JP2012191048A - 保護フィルム付きダイシングフィルム - Google Patents
保護フィルム付きダイシングフィルム Download PDFInfo
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- JP2012191048A JP2012191048A JP2011054304A JP2011054304A JP2012191048A JP 2012191048 A JP2012191048 A JP 2012191048A JP 2011054304 A JP2011054304 A JP 2011054304A JP 2011054304 A JP2011054304 A JP 2011054304A JP 2012191048 A JP2012191048 A JP 2012191048A
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- film
- dicing
- transmittance
- protective film
- dicing film
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
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- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
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- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
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Abstract
【解決手段】 ダイシングフィルムと保護フィルムとが積層された保護フィルム付きダイシングフィルムであって、波長600〜700nmにおける保護フィルムの透過率と、ダイシングフィルムのフィルム検出用の光が最初に透過する部分における保護フィルム付きダイシングフィルムの透過率との差が20%以上であることを特徴とする保護フィルム付きダイシングフィルム。
【選択図】 図1
Description
本発明の一実施形態に係る保護フィルム付きダイシングフィルムについて、以下に説明する。図1(a)は、本発明の一実施形態に係る保護フィルム付きダイシングフィルムを示す断面模式図であり、図1(b)は、その平面図である。図2は、図1(a)及び図1(b)に示した保護フィルム付きダイシングフィルムの一部を示す断面模式図である。
先ず、基材1は、従来公知の製膜方法により製膜することができる。当該製膜方法としては、例えばカレンダー製膜法、有機溶媒中でのキャスティング法、密閉系でのインフレーション押出法、Tダイ押出法、共押出し法、ドライラミネート法等が例示できる。基材1を着色する場合には、上記色材を添加する。
先ず、ダイボンドフィルム3の形成材料である接着剤組成物溶液を作製する。当該接着剤組成物溶液には、前述の通り、前記接着剤組成物やフィラー、その他各種の添加剤等が配合されている。
基材1には、図3に示す保護フィルム付きダイシングフィルム20のように、基材1と粘着剤層2との間に、印刷層15が設けられていてもよい。印刷層15が設けられていると、保護フィルム14のみの透過率と、ダイシングフィルム11を含む保護フィルム付きダイシングフィルム20の透過率との差をより確実に20%以上とすることができる。
以下では、図4(a)、図4(b)及び図5を参照しながら保護フィルム付きダイシングフィルム10を用いた場合を例にして説明する。図4(a)、図4(b)は、本実施形態に係る半導体装置の製造方法を説明するための断面模式図である。図5は、図1及び図2に示した保護フィルム付きダイシングフィルムに於ける接着剤層を介して半導体チップを実装した例を示す断面模式図である。
アクリル酸ブチル70部、アクリル酸エチル30部、アクリル酸5部を酢酸エチル中で常法により共重合させ、重量平均分子量80万のアクリル系ポリマーを得た。次に、このアクリル系ポリマー100部に、架橋剤として多官能エポキシ化合物(三菱ガス化学(株)社製、製品名「TETRAD−C」)8部と、光重合開始剤として1−ヒドロキシシクロヘキシルフェニルケトン7部とを配合し、これらを有機溶剤としてのトルエンに均一に溶解させて、濃度30重量%のアクリル系粘着剤組成物溶液を得た。このアクリル系粘着剤組成物溶液を表1、表2に示す各実施例、各比較例の基材面上に厚さが10μmとなるように塗布し、120℃で3分間乾燥を行った。その後、マスクを介して、半導体ウェハが貼り付けられる部分にのみ紫外線を500mJ/cm2照射して、半導体ウェハが貼り付けられる部分が紫外線硬化されたダイシングフィルムを得た。なお、実施例1に係る基材(PP(ポリプロピレン))は、フタムラ化学株式会社社製、製品名「FVHK-LB#40 N100」である。実施例2に係る基材(PP(ポリプロピレン))は、フタムラ化学株式会社社製、製品名「FBS-LB#40 S-400X」である。実施例3に係る基材(PO(ポリオレフィン))は、三井化学株式会社社製、製品名「TPX」である。実施例4に係る基材(PVC(ポリ塩化ビニル))は、日東電工株式会社社製、製品名「SPV-M4001」である。実施例5に係る基材(PVC(ポリ塩化ビニル))は、日東電工株式会社社製、製品名「SPV-320」である。比較例1に係る基材(PET(ポリエチレンテレフタレート))は、三菱樹脂株式会社社製、製品名「MRA-38」である。比較例2に係る基材(PET(ポリエチレンテレフタレート))は、三菱樹脂株式会社社製、製品名「MRF-50」である。
下記(a)〜(d)をメチルエチルケトンに溶解させ、濃度23.6重量%の接着剤組成物溶液を得た。
(a)エポキシ樹脂(JER(株)製、エピコート1001) 32重量部
(b)フェノール樹脂(三井化学(株)製、ミレックスXLC−4L) 34重量部
(c)アクリル酸エチル−メチルメタクリレートを主成分とするアクリル酸エステル系ポリマー(ナガセケムテックス(株)製、SG−708−6) 100重量部
(d)球状シリカ(アドマテックス(株)製、SO−25R) 110重量部
作製した各実施例、各比較例のダイシングフィルムをそれぞれ直径370mmになるように円形に打ち抜いた。次に、作製したダイボンドフィルムを直径320mmになるように円形に打ち抜き、各ダイシングフィルムに転写した。転写は、ダイシングフィルムの粘着剤層とダイボンドフィルムとが対向するように行った。その後、シリコーン離型処理した厚さ35μmのポリエチレンテレフタレートフィルムの保護フィルムをダイボンドフィルム側に貼り合わせ、本実施例、本比較例の保護フィルム付きダイシングフィルムを得た。
透過率の測定には、日本分光社製の分光光度計(製品名「V−670」)を用い、測定モードを%T(透過率測定)、測定波長領域を190〜800nmとして行った。その際の波長650nmでの透過率を測定値とした。その結果、保護フィルムの波長650nmでの透過率は、88.8%であった。また、ダイシングフィルムの波長650nmでの透過率(%)、保護フィルムとダイシングフィルムの積層部分の透過率(%)は、表1、表2に示す通りとなった。なお、表1、表2には、保護フィルムとダイシングフィルムの積層部分の透過率と、保護フィルムの透過率との差も示している。
保護フィルム上のダイシングフィルムを検出するセンサーと、検出したダイシングフィルムを保護フィルムから剥離して半導体ウェハを貼り付けるウェハーマウント装置とを用い、センサー認識性試験を行った。センサーがダイシングフィルムを認識し、ウェハマウントが行えたものを○、ダイシングフィルムを認識せず、ウェハマウントが行えなかったものを×とした。結果を表1、表2に示す。
センサー:キーエンス社製、LV−11SB
センサーヘッド:直線光回帰反射型(型式:LV−S62)
検出距離50mm
ウェハーマウント装置:日東精機社製:MA−3000III
貼り合わせ速度:10mm/秒
繰り出し速度:10mm/秒
実施例3の基材について、ヘイズ値を測定した。ヘイズ値の測定は、具体的には、ヘイズメーター(「NDH2000」,日本電色工業(株)製)にて行なった。
ヘイズ(%)=Td/Tt x 100
Td : 拡散透過率
Tt : 全光線透過率
結果を表1に示す。
表1、表2の結果から分かる通り、保護フィルムとダイシングフィルムの積層部分の透過率と、保護フィルムの透過率との差が20%以上であると、センサーによりダイシングフィルムを認識することができた。
2 粘着剤層
3 ダイボンドフィルム
4 半導体ウェハ
5 半導体チップ
6 被着体
7 ボンディングワイヤー
8 封止樹脂
10、20 保護フィルム付きダイシングフィルム
11 ダイシングフィルム
14 保護フィルム
15 印刷層
Claims (6)
- ダイシングフィルムと保護フィルムとが積層された保護フィルム付きダイシングフィルムであって、
波長600〜700nmにおける前記保護フィルムの透過率と、前記ダイシングフィルムのフィルム検出用の光が最初に透過する部分における前記保護フィルム付きダイシングフィルムの透過率との差が20%以上であることを特徴とする保護フィルム付きダイシングフィルム。 - 前記ダイシングフィルムは、基材と前記基材上に積層された粘着剤層とを有しており、
前記基材には、エンボス処理が施されていることを特徴とする請求項1に記載の保護フィルム付きダイシングフィルム。 - 前記ダイシングフィルムは、基材と前記基材上に積層された粘着剤層とを有しており、前記基材が着色されていることを特徴とする請求項1に記載の保護フィルム付きダイシングフィルム。
- 前記ダイシングフィルムのフィルム検出用の光が最初に透過する部分における前記保護フィルム付きダイシングフィルムの透過率は、0〜70%であることを特徴とする請求項1〜3のいずれか1に記載の保護フィルム付きダイシングフィルム。
- 前記保護フィルムの透過率は、75〜100%であることを特徴とする請求項1〜4のいずれか1に記載の保護フィルム付きダイシングフィルム。
- 前記ダイシングフィルムの前記粘着剤層上に、ダイボンドフィルムが積層されていることを特徴とする請求項1〜5のいずれか1に記載の保護フィルム付きダイシングフィルム。
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JP2011054304A JP5036887B1 (ja) | 2011-03-11 | 2011-03-11 | 保護フィルム付きダイシングフィルム |
TW101107792A TWI415181B (zh) | 2011-03-11 | 2012-03-08 | 半導體裝置的製造方法 |
TW102136133A TWI433230B (zh) | 2011-03-11 | 2012-03-08 | 帶有保護薄膜的切割薄膜 |
US13/415,524 US8614139B2 (en) | 2011-03-11 | 2012-03-08 | Dicing film with protecting film |
KR1020120024293A KR101168562B1 (ko) | 2011-03-11 | 2012-03-09 | 보호 필름이 부착된 다이싱 필름 |
CN201210061857.5A CN102673076B (zh) | 2011-03-11 | 2012-03-09 | 带有保护薄膜的切割薄膜 |
US14/134,544 US20140106106A1 (en) | 2011-03-11 | 2013-12-19 | Dicing film with protecting film |
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JP5036887B1 (ja) | 2012-09-26 |
TW201243934A (en) | 2012-11-01 |
US20140106106A1 (en) | 2014-04-17 |
US20120231236A1 (en) | 2012-09-13 |
TW201403701A (zh) | 2014-01-16 |
TWI415181B (zh) | 2013-11-11 |
US8614139B2 (en) | 2013-12-24 |
CN102673076B (zh) | 2015-01-07 |
KR101168562B1 (ko) | 2012-07-27 |
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