JP2013251262A5 - - Google Patents
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- Publication number
- JP2013251262A5 JP2013251262A5 JP2013112191A JP2013112191A JP2013251262A5 JP 2013251262 A5 JP2013251262 A5 JP 2013251262A5 JP 2013112191 A JP2013112191 A JP 2013112191A JP 2013112191 A JP2013112191 A JP 2013112191A JP 2013251262 A5 JP2013251262 A5 JP 2013251262A5
- Authority
- JP
- Japan
- Prior art keywords
- scanning electron
- electron microscope
- inspection
- chamber
- inspection object
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims 40
- 239000012528 membrane Substances 0.000 claims 9
- 239000002245 particle Substances 0.000 claims 7
- 238000010894 electron beam technology Methods 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 3
- 238000013016 damping Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120057468A KR101914231B1 (ko) | 2012-05-30 | 2012-05-30 | 주사 전자 현미경을 이용한 검사 시스템 |
| KR10-2012-0057468 | 2012-05-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013251262A JP2013251262A (ja) | 2013-12-12 |
| JP2013251262A5 true JP2013251262A5 (enExample) | 2016-07-07 |
| JP6288951B2 JP6288951B2 (ja) | 2018-03-07 |
Family
ID=48520797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013112191A Active JP6288951B2 (ja) | 2012-05-30 | 2013-05-28 | 走査電子顕微鏡を利用した検査システム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8890067B2 (enExample) |
| EP (1) | EP2669927A3 (enExample) |
| JP (1) | JP6288951B2 (enExample) |
| KR (1) | KR101914231B1 (enExample) |
| CN (1) | CN103454295B (enExample) |
| TW (1) | TWI597757B (enExample) |
Families Citing this family (33)
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| US10197501B2 (en) | 2011-12-12 | 2019-02-05 | Kla-Tencor Corporation | Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors |
| US9496425B2 (en) | 2012-04-10 | 2016-11-15 | Kla-Tencor Corporation | Back-illuminated sensor with boron layer |
| US9601299B2 (en) | 2012-08-03 | 2017-03-21 | Kla-Tencor Corporation | Photocathode including silicon substrate with boron layer |
| US9426400B2 (en) | 2012-12-10 | 2016-08-23 | Kla-Tencor Corporation | Method and apparatus for high speed acquisition of moving images using pulsed illumination |
| CN104006949A (zh) * | 2013-02-26 | 2014-08-27 | 北京京东方光电科技有限公司 | 一种透过率检测设备 |
| KR102026936B1 (ko) * | 2013-03-26 | 2019-10-01 | 삼성디스플레이 주식회사 | 주사 전자 현미경을 이용한 검사 시스템 |
| US9478402B2 (en) | 2013-04-01 | 2016-10-25 | Kla-Tencor Corporation | Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor |
| US9347890B2 (en) | 2013-12-19 | 2016-05-24 | Kla-Tencor Corporation | Low-noise sensor and an inspection system using a low-noise sensor |
| US9748294B2 (en) | 2014-01-10 | 2017-08-29 | Hamamatsu Photonics K.K. | Anti-reflection layer for back-illuminated sensor |
| KR20150107939A (ko) * | 2014-03-13 | 2015-09-24 | 참엔지니어링(주) | 시료 관찰 장치 |
| US9410901B2 (en) | 2014-03-17 | 2016-08-09 | Kla-Tencor Corporation | Image sensor, an inspection system and a method of inspecting an article |
| US9767986B2 (en) * | 2014-08-29 | 2017-09-19 | Kla-Tencor Corporation | Scanning electron microscope and methods of inspecting and reviewing samples |
| TWI573165B (zh) * | 2014-12-09 | 2017-03-01 | 財團法人工業技術研究院 | 電子顯微鏡、讀取器以及擷取元素頻譜之方法 |
| US9860466B2 (en) | 2015-05-14 | 2018-01-02 | Kla-Tencor Corporation | Sensor with electrically controllable aperture for inspection and metrology systems |
| US10748730B2 (en) | 2015-05-21 | 2020-08-18 | Kla-Tencor Corporation | Photocathode including field emitter array on a silicon substrate with boron layer |
| US10462391B2 (en) | 2015-08-14 | 2019-10-29 | Kla-Tencor Corporation | Dark-field inspection using a low-noise sensor |
| CN108701576B (zh) | 2015-12-24 | 2021-06-15 | Asml荷兰有限公司 | 用于检查的方法和设备 |
| US10313622B2 (en) | 2016-04-06 | 2019-06-04 | Kla-Tencor Corporation | Dual-column-parallel CCD sensor and inspection systems using a sensor |
| US10778925B2 (en) | 2016-04-06 | 2020-09-15 | Kla-Tencor Corporation | Multiple column per channel CCD sensor architecture for inspection and metrology |
| KR102307522B1 (ko) * | 2016-05-10 | 2021-09-29 | 가부시키가이샤 스미카 분세키 센터 | 유기 전자 소자의 검사 방법 및 분석 방법, 그리고 그 이용 |
| CN106291899A (zh) * | 2016-09-29 | 2017-01-04 | 东方晶源微电子科技(北京)有限公司 | 照明模块、光学显微系统及电子束检测装置 |
| CN106770405A (zh) * | 2016-12-09 | 2017-05-31 | 清华大学 | 一种完全大气压下超光学衍射成像装置 |
| CN107116308B (zh) * | 2017-05-03 | 2019-01-04 | 湖北工业大学 | 波导微纳加工系统以及加工方法 |
| US10049904B1 (en) * | 2017-08-03 | 2018-08-14 | Applied Materials, Inc. | Method and system for moving a substrate |
| CN109975340A (zh) * | 2017-12-26 | 2019-07-05 | 上海梅山钢铁股份有限公司 | 镀铝锌板无铬钝化膜厚度的微观分析方法 |
| US11114489B2 (en) | 2018-06-18 | 2021-09-07 | Kla-Tencor Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
| US10943760B2 (en) | 2018-10-12 | 2021-03-09 | Kla Corporation | Electron gun and electron microscope |
| KR20200062573A (ko) | 2018-11-27 | 2020-06-04 | 김창섭 | 디스펜서형 노즈워크 장난감 |
| US11114491B2 (en) | 2018-12-12 | 2021-09-07 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
| JP7231738B2 (ja) | 2018-12-31 | 2023-03-01 | エーエスエムエル ネザーランズ ビー.ブイ. | 複数ビームを用いたインレンズウェーハプリチャージ及び検査 |
| US11417492B2 (en) | 2019-09-26 | 2022-08-16 | Kla Corporation | Light modulated electron source |
| US11821860B2 (en) * | 2019-10-16 | 2023-11-21 | Carl Zeiss X-Ray Microscopy Inc. | Optical three-dimensional scanning for collision avoidance in microscopy system |
| US11848350B2 (en) | 2020-04-08 | 2023-12-19 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer |
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| JP2009252809A (ja) * | 2008-04-02 | 2009-10-29 | Hitachi High-Technologies Corp | ステージ装置及びステージ装置におけるステージの位置決め制御方法 |
| DE102008035770A1 (de) * | 2008-07-31 | 2010-02-18 | Eads Deutschland Gmbh | Optischer Partikeldetektor sowie Detektionsverfahren |
| WO2010035265A1 (en) * | 2008-09-28 | 2010-04-01 | B-Nano Ltd. | A vacuumed device and a scanning electron microscope |
| JP5690086B2 (ja) * | 2010-07-02 | 2015-03-25 | 株式会社キーエンス | 拡大観察装置 |
-
2012
- 2012-05-30 KR KR1020120057468A patent/KR101914231B1/ko active Active
-
2013
- 2013-05-28 JP JP2013112191A patent/JP6288951B2/ja active Active
- 2013-05-29 CN CN201310205662.8A patent/CN103454295B/zh active Active
- 2013-05-30 EP EP13169847.4A patent/EP2669927A3/en not_active Ceased
- 2013-05-30 US US13/905,623 patent/US8890067B2/en active Active
- 2013-05-30 TW TW102119052A patent/TWI597757B/zh active
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