CN103605269A - 用于半导体制造的新型光刻胶去除液 - Google Patents
用于半导体制造的新型光刻胶去除液 Download PDFInfo
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- CN103605269A CN103605269A CN201310513408.4A CN201310513408A CN103605269A CN 103605269 A CN103605269 A CN 103605269A CN 201310513408 A CN201310513408 A CN 201310513408A CN 103605269 A CN103605269 A CN 103605269A
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CN201310513408.4A CN103605269B (zh) | 2013-10-25 | 2013-10-25 | 用于半导体制造的感光膜清洗液 |
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CN201310513408.4A CN103605269B (zh) | 2013-10-25 | 2013-10-25 | 用于半导体制造的感光膜清洗液 |
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CN103605269A true CN103605269A (zh) | 2014-02-26 |
CN103605269B CN103605269B (zh) | 2016-11-23 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103616806A (zh) * | 2013-10-25 | 2014-03-05 | 青岛华仁技术孵化器有限公司 | 感光膜清洗液 |
CN106019863A (zh) * | 2016-07-14 | 2016-10-12 | 江阴江化微电子材料股份有限公司 | 一种高世代平板铜制程光阻剥离液 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1924710A (zh) * | 2005-09-02 | 2007-03-07 | 东进世美肯株式会社 | 用于去除半导体器件的改性光刻胶的光刻胶去除剂组合物 |
CN101364056A (zh) * | 2007-08-10 | 2009-02-11 | 安集微电子(上海)有限公司 | 一种光刻胶清洗剂 |
WO2012009968A1 (zh) * | 2010-07-23 | 2012-01-26 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN102346383A (zh) * | 2010-08-06 | 2012-02-08 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
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2013
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1924710A (zh) * | 2005-09-02 | 2007-03-07 | 东进世美肯株式会社 | 用于去除半导体器件的改性光刻胶的光刻胶去除剂组合物 |
CN101364056A (zh) * | 2007-08-10 | 2009-02-11 | 安集微电子(上海)有限公司 | 一种光刻胶清洗剂 |
WO2012009968A1 (zh) * | 2010-07-23 | 2012-01-26 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN102338994A (zh) * | 2010-07-23 | 2012-02-01 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN102346383A (zh) * | 2010-08-06 | 2012-02-08 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103616806A (zh) * | 2013-10-25 | 2014-03-05 | 青岛华仁技术孵化器有限公司 | 感光膜清洗液 |
CN103616806B (zh) * | 2013-10-25 | 2017-02-08 | 马佳 | 感光膜清洗液 |
CN106019863A (zh) * | 2016-07-14 | 2016-10-12 | 江阴江化微电子材料股份有限公司 | 一种高世代平板铜制程光阻剥离液 |
CN106019863B (zh) * | 2016-07-14 | 2019-08-09 | 江阴江化微电子材料股份有限公司 | 一种高世代平板铜制程光阻剥离液 |
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CN103605269B (zh) | 2016-11-23 |
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Effective date of registration: 20160922 Address after: The city of Dunhua road 266000 in Shandong Province, Qingdao City No. 53, No. 2 Building 2 unit 401 room Applicant after: Ma Jia Address before: 266071 Shandong city of Qingdao province Hongkong City Road No. 32 Minmetals building room 801-A Applicant before: QINGDAO HUAREN TECHNOLOGY INCUBATOR Co.,Ltd. |
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Inventor after: Liu Lizhi Inventor before: Sun Xia |
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Effective date of registration: 20170418 Address after: Four road 519000 Guangdong city of Zhuhai Province, Gaolan Port Economic Zone District No. 11 fine chemical Patentee after: ZHUHAI TOPPLE FINE CHEMICAL CO.,LTD. Address before: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee before: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Effective date of registration: 20170418 Address after: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee after: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Address before: The city of Dunhua road 266000 in Shandong Province, Qingdao City No. 53, No. 2 Building 2 unit 401 room Patentee before: Ma Jia |