JP2012142543A5 - - Google Patents

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Publication number
JP2012142543A5
JP2012142543A5 JP2011124610A JP2011124610A JP2012142543A5 JP 2012142543 A5 JP2012142543 A5 JP 2012142543A5 JP 2011124610 A JP2011124610 A JP 2011124610A JP 2011124610 A JP2011124610 A JP 2011124610A JP 2012142543 A5 JP2012142543 A5 JP 2012142543A5
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JP
Japan
Prior art keywords
lower electrode
film
oxygen atmosphere
oxidation
oxyfluoride
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JP2011124610A
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English (en)
Japanese (ja)
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JP2012142543A (ja
JP5708929B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2011124610A external-priority patent/JP5708929B2/ja
Priority to JP2011124610A priority Critical patent/JP5708929B2/ja
Priority to KR1020110114291A priority patent/KR101984308B1/ko
Priority to TW100142578A priority patent/TWI462356B/zh
Priority to CN201110399205.8A priority patent/CN102569335B/zh
Priority to US13/310,830 priority patent/US9112149B2/en
Publication of JP2012142543A publication Critical patent/JP2012142543A/ja
Publication of JP2012142543A5 publication Critical patent/JP2012142543A5/ja
Publication of JP5708929B2 publication Critical patent/JP5708929B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2011124610A 2010-12-13 2011-06-02 記憶素子およびその製造方法、並びに記憶装置 Expired - Fee Related JP5708929B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011124610A JP5708929B2 (ja) 2010-12-13 2011-06-02 記憶素子およびその製造方法、並びに記憶装置
KR1020110114291A KR101984308B1 (ko) 2010-12-13 2011-11-04 기억 소자 및 그 제조 방법, 및 기억 장치
TW100142578A TWI462356B (zh) 2010-12-13 2011-11-21 記憶體元件及其製造方法及記憶體裝置
US13/310,830 US9112149B2 (en) 2010-12-13 2011-12-05 Memory element and method of manufacturing the same, and memory device
CN201110399205.8A CN102569335B (zh) 2010-12-13 2011-12-05 存储元件、存储元件制造方法和存储装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010276749 2010-12-13
JP2010276749 2010-12-13
JP2011124610A JP5708929B2 (ja) 2010-12-13 2011-06-02 記憶素子およびその製造方法、並びに記憶装置

Publications (3)

Publication Number Publication Date
JP2012142543A JP2012142543A (ja) 2012-07-26
JP2012142543A5 true JP2012142543A5 (enExample) 2014-06-26
JP5708929B2 JP5708929B2 (ja) 2015-04-30

Family

ID=46198412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011124610A Expired - Fee Related JP5708929B2 (ja) 2010-12-13 2011-06-02 記憶素子およびその製造方法、並びに記憶装置

Country Status (5)

Country Link
US (1) US9112149B2 (enExample)
JP (1) JP5708929B2 (enExample)
KR (1) KR101984308B1 (enExample)
CN (1) CN102569335B (enExample)
TW (1) TWI462356B (enExample)

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US9472756B2 (en) * 2012-09-07 2016-10-18 Kabushiki Kaisha Toshiba Nonvolatile memory device
KR102166506B1 (ko) * 2012-12-26 2020-10-15 소니 세미컨덕터 솔루션즈 가부시키가이샤 기억 장치 및 그 제조 방법
US20140264224A1 (en) * 2013-03-14 2014-09-18 Intermolecular, Inc. Performance Enhancement of Forming-Free ReRAM Devices Using 3D Nanoparticles
US8981334B1 (en) * 2013-11-01 2015-03-17 Micron Technology, Inc. Memory cells having regions containing one or both of carbon and boron
JP6262332B2 (ja) * 2014-03-28 2018-01-24 Ｊｘ金属株式会社 Ａｌ−Ｔｅ−Ｃｕ−Ｚｒ合金からなるスパッタリングターゲット及びその製造方法
KR102490385B1 (ko) * 2014-10-09 2023-01-19 제이엑스금속주식회사 Al-Te-Cu-Zr계 합금으로 이루어지는 스퍼터링 타깃 및 그 제조 방법
CN106601909B (zh) * 2016-12-20 2019-08-02 南京邮电大学 一种卟啉忆阻器及其制备方法
CN107732010B (zh) * 2017-09-29 2020-07-10 华中科技大学 一种选通管器件及其制备方法
KR20190067668A (ko) * 2017-12-07 2019-06-17 에스케이하이닉스 주식회사 저항 변화 소자
WO2020138975A1 (ko) * 2018-12-26 2020-07-02 한양대학교 에리카산학협력단 메모리 소자 및 그 제조 방법
JP2021048258A (ja) * 2019-09-18 2021-03-25 キオクシア株式会社 抵抗変化素子
CN114420838A (zh) * 2021-12-30 2022-04-29 长江先进存储产业创新中心有限责任公司 相变存储器及其制造方法
KR102747797B1 (ko) * 2022-07-28 2024-12-31 고려대학교산학협력단 전기화학적 금속화 스위치 및 이의 제조 방법

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4792714B2 (ja) * 2003-11-28 2011-10-12 ソニー株式会社 記憶素子及び記憶装置
US7199394B2 (en) * 2004-08-17 2007-04-03 Spansion Llc Polymer memory device with variable period of retention time
US20060245235A1 (en) * 2005-05-02 2006-11-02 Advanced Micro Devices, Inc. Design and operation of a resistance switching memory cell with diode
JP3913258B2 (ja) * 2005-06-30 2007-05-09 シャープ株式会社 半導体記憶装置
JP2008135659A (ja) * 2006-11-29 2008-06-12 Sony Corp 記憶素子、記憶装置
US8097878B2 (en) * 2007-03-05 2012-01-17 Intermolecular, Inc. Nonvolatile memory elements with metal-deficient resistive-switching metal oxides
JP2008251108A (ja) * 2007-03-30 2008-10-16 Toshiba Corp 情報記録再生装置
JP2009043905A (ja) * 2007-08-08 2009-02-26 Hitachi Ltd 半導体装置
JP5050813B2 (ja) * 2007-11-29 2012-10-17 ソニー株式会社 メモリセル
JP5257573B2 (ja) * 2007-12-06 2013-08-07 ソニー株式会社 記憶素子および記憶装置
JP4466738B2 (ja) * 2008-01-09 2010-05-26 ソニー株式会社 記憶素子および記憶装置
WO2009122583A1 (ja) * 2008-04-03 2009-10-08 株式会社 東芝 不揮発性記憶装置及びその製造方法
US20110096595A1 (en) * 2008-06-20 2011-04-28 Masayuki Terai Semiconductor memory device and operation method thereof
TWI426551B (zh) * 2009-03-25 2014-02-11 Ind Tech Res Inst 立體金屬氧化物電極及其製造方法
JP2010278275A (ja) * 2009-05-29 2010-12-09 Sony Corp 半導体記憶装置
JP2011124511A (ja) * 2009-12-14 2011-06-23 Sony Corp 記憶素子および記憶装置
US8216862B2 (en) * 2010-03-16 2012-07-10 Sandisk 3D Llc Forming and training processes for resistance-change memory cell
US8427859B2 (en) * 2010-04-22 2013-04-23 Micron Technology, Inc. Arrays of vertically stacked tiers of non-volatile cross point memory cells, methods of forming arrays of vertically stacked tiers of non-volatile cross point memory cells, and methods of reading a data value stored by an array of vertically stacked tiers of non-volatile cross point memory cells

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