JP2013518446A5 - - Google Patents
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- Publication number
- JP2013518446A5 JP2013518446A5 JP2012551279A JP2012551279A JP2013518446A5 JP 2013518446 A5 JP2013518446 A5 JP 2013518446A5 JP 2012551279 A JP2012551279 A JP 2012551279A JP 2012551279 A JP2012551279 A JP 2012551279A JP 2013518446 A5 JP2013518446 A5 JP 2013518446A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vuv
- vacuum ultraviolet
- hard mask
- gas composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29873410P | 2010-01-27 | 2010-01-27 | |
| US61/298,734 | 2010-01-27 | ||
| US29909710P | 2010-01-28 | 2010-01-28 | |
| US61/299,097 | 2010-01-28 | ||
| US13/014,508 US8980751B2 (en) | 2010-01-27 | 2011-01-26 | Methods and systems of material removal and pattern transfer |
| US13/014,508 | 2011-01-26 | ||
| PCT/US2011/022679 WO2011094383A2 (en) | 2010-01-27 | 2011-01-27 | Methods and systems of material removal and pattern transfer |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013518446A JP2013518446A (ja) | 2013-05-20 |
| JP2013518446A5 true JP2013518446A5 (enExample) | 2014-02-20 |
| JP5782460B2 JP5782460B2 (ja) | 2015-09-24 |
Family
ID=44309278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012551279A Active JP5782460B2 (ja) | 2010-01-27 | 2011-01-27 | 材料除去及びパターン転写の方法及びシステム |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8980751B2 (enExample) |
| JP (1) | JP5782460B2 (enExample) |
| KR (1) | KR101947524B1 (enExample) |
| CN (1) | CN102859436B (enExample) |
| SG (1) | SG181560A1 (enExample) |
| TW (1) | TWI551386B (enExample) |
| WO (1) | WO2011094383A2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110048518A1 (en) * | 2009-08-26 | 2011-03-03 | Molecular Imprints, Inc. | Nanostructured thin film inorganic solar cells |
| US9070803B2 (en) | 2010-05-11 | 2015-06-30 | Molecular Imprints, Inc. | Nanostructured solar cell |
| JP5634313B2 (ja) * | 2011-03-29 | 2014-12-03 | 富士フイルム株式会社 | レジストパターン形成方法およびそれを用いたパターン化基板の製造方法 |
| US9616614B2 (en) | 2012-02-22 | 2017-04-11 | Canon Nanotechnologies, Inc. | Large area imprint lithography |
| US11762284B2 (en) | 2016-08-03 | 2023-09-19 | Board Of Regents, The University Of Texas System | Wafer-scale programmable films for semiconductor planarization and for imprint lithography |
| DE102019214074A1 (de) * | 2019-09-16 | 2021-03-18 | Robert Bosch Gmbh | Verfahren und Vorrichtung zum lokalen Entfernen und/oder Modifizieren eines Polymermaterials auf einer Oberfläche |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4113523A1 (de) | 1991-04-25 | 1992-10-29 | Abb Patent Gmbh | Verfahren zur behandlung von oberflaechen |
| JPH09123206A (ja) | 1995-10-30 | 1997-05-13 | Towa Kk | 電子部品の樹脂封止成形装置 |
| JP4045682B2 (ja) | 1999-01-26 | 2008-02-13 | 株式会社日立ハイテクノロジーズ | 紫外線照射による基板処理装置 |
| US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
| DE19957034B4 (de) | 1999-11-26 | 2006-04-13 | Heraeus Noblelight Gmbh | Verfahren zur Behandlung von Oberflächen von Substraten und Vorrichtung |
| US20030155657A1 (en) * | 2002-02-14 | 2003-08-21 | Nec Electronics Corporation | Manufacturing method of semiconductor device |
| JP2003337432A (ja) | 2002-05-20 | 2003-11-28 | Tsukuba Semi Technology:Kk | 機能水を使ったレジスト除去方法、およびその装置 |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
| US6936194B2 (en) | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
| US20040108059A1 (en) * | 2002-09-20 | 2004-06-10 | Thomas Johnston | System and method for removal of materials from an article |
| US20040065252A1 (en) | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
| US8349241B2 (en) | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| DE10343323A1 (de) | 2003-09-11 | 2005-04-07 | Carl Zeiss Smt Ag | Stempellithografieverfahren sowie Vorrichtung und Stempel für die Stempellithografie |
| US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| US7029992B2 (en) * | 2004-08-17 | 2006-04-18 | Taiwan Semiconductor Manufacturing Company | Low oxygen content photoresist stripping process for low dielectric constant materials |
| JP5115798B2 (ja) * | 2004-09-01 | 2013-01-09 | アクセリス テクノロジーズ インコーポレーテッド | フォトレジストの除去速度を増加する装置及びプラズマアッシング方法 |
| KR101229100B1 (ko) * | 2005-06-10 | 2013-02-15 | 오브듀캇 아베 | 중간 스탬프를 갖는 패턴 복제 |
| US20070138405A1 (en) * | 2005-12-16 | 2007-06-21 | 3M Innovative Properties Company | Corona etching |
| JP2008091685A (ja) | 2006-10-03 | 2008-04-17 | Seiko Epson Corp | 素子基板およびその製造方法 |
| US7832416B2 (en) | 2006-10-10 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and methods |
| KR100796047B1 (ko) * | 2006-11-21 | 2008-01-21 | 제일모직주식회사 | 레지스트 하층막용 하드마스크 조성물, 이를 이용한 반도체집적회로 디바이스의 제조방법 및 그로부터 제조된 반도체집적회로 디바이스 |
| US8337959B2 (en) | 2006-11-28 | 2012-12-25 | Nanonex Corporation | Method and apparatus to apply surface release coating for imprint mold |
| US20080302400A1 (en) | 2007-06-05 | 2008-12-11 | Thomas Johnston | System and Method for Removal of Materials from an Article |
| JP2009034926A (ja) | 2007-08-02 | 2009-02-19 | Sumitomo Electric Ind Ltd | 樹脂パターン形成方法 |
| US20090166317A1 (en) * | 2007-12-26 | 2009-07-02 | Canon Kabushiki Kaisha | Method of processing substrate by imprinting |
| JP5149083B2 (ja) | 2008-06-16 | 2013-02-20 | 富士フイルム株式会社 | パターン形成方法、並びに基板加工方法、モールド構造体の複製方法、及びモールド構造体 |
| US8394203B2 (en) | 2008-10-02 | 2013-03-12 | Molecular Imprints, Inc. | In-situ cleaning of an imprint lithography tool |
-
2011
- 2011-01-26 US US13/014,508 patent/US8980751B2/en active Active
- 2011-01-27 TW TW100103075A patent/TWI551386B/zh active
- 2011-01-27 WO PCT/US2011/022679 patent/WO2011094383A2/en not_active Ceased
- 2011-01-27 SG SG2012041901A patent/SG181560A1/en unknown
- 2011-01-27 JP JP2012551279A patent/JP5782460B2/ja active Active
- 2011-01-27 CN CN201180007625.5A patent/CN102859436B/zh active Active
- 2011-01-27 KR KR1020127021126A patent/KR101947524B1/ko active Active
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