KR101914231B1 - 주사 전자 현미경을 이용한 검사 시스템 - Google Patents

주사 전자 현미경을 이용한 검사 시스템 Download PDF

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KR101914231B1
KR101914231B1 KR1020120057468A KR20120057468A KR101914231B1 KR 101914231 B1 KR101914231 B1 KR 101914231B1 KR 1020120057468 A KR1020120057468 A KR 1020120057468A KR 20120057468 A KR20120057468 A KR 20120057468A KR 101914231 B1 KR101914231 B1 KR 101914231B1
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South Korea
Prior art keywords
scanning electron
electron microscope
chamber
inspection
inspected
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English (en)
Korean (ko)
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KR20130134160A (ko
Inventor
박영길
백원봉
오기원
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삼성디스플레이 주식회사
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Application filed by 삼성디스플레이 주식회사 filed Critical 삼성디스플레이 주식회사
Priority to KR1020120057468A priority Critical patent/KR101914231B1/ko
Priority to JP2013112191A priority patent/JP6288951B2/ja
Priority to CN201310205662.8A priority patent/CN103454295B/zh
Priority to US13/905,623 priority patent/US8890067B2/en
Priority to EP13169847.4A priority patent/EP2669927A3/en
Priority to TW102119052A priority patent/TWI597757B/zh
Publication of KR20130134160A publication Critical patent/KR20130134160A/ko
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Publication of KR101914231B1 publication Critical patent/KR101914231B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020120057468A 2012-05-30 2012-05-30 주사 전자 현미경을 이용한 검사 시스템 Active KR101914231B1 (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1020120057468A KR101914231B1 (ko) 2012-05-30 2012-05-30 주사 전자 현미경을 이용한 검사 시스템
JP2013112191A JP6288951B2 (ja) 2012-05-30 2013-05-28 走査電子顕微鏡を利用した検査システム
CN201310205662.8A CN103454295B (zh) 2012-05-30 2013-05-29 使用扫描电子显微镜的检查系统
US13/905,623 US8890067B2 (en) 2012-05-30 2013-05-30 Inspection system using scanning electron microscope
EP13169847.4A EP2669927A3 (en) 2012-05-30 2013-05-30 Inspection system for use with scanning electron microscope
TW102119052A TWI597757B (zh) 2012-05-30 2013-05-30 使用掃描式電子顯微鏡之檢測系統

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120057468A KR101914231B1 (ko) 2012-05-30 2012-05-30 주사 전자 현미경을 이용한 검사 시스템

Publications (2)

Publication Number Publication Date
KR20130134160A KR20130134160A (ko) 2013-12-10
KR101914231B1 true KR101914231B1 (ko) 2018-11-02

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KR1020120057468A Active KR101914231B1 (ko) 2012-05-30 2012-05-30 주사 전자 현미경을 이용한 검사 시스템

Country Status (6)

Country Link
US (1) US8890067B2 (enExample)
EP (1) EP2669927A3 (enExample)
JP (1) JP6288951B2 (enExample)
KR (1) KR101914231B1 (enExample)
CN (1) CN103454295B (enExample)
TW (1) TWI597757B (enExample)

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KR20200062573A (ko) 2018-11-27 2020-06-04 김창섭 디스펜서형 노즈워크 장난감

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KR102026936B1 (ko) * 2013-03-26 2019-10-01 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
US9478402B2 (en) 2013-04-01 2016-10-25 Kla-Tencor Corporation Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor
US9347890B2 (en) 2013-12-19 2016-05-24 Kla-Tencor Corporation Low-noise sensor and an inspection system using a low-noise sensor
US9748294B2 (en) 2014-01-10 2017-08-29 Hamamatsu Photonics K.K. Anti-reflection layer for back-illuminated sensor
KR20150107939A (ko) * 2014-03-13 2015-09-24 참엔지니어링(주) 시료 관찰 장치
US9410901B2 (en) 2014-03-17 2016-08-09 Kla-Tencor Corporation Image sensor, an inspection system and a method of inspecting an article
US9767986B2 (en) * 2014-08-29 2017-09-19 Kla-Tencor Corporation Scanning electron microscope and methods of inspecting and reviewing samples
TWI573165B (zh) * 2014-12-09 2017-03-01 財團法人工業技術研究院 電子顯微鏡、讀取器以及擷取元素頻譜之方法
US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
US10748730B2 (en) 2015-05-21 2020-08-18 Kla-Tencor Corporation Photocathode including field emitter array on a silicon substrate with boron layer
US10462391B2 (en) 2015-08-14 2019-10-29 Kla-Tencor Corporation Dark-field inspection using a low-noise sensor
US11094502B2 (en) 2015-12-24 2021-08-17 Asml Netherlands B.V. Method and apparatus for inspection
US10778925B2 (en) 2016-04-06 2020-09-15 Kla-Tencor Corporation Multiple column per channel CCD sensor architecture for inspection and metrology
US10313622B2 (en) 2016-04-06 2019-06-04 Kla-Tencor Corporation Dual-column-parallel CCD sensor and inspection systems using a sensor
KR102307522B1 (ko) * 2016-05-10 2021-09-29 가부시키가이샤 스미카 분세키 센터 유기 전자 소자의 검사 방법 및 분석 방법, 그리고 그 이용
CN106291899A (zh) * 2016-09-29 2017-01-04 东方晶源微电子科技（北京）有限公司 照明模块、光学显微系统及电子束检测装置
CN106770405A (zh) * 2016-12-09 2017-05-31 清华大学 一种完全大气压下超光学衍射成像装置
CN107116308B (zh) * 2017-05-03 2019-01-04 湖北工业大学 波导微纳加工系统以及加工方法
US10049904B1 (en) * 2017-08-03 2018-08-14 Applied Materials, Inc. Method and system for moving a substrate
CN109975340A (zh) * 2017-12-26 2019-07-05 上海梅山钢铁股份有限公司 镀铝锌板无铬钝化膜厚度的微观分析方法
US11114489B2 (en) 2018-06-18 2021-09-07 Kla-Tencor Corporation Back-illuminated sensor and a method of manufacturing a sensor
US10943760B2 (en) 2018-10-12 2021-03-09 Kla Corporation Electron gun and electron microscope
US11114491B2 (en) 2018-12-12 2021-09-07 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor
JP7231738B2 (ja) 2018-12-31 2023-03-01 エーエスエムエル ネザーランズ ビー．ブイ． 複数ビームを用いたインレンズウェーハプリチャージ及び検査
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KR20200062573A (ko) 2018-11-27 2020-06-04 김창섭 디스펜서형 노즈워크 장난감

Also Published As

Publication number Publication date
TW201403652A (zh) 2014-01-16
EP2669927A3 (en) 2015-08-12
US20130320211A1 (en) 2013-12-05
TWI597757B (zh) 2017-09-01
CN103454295B (zh) 2017-12-29
US8890067B2 (en) 2014-11-18
JP6288951B2 (ja) 2018-03-07
KR20130134160A (ko) 2013-12-10
JP2013251262A (ja) 2013-12-12
CN103454295A (zh) 2013-12-18
EP2669927A2 (en) 2013-12-04

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