CN103616806B - 感光膜清洗液 - Google Patents
感光膜清洗液 Download PDFInfo
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- CN103616806B CN103616806B CN201310508167.4A CN201310508167A CN103616806B CN 103616806 B CN103616806 B CN 103616806B CN 201310508167 A CN201310508167 A CN 201310508167A CN 103616806 B CN103616806 B CN 103616806B
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CN201310508167.4A CN103616806B (zh) | 2013-10-25 | 2013-10-25 | 感光膜清洗液 |
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CN201310508167.4A CN103616806B (zh) | 2013-10-25 | 2013-10-25 | 感光膜清洗液 |
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CN103616806A CN103616806A (zh) | 2014-03-05 |
CN103616806B true CN103616806B (zh) | 2017-02-08 |
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CN201310508167.4A Active CN103616806B (zh) | 2013-10-25 | 2013-10-25 | 感光膜清洗液 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110577768A (zh) * | 2018-08-01 | 2019-12-17 | 蓝思科技(长沙)有限公司 | 清洗剂及菲林薄膜的清洗方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002180095A (ja) * | 2000-12-11 | 2002-06-26 | Fujitsu Ltd | 残渣物除去液、及びそれを使ったプリント配線板の製造方法 |
KR20050110955A (ko) * | 2004-05-20 | 2005-11-24 | 금호석유화학 주식회사 | 포토레지스트용 스트리퍼 조성물 및 이를 포토레지스트박리에 사용하는 방법 |
CN1924710A (zh) * | 2005-09-02 | 2007-03-07 | 东进世美肯株式会社 | 用于去除半导体器件的改性光刻胶的光刻胶去除剂组合物 |
CN101364056A (zh) * | 2007-08-10 | 2009-02-11 | 安集微电子(上海)有限公司 | 一种光刻胶清洗剂 |
CN102338994A (zh) * | 2010-07-23 | 2012-02-01 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN102346383A (zh) * | 2010-08-06 | 2012-02-08 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN103605269A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 用于半导体制造的新型光刻胶去除液 |
CN103605268A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 半导体制造过程中使用的清洗液 |
CN103616805A (zh) * | 2013-10-25 | 2014-03-05 | 青岛华仁技术孵化器有限公司 | 半导体制造过程中使用的清洗液 |
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2013
- 2013-10-25 CN CN201310508167.4A patent/CN103616806B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002180095A (ja) * | 2000-12-11 | 2002-06-26 | Fujitsu Ltd | 残渣物除去液、及びそれを使ったプリント配線板の製造方法 |
KR20050110955A (ko) * | 2004-05-20 | 2005-11-24 | 금호석유화학 주식회사 | 포토레지스트용 스트리퍼 조성물 및 이를 포토레지스트박리에 사용하는 방법 |
CN1924710A (zh) * | 2005-09-02 | 2007-03-07 | 东进世美肯株式会社 | 用于去除半导体器件的改性光刻胶的光刻胶去除剂组合物 |
CN101364056A (zh) * | 2007-08-10 | 2009-02-11 | 安集微电子(上海)有限公司 | 一种光刻胶清洗剂 |
CN102338994A (zh) * | 2010-07-23 | 2012-02-01 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN102346383A (zh) * | 2010-08-06 | 2012-02-08 | 安集微电子(上海)有限公司 | 一种光刻胶的清洗液 |
CN103605269A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 用于半导体制造的新型光刻胶去除液 |
CN103605268A (zh) * | 2013-10-25 | 2014-02-26 | 青岛华仁技术孵化器有限公司 | 半导体制造过程中使用的清洗液 |
CN103616805A (zh) * | 2013-10-25 | 2014-03-05 | 青岛华仁技术孵化器有限公司 | 半导体制造过程中使用的清洗液 |
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CN103616806A (zh) | 2014-03-05 |
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Effective date of registration: 20160922 Address after: The city of Dunhua road 266000 in Shandong Province, Qingdao City No. 53, No. 2 Building 2 unit 401 room Applicant after: Ma Jia Address before: 266071 Shandong city of Qingdao province Hongkong City Road No. 32 Minmetals building room 801-A Applicant before: QINGDAO HUAREN TECHNOLOGY INCUBATOR Co.,Ltd. |
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Inventor after: Liu Lizhi Inventor before: Sun Xia |
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Effective date of registration: 20170417 Address after: Four road 519000 Guangdong city of Zhuhai Province, Gaolan Port Economic Zone District No. 11 fine chemical Patentee after: ZHUHAI TOPPLE FINE CHEMICAL CO.,LTD. Address before: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee before: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Effective date of registration: 20170417 Address after: Tianhe District Tong East Road Guangzhou city Guangdong province 510665 B-101 No. 5, room B-118 Patentee after: GUANGDONG GAOHANG INTELLECTUAL PROPERTY OPERATION Co.,Ltd. Address before: The city of Dunhua road 266000 in Shandong Province, Qingdao City No. 53, No. 2 Building 2 unit 401 room Patentee before: Ma Jia |
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