JP2013512567A - 注入効率が向上したled - Google Patents
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- 238000002347 injection Methods 0.000 title description 2
- 239000007924 injection Substances 0.000 title description 2
- 239000004065 semiconductor Substances 0.000 claims abstract description 45
- 239000000463 material Substances 0.000 claims abstract description 36
- 238000005530 etching Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 claims abstract description 3
- 230000012010 growth Effects 0.000 claims description 46
- 239000000758 substrate Substances 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 3
- 238000005253 cladding Methods 0.000 description 9
- 229910052594 sapphire Inorganic materials 0.000 description 9
- 239000010980 sapphire Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 230000006798 recombination Effects 0.000 description 4
- 238000005215 recombination Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
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- Drying Of Semiconductors (AREA)
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Abstract
【選択図】図2
Description
Claims (12)
- 発光素子であって、
p型半導体材料を含むp型半導体層と、
n型半導体材料を含むn型半導体層と、
前記p型半導体層と前記n型半導体層との間に挟装された活性層であって、内部で、前記p型半導体層からの正孔が前記n型半導体層からの電子と結合するときに光を放出し、複数の副層を備え、複数の該副層の側面が前記p型半導体材料と接触する複数のピットを有し、それにより、前記p型半導体材料からの正孔が、露出した前記側面を通ってそれらの副層内に、別の副層を通過することなく注入される、活性層と、
を具備する、発光素子。 - 前記複数の副層は、前記ピットにおいて開口部を有する実質的に平面状の層の積層体を備え、各副層は、実質的に平面状の表面であって、前記副層のうちの別の副層の前記実質的に平面状の表面と接触している実質的に平面状の表面と、複数の側面とを有し、各側面は、前記ピットのうちの1つのピットの壁によって境界が画定され、各副層は、前記実質的に平面状の表面を通ってその副層に入る第1の正孔電流と、前記副層の前記側面を通ってその副層に入る第2の正孔電流とによって特徴付けられ、該第2の正孔電流は、前記副層のうちの少なくとも1つについて前記第1の正孔電流の10パーセントよりも大きい、請求項1に記載の発光素子。
- 前記ピットはピット密度によって特徴付けられ、該ピット密度は107cm−2〜1010cm−2の間である、請求項1に記載の発光素子。
- 前記第1の半導体層及び前記第2の半導体層はGaN系材料を含む、請求項1に記載の発光素子。
- 前記ピットは、前記n型半導体層内の転位に位置する、請求項1に記載の発光素子。
- 発光素子を製作する方法であって、
基板上にエピタキシャルn型半導体層を成長させるステップと、
前記n型半導体層上に複数の副層を含む活性層を、該活性層にピットを形成させるようにする成長条件下で成長させるステップであって、複数の前記副層は前記ピットによって境界が画定される側壁を有するステップと、
前記ピット内で前記副層の側壁を露出させるように前記活性層をエッチングするステップと、
前記活性層の上でエピタキシャルp型半導体層を、前記ピット内に広がりかつ前記副層の前記側壁と接触するように成長させるステップと、
前記p型半導体層と前記n型半導体層との間に電位差を印加する接点を提供するステップと、
を含む、方法。 - 前記n型半導体層は、前記n型半導体層の格子定数と相違する格子定数を有し、該相違により転位が発生し、前記ピットは、前記転位を有する位置で形成される、請求項6に記載の方法。
- 前記側壁を露出させるように前記活性層をエッチングするステップは、前記素子が製作されているエピタキシャル成長チャンバー内のガス組成を、前記ピット内で露出した前記活性層のファセットを、前記ピット内で露出していない前記活性層のファセットよりも高速でエッチングする雰囲気に変化させることを含む、請求項6に記載の方法。
- 前記活性層は、GaN系の材料のうちの材料のc面ファセット上で成長し、前記側壁を露出させるように前記活性層をエッチングするステップは、前記ピット内の結晶ファセットを、前記c面ファセット上の材料よりも高速にエッチングするエッチング液で、前記活性層を化学的にエッチングすることを含む、請求項6に記載の方法。
- 前記雰囲気はNH3及び/又はH2を含む、請求項8に記載の方法。
- 前記n型半導体層は、107cm−2〜1010cm−2の間の転位の密度をもたらす条件下で成長する、請求項7に記載の方法。
- 前記側壁を露出させるように前記活性層をエッチングするステップは、前記副層上に別の副層を堆積させる前に、その副層のうちの1つを、その副層が堆積した後に、前記ピット内でその副層の前記側壁を露出させるようにエッチングすることを含む、請求項6に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/626,474 | 2009-11-25 | ||
US12/626,474 US8525221B2 (en) | 2009-11-25 | 2009-11-25 | LED with improved injection efficiency |
PCT/US2010/051205 WO2011066038A1 (en) | 2009-11-25 | 2010-10-01 | Led with improved injection efficiency |
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Publication Number | Publication Date |
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JP2013512567A true JP2013512567A (ja) | 2013-04-11 |
JP2013512567A5 JP2013512567A5 (ja) | 2013-11-21 |
JP5807015B2 JP5807015B2 (ja) | 2015-11-10 |
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JP2012541078A Active JP5807015B2 (ja) | 2009-11-25 | 2010-10-01 | 発光素子の製造方法 |
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US (3) | US8525221B2 (ja) |
EP (1) | EP2504869B1 (ja) |
JP (1) | JP5807015B2 (ja) |
KR (1) | KR20120102040A (ja) |
CN (1) | CN102484179B (ja) |
HK (1) | HK1167741A1 (ja) |
TW (1) | TWI518946B (ja) |
WO (1) | WO2011066038A1 (ja) |
Cited By (6)
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JP2017208566A (ja) * | 2013-04-10 | 2017-11-24 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | オプトエレクトロニクス半導体チップの製造方法 |
JP2019501529A (ja) * | 2016-02-25 | 2019-01-17 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | 放射放出半導体チップの製造方法および放射放出半導体チップ |
JP2019054247A (ja) * | 2017-09-15 | 2019-04-04 | 日機装株式会社 | 窒化物半導体発光素子及び窒化物半導体発光素子の製造方法 |
JP2019519101A (ja) * | 2016-05-20 | 2019-07-04 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | 改善された効率を有する部品およびその製造方法 |
JP2019165236A (ja) * | 2015-03-26 | 2019-09-26 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | オプトエレクトロニクス半導体エレメントとオプトエレクトロニクス半導体エレメントを製造する方法 |
US11616167B2 (en) | 2017-09-15 | 2023-03-28 | Nikkiso Co., Ltd. | Nitride semiconductor light-emitting element and method for manufacturing nitride semiconductor light-emitting element |
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US8853668B2 (en) * | 2011-09-29 | 2014-10-07 | Kabushiki Kaisha Toshiba | Light emitting regions for use with light emitting devices |
DE102012217640B4 (de) * | 2012-09-27 | 2020-02-20 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zu seiner Herstellung |
KR20150025264A (ko) | 2013-08-28 | 2015-03-10 | 삼성전자주식회사 | 정공주입층을 구비하는 반도체 발광 소자 및 그 제조 방법 |
FR3010228B1 (fr) | 2013-08-30 | 2016-12-30 | St Microelectronics Tours Sas | Procede de traitement d'une couche de nitrure de gallium comportant des dislocations |
KR102142709B1 (ko) | 2013-12-05 | 2020-08-07 | 엘지이노텍 주식회사 | 발광 소자 및 이를 구비한 조명 장치 |
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DE102015104700A1 (de) | 2015-03-27 | 2016-09-29 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
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EP2504869B1 (en) | 2020-02-26 |
US8525221B2 (en) | 2013-09-03 |
HK1167741A1 (en) | 2012-12-07 |
CN102484179A (zh) | 2012-05-30 |
CN102484179B (zh) | 2015-10-07 |
EP2504869A1 (en) | 2012-10-03 |
TWI518946B (zh) | 2016-01-21 |
TW201143139A (en) | 2011-12-01 |
WO2011066038A1 (en) | 2011-06-03 |
US9012953B2 (en) | 2015-04-21 |
JP5807015B2 (ja) | 2015-11-10 |
US20130316483A1 (en) | 2013-11-28 |
US8684749B2 (en) | 2014-04-01 |
EP2504869A4 (en) | 2014-11-26 |
US20140151728A1 (en) | 2014-06-05 |
US20110121357A1 (en) | 2011-05-26 |
KR20120102040A (ko) | 2012-09-17 |
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