WO2012093807A3 - 내지문 코팅 방법 및 장치 - Google Patents

내지문 코팅 방법 및 장치 Download PDF

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Publication number
WO2012093807A3
WO2012093807A3 PCT/KR2011/010295 KR2011010295W WO2012093807A3 WO 2012093807 A3 WO2012093807 A3 WO 2012093807A3 KR 2011010295 W KR2011010295 W KR 2011010295W WO 2012093807 A3 WO2012093807 A3 WO 2012093807A3
Authority
WO
WIPO (PCT)
Prior art keywords
resistant coating
fingerprint resistant
evaporating
sio
thin film
Prior art date
Application number
PCT/KR2011/010295
Other languages
English (en)
French (fr)
Other versions
WO2012093807A2 (ko
Inventor
김윤택
Original Assignee
바코스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 바코스 주식회사 filed Critical 바코스 주식회사
Priority to CN2011800641861A priority Critical patent/CN103314128A/zh
Publication of WO2012093807A2 publication Critical patent/WO2012093807A2/ko
Publication of WO2012093807A3 publication Critical patent/WO2012093807A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)

Abstract

본 발명은 기존의 전자빔증착법 대신에 플라즈마 개질법, 스퍼터코팅법 및 열증착법을 복합적으로 사용하여 생산성을 향상시킨 내지문 표면 코팅 방법 및 장치에 관한 것으로서, 상세하게는 본 발명은 a) 기재 표면에 스퍼터(sputter)를 이용하여 이산화규소(SiO2) 박막을 증착하는 단계, 및 b) 상기 이산화규소 박막이 증착된 기재 표면에 열증착(Thermal evaporation) 방식을 통해 불소화합물을 증착시키는 단계를 포함하는 내지문 코팅 방법에 대한 것이다.
PCT/KR2011/010295 2011-01-05 2011-12-29 내지문 코팅 방법 및 장치 WO2012093807A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011800641861A CN103314128A (zh) 2011-01-05 2011-12-29 耐指纹镀膜方法及装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0001063 2011-01-05
KR1020110001063A KR20120079716A (ko) 2011-01-05 2011-01-05 내지문 코팅 방법 및 장치

Publications (2)

Publication Number Publication Date
WO2012093807A2 WO2012093807A2 (ko) 2012-07-12
WO2012093807A3 true WO2012093807A3 (ko) 2012-09-27

Family

ID=46457811

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/010295 WO2012093807A2 (ko) 2011-01-05 2011-12-29 내지문 코팅 방법 및 장치

Country Status (3)

Country Link
KR (1) KR20120079716A (ko)
CN (1) CN103314128A (ko)
WO (1) WO2012093807A2 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101242591B1 (ko) * 2011-05-23 2013-03-19 유흥상 지문방지층 증착방법
KR101499291B1 (ko) * 2012-08-31 2015-03-06 박종하 내지문 코팅 방법 및 이를 이용하여 제조된 내지문 코팅층
KR101498883B1 (ko) * 2012-08-31 2015-03-05 박종하 내지문 코팅 방법 및 이를 이용하여 제조된 내지문 코팅층
CN105018928B (zh) * 2014-04-18 2019-03-29 傅榆 用于异形金属上的纳米表面镀层的镀膜方法
CN105209568B (zh) * 2014-04-23 2018-04-13 凯玛科技株式会社 由多个薄膜形成的防指纹层的组合物及其制备方法
CN104372298A (zh) * 2014-11-13 2015-02-25 邵海平 一种高能离子束基板处理及真空蒸发镀膜设备及方法
CN107815646A (zh) * 2017-11-15 2018-03-20 温州职业技术学院 网罩式离子源及利用网罩式离子源的镀膜设备、防指纹镀膜方法
CN108395284B (zh) * 2018-02-01 2020-08-07 九牧厨卫股份有限公司 一种防污涂层及其应用以及含有其的陶瓷产品
CN110172675A (zh) * 2018-08-23 2019-08-27 深圳市昊翀珠宝科技有限公司 一种首饰品表面真空处理设备及方法
CN109402588A (zh) * 2018-12-29 2019-03-01 商丘金振源电子科技有限公司 基于磨砂表面的防指纹镀膜制品及防指纹镀膜方法
CN110129728B (zh) * 2019-06-14 2021-09-21 东莞市广正模具塑胶有限公司 一种改性af镀层材料及其制备方法和应用
CN111364014A (zh) * 2020-04-26 2020-07-03 蓝思科技（长沙）有限公司 一种隐形指纹膜层加工工艺

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051298A (en) * 1997-01-22 2000-04-18 Samsung Electronics Co., Limited Optical disc having protective films
JP2001137775A (ja) * 1999-11-17 2001-05-22 Nisshin Steel Co Ltd 塗膜硬度が高く耐摩耗性に優れた透明フッ素樹脂被覆ステンレス鋼板
KR20070059512A (ko) * 2005-12-06 2007-06-12 주식회사 탑테크이십일 이온 플레이팅 지그장치
US20100045911A1 (en) * 2008-08-19 2010-02-25 Hiraide Yoshifumi Liquid crystal display apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101879801A (zh) * 2010-06-21 2010-11-10 东莞劲胜精密组件股份有限公司 一种抗指纹薄膜及其制备方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051298A (en) * 1997-01-22 2000-04-18 Samsung Electronics Co., Limited Optical disc having protective films
JP2001137775A (ja) * 1999-11-17 2001-05-22 Nisshin Steel Co Ltd 塗膜硬度が高く耐摩耗性に優れた透明フッ素樹脂被覆ステンレス鋼板
KR20070059512A (ko) * 2005-12-06 2007-06-12 주식회사 탑테크이십일 이온 플레이팅 지그장치
US20100045911A1 (en) * 2008-08-19 2010-02-25 Hiraide Yoshifumi Liquid crystal display apparatus

Also Published As

Publication number Publication date
WO2012093807A2 (ko) 2012-07-12
KR20120079716A (ko) 2012-07-13
CN103314128A (zh) 2013-09-18

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