | 동우 화인켐 주식회사 | 레지스트 박리액 조성물 및 이를 이용한 평판표시장치의 제조방법 |
TWI518467B (zh) * | 2013-11-15 | 2016-01-21 | 達興材料股份有限公司 | 光阻脫除劑和電子元件及其製造方法 |
KR101764577B1 (ko) * | 2015-08-13 | 2017-08-23 | 엘티씨 (주) | Lcd 제조용 포토레지스트 박리액 조성물 |
CN111781808B (zh) * | 2015-09-16 | 2024-06-07 | 东友精细化工有限公司 | 抗蚀剂剥离液组合物、平板显示器基板及其制造方法 |
CN106919013B (zh) * | 2015-12-28 | 2021-12-07 | 安集微电子(上海)有限公司 | 一种低蚀刻的去除光阻残留物的清洗液 |
CN106019863B (zh) * | 2016-07-14 | 2019-08-09 | 江阴江化微电子材料股份有限公司 | 一种高世代平板铜制程光阻剥离液 |
WO2018122992A1 (ja) * | 2016-12-28 | 2018-07-05 | パナソニックIpマネジメント株式会社 | レジスト剥離液 |
CN108949383B (zh) * | 2017-05-17 | 2021-05-25 | 东曹株式会社 | 清洗剂组合物和使用其的清洗方法 |
CN107577121A (zh) * | 2017-08-29 | 2018-01-12 | 昆山艾森半导体材料有限公司 | 一种光刻胶去胶液 |
KR102224907B1 (ko) * | 2018-04-17 | 2021-03-09 | 엘티씨 (주) | 드라이필름 레지스트 박리액 조성물 |
KR102324927B1 (ko) * | 2019-10-01 | 2021-11-12 | 동우 화인켐 주식회사 | 얼룩 발생 방지용 레지스트 박리액 조성물 |
KR102334425B1 (ko) | 2019-11-21 | 2021-12-01 | 엘티씨 (주) | 디스플레이 제조용 포토레지스트 박리액 조성물 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IE59971B1 (en) * | 1986-11-10 | 1994-05-04 | Baker J T Inc | Stripping compositions and their use for stripping resists from substrates |
JP3167664B2 (ja) * | 1997-10-28 | 2001-05-21 | 三洋電機株式会社 | ディジタルカメラ |
US6440326B1 (en) * | 1998-08-13 | 2002-08-27 | Mitsubishi Gas Chemical Company, Inc. | Photoresist removing composition |
KR100268108B1 (ko) * | 1998-08-25 | 2000-12-01 | 윤종용 | 포토레지스트용 스트리퍼 조성물 |
JP4229552B2 (ja) * | 1998-12-25 | 2009-02-25 | 東京応化工業株式会社 | ホトレジスト用剥離液組成物およびこれを用いたホトレジスト剥離方法 |
JP2001209190A (ja) * | 2000-01-25 | 2001-08-03 | Nagase Denshi Kagaku Kk | フォトレジスト剥離剤組成物及びその使用方法 |
KR100360985B1 (ko) * | 2000-04-26 | 2002-11-18 | 주식회사 동진쎄미켐 | 레지스트 스트리퍼 조성물 |
JP2001350276A (ja) * | 2000-06-05 | 2001-12-21 | Nagase Kasei Kogyo Kk | フォトレジスト剥離剤組成物及びその使用方法 |
JP2002072505A (ja) * | 2000-08-29 | 2002-03-12 | Nagase Kasei Kogyo Kk | フォトレジスト剥離剤組成物およびその使用方法 |
JP4085262B2 (ja) * | 2003-01-09 | 2008-05-14 | 三菱瓦斯化学株式会社 | レジスト剥離剤 |
TWI315030B (en) * | 2003-06-26 | 2009-09-21 | Dongwoo Fine Chem Co Ltd | Photoresist stripper composition, and exfoliation method of a photoresist using it |
US20050032657A1 (en) * | 2003-08-06 | 2005-02-10 | Kane Sean Michael | Stripping and cleaning compositions for microelectronics |
US7384900B2 (en) * | 2003-08-27 | 2008-06-10 | Lg Display Co., Ltd. | Composition and method for removing copper-compatible resist |
JPWO2005040931A1 (ja) * | 2003-10-29 | 2007-04-19 | ナガセケムテックス株式会社 | フォトレジスト剥離用組成物及び剥離方法 |
KR20050110955A (ko) * | 2004-05-20 | 2005-11-24 | 금호석유화학 주식회사 | 포토레지스트용 스트리퍼 조성물 및 이를 포토레지스트박리에 사용하는 방법 |
EP1787168B1 (en) * | 2004-07-15 | 2010-06-16 | MALLINCKRODT BAKER, Inc. | Non-aqueous microelectronic cleaning compositions containing fructose |
JP4846301B2 (ja) * | 2004-08-30 | 2011-12-28 | サムスン エレクトロニクス カンパニー リミテッド | 薄膜トランジスタ基板の製造方法及びストリッピング組成物 |
WO2006081406A1 (en) * | 2005-01-27 | 2006-08-03 | Advanced Technology Materials, Inc. | Compositions for processing of semiconductor substrates |
KR20070035722A (ko) * | 2005-09-28 | 2007-04-02 | 동우 화인켐 주식회사 | 포토레지스트 박리 조성물 및 이를 이용한 반도체 소자의제조방법 |
JP2007114519A (ja) * | 2005-10-20 | 2007-05-10 | Tokyo Ohka Kogyo Co Ltd | ホトレジスト用剥離液 |
JP2008191631A (ja) * | 2006-08-21 | 2008-08-21 | Tosoh Corp | レジスト除去用組成物 |
JP2008133529A (ja) * | 2006-08-29 | 2008-06-12 | Rohm & Haas Electronic Materials Llc | 剥離方法 |
KR20080076016A (ko) * | 2007-02-14 | 2008-08-20 | 동우 화인켐 주식회사 | 포토레지스트 박리용 조성물 및 이를 이용한 박리 방법 |
JP4692497B2 (ja) * | 2007-02-28 | 2011-06-01 | ナガセケムテックス株式会社 | フォトレジスト剥離剤組成物 |
JP4716225B2 (ja) * | 2007-05-15 | 2011-07-06 | ナガセケムテックス株式会社 | フォトレジスト剥離剤組成物 |
JP4962254B2 (ja) * | 2007-10-10 | 2012-06-27 | 東ソー株式会社 | レジスト除去用組成物及びそれを用いたレジスト除去方法 |
KR101286777B1 (ko) * | 2007-10-17 | 2013-07-17 | 헨켈 코포레이션 | 박리액 조성물, 그것을 이용한 수지층의 박리 방법 |
TWI450052B (zh) * | 2008-06-24 | 2014-08-21 | Dynaloy Llc | 用於後段製程操作有效之剝離溶液 |
JP5302334B2 (ja) * | 2008-11-28 | 2013-10-02 | 出光興産株式会社 | 防食性フォトレジスト剥離剤組成物 |
-
2010
- 2010-12-02 KR KR1020100122001A patent/KR101089211B1/ko active IP Right Grant
-
2011
- 2011-08-08 TW TW100128171A patent/TWI465564B/zh active
- 2011-08-30 JP JP2011187941A patent/JP2012118502A/ja active Pending
- 2011-09-14 CN CN201610079171.7A patent/CN105676602A/zh active Pending
- 2011-09-14 CN CN201110271127.3A patent/CN102486620B/zh active Active
-
2013
- 2013-11-14 JP JP2013235744A patent/JP6006711B2/ja active Active
-
2016
- 2016-09-09 JP JP2016176121A patent/JP2017040928A/ja active Pending
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