JP2013511151A5 - - Google Patents

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Publication number
JP2013511151A5
JP2013511151A5 JP2012538866A JP2012538866A JP2013511151A5 JP 2013511151 A5 JP2013511151 A5 JP 2013511151A5 JP 2012538866 A JP2012538866 A JP 2012538866A JP 2012538866 A JP2012538866 A JP 2012538866A JP 2013511151 A5 JP2013511151 A5 JP 2013511151A5
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JP
Japan
Prior art keywords
particles
substrate
modifying
etching
microstructuring
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JP2012538866A
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English (en)
Japanese (ja)
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JP5690348B2 (ja
JP2013511151A (ja
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Priority claimed from PCT/US2010/055772 external-priority patent/WO2011062791A2/en
Publication of JP2013511151A publication Critical patent/JP2013511151A/ja
Publication of JP2013511151A5 publication Critical patent/JP2013511151A5/ja
Application granted granted Critical
Publication of JP5690348B2 publication Critical patent/JP5690348B2/ja
Expired - Fee Related legal-status Critical Current
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JP2012538866A 2009-11-17 2010-11-08 光吸収性基板の表面の微細構造化 Expired - Fee Related JP5690348B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26187509P 2009-11-17 2009-11-17
US61/261,875 2009-11-17
PCT/US2010/055772 WO2011062791A2 (en) 2009-11-17 2010-11-08 Texturing surface of light-absorbing substrate

Publications (3)

Publication Number Publication Date
JP2013511151A JP2013511151A (ja) 2013-03-28
JP2013511151A5 true JP2013511151A5 (enExample) 2013-12-26
JP5690348B2 JP5690348B2 (ja) 2015-03-25

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JP2012538866A Expired - Fee Related JP5690348B2 (ja) 2009-11-17 2010-11-08 光吸収性基板の表面の微細構造化

Country Status (5)

Country Link
US (1) US9034684B2 (enExample)
EP (1) EP2502279B1 (enExample)
JP (1) JP5690348B2 (enExample)
CN (1) CN102754217B (enExample)
WO (1) WO2011062791A2 (enExample)

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