CN106019863B - 一种高世代平板铜制程光阻剥离液 - Google Patents
一种高世代平板铜制程光阻剥离液 Download PDFInfo
- Publication number
- CN106019863B CN106019863B CN201610551574.7A CN201610551574A CN106019863B CN 106019863 B CN106019863 B CN 106019863B CN 201610551574 A CN201610551574 A CN 201610551574A CN 106019863 B CN106019863 B CN 106019863B
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- CN
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- Prior art keywords
- organic solvent
- copper wiring
- component
- lines plate
- plate copper
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Abstract
Description
Claims (6)
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CN201610551574.7A CN106019863B (zh) | 2016-07-14 | 2016-07-14 | 一种高世代平板铜制程光阻剥离液 |
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CN201610551574.7A CN106019863B (zh) | 2016-07-14 | 2016-07-14 | 一种高世代平板铜制程光阻剥离液 |
Publications (2)
Publication Number | Publication Date |
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CN106019863A CN106019863A (zh) | 2016-10-12 |
CN106019863B true CN106019863B (zh) | 2019-08-09 |
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CN201610551574.7A Active CN106019863B (zh) | 2016-07-14 | 2016-07-14 | 一种高世代平板铜制程光阻剥离液 |
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CN (1) | CN106019863B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109445256A (zh) * | 2018-12-14 | 2019-03-08 | 江苏艾森半导体材料股份有限公司 | 新型光刻胶去胶液 |
CN111352315A (zh) * | 2020-03-19 | 2020-06-30 | 厦门思美科新材料有限公司 | 一种用于光刻胶剥离的水性剥离液 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003091376A1 (en) * | 2002-04-24 | 2003-11-06 | Ekc Technology, Inc. | Oxalic acid as a cleaning product for aluminium, copper and dielectric surfaces |
CN1577111A (zh) * | 2003-06-26 | 2005-02-09 | 东友Fine-Chem株式会社 | 光致抗蚀剂剥离液组合物及使用光致抗蚀剂剥离液组合物的光致抗蚀剂的剥离方法 |
CN1591199A (zh) * | 2003-08-27 | 2005-03-09 | Lg.菲利浦Lcd有限公司 | 用于除去与铜相容的抗蚀剂的组合物和方法 |
CN101295144A (zh) * | 2008-06-19 | 2008-10-29 | 大连三达奥克化学股份有限公司 | 光刻胶剥离液 |
CN101398639A (zh) * | 2007-09-28 | 2009-04-01 | 三星电子株式会社 | 用于剥离的组合物以及剥离方法 |
CN102031204A (zh) * | 2009-09-30 | 2011-04-27 | 富士胶片株式会社 | 清洗组合物、清洗方法、及半导体装置的制造方法 |
CN102486620A (zh) * | 2010-12-02 | 2012-06-06 | Ltc有限公司 | 用于液晶显示器制造工艺的包含伯烷烃醇胺的光刻胶剥离组合物 |
CN103605269A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 用于半导体制造的新型光刻胶去除液 |
CN105527803A (zh) * | 2014-09-29 | 2016-04-27 | 安集微电子(上海)有限公司 | 一种光刻胶清洗液 |
-
2016
- 2016-07-14 CN CN201610551574.7A patent/CN106019863B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003091376A1 (en) * | 2002-04-24 | 2003-11-06 | Ekc Technology, Inc. | Oxalic acid as a cleaning product for aluminium, copper and dielectric surfaces |
CN1577111A (zh) * | 2003-06-26 | 2005-02-09 | 东友Fine-Chem株式会社 | 光致抗蚀剂剥离液组合物及使用光致抗蚀剂剥离液组合物的光致抗蚀剂的剥离方法 |
CN1591199A (zh) * | 2003-08-27 | 2005-03-09 | Lg.菲利浦Lcd有限公司 | 用于除去与铜相容的抗蚀剂的组合物和方法 |
CN101398639A (zh) * | 2007-09-28 | 2009-04-01 | 三星电子株式会社 | 用于剥离的组合物以及剥离方法 |
CN101295144A (zh) * | 2008-06-19 | 2008-10-29 | 大连三达奥克化学股份有限公司 | 光刻胶剥离液 |
CN102031204A (zh) * | 2009-09-30 | 2011-04-27 | 富士胶片株式会社 | 清洗组合物、清洗方法、及半导体装置的制造方法 |
CN102486620A (zh) * | 2010-12-02 | 2012-06-06 | Ltc有限公司 | 用于液晶显示器制造工艺的包含伯烷烃醇胺的光刻胶剥离组合物 |
CN103605269A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 用于半导体制造的新型光刻胶去除液 |
CN105527803A (zh) * | 2014-09-29 | 2016-04-27 | 安集微电子(上海)有限公司 | 一种光刻胶清洗液 |
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CN106019863A (zh) | 2016-10-12 |
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Denomination of invention: A high generation photoresist stripping solution for flat copper process Effective date of registration: 20201109 Granted publication date: 20190809 Pledgee: Jiangsu Jiangyin Rural Commercial Bank Co., Ltd. Zhouzhuang sub branch Pledgor: JIANGYIN JIANGHUA MICROELECTRONICS MATERIALS Co.,Ltd. Registration number: Y2020320010181 |
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Date of cancellation: 20220209 Granted publication date: 20190809 Pledgee: Jiangsu Jiangyin Rural Commercial Bank Co.,Ltd. Zhouzhuang sub branch Pledgor: JIANGYIN JIANGHUA MICROELECTRONICS MATERIALS Co.,Ltd. Registration number: Y2020320010181 |