JP2011522130A5 - - Google Patents
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- JP2011522130A5 JP2011522130A5 JP2011512105A JP2011512105A JP2011522130A5 JP 2011522130 A5 JP2011522130 A5 JP 2011522130A5 JP 2011512105 A JP2011512105 A JP 2011512105A JP 2011512105 A JP2011512105 A JP 2011512105A JP 2011522130 A5 JP2011522130 A5 JP 2011522130A5
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- JP
- Japan
- Prior art keywords
- gas
- flow
- mbar
- diameter
- total pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008026974A DE102008026974A1 (de) | 2008-06-03 | 2008-06-03 | Verfahren und Vorrichtung zum Abscheiden dünner Schichten aus polymeren Para-Xylylene oder substituiertem Para-Xylylene |
| DE102008026974.3 | 2008-06-03 | ||
| PCT/EP2009/056768 WO2009147156A1 (de) | 2008-06-03 | 2009-06-03 | Verfahren und vorrichtung zum abscheiden dünner schichten aus polymeren para-xylylene oder substituiertem para-xylylene |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011522130A JP2011522130A (ja) | 2011-07-28 |
| JP2011522130A5 true JP2011522130A5 (enExample) | 2012-07-12 |
Family
ID=41203865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011512105A Pending JP2011522130A (ja) | 2008-06-03 | 2009-06-03 | 重合パラキシリレンまたは置換パラキシリレンの薄い層を堆積させるための堆積方法および堆積装置 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20110293832A1 (enExample) |
| EP (1) | EP2293883B1 (enExample) |
| JP (1) | JP2011522130A (enExample) |
| KR (1) | KR101967778B1 (enExample) |
| CN (1) | CN102056679B (enExample) |
| DE (1) | DE102008026974A1 (enExample) |
| RU (1) | RU2481901C2 (enExample) |
| TW (1) | TWI463031B (enExample) |
| WO (1) | WO2009147156A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010000447A1 (de) | 2010-02-17 | 2011-08-18 | Aixtron Ag, 52134 | Beschichtungsvorrichtung sowie Verfahren zum Betrieb einer Beschichtungsvorrichtung mit einer Schirmplatte |
| DE102010000479A1 (de) | 2010-02-19 | 2011-08-25 | Aixtron Ag, 52134 | Vorrichtung zur Homogenisierung eines verdampften Aerosols sowie Vorrichtung zum Abscheiden einer organischen Schicht auf einem Substrat mit einer derartigen Homogenisierungseinrichtung |
| DE102010000480A1 (de) | 2010-02-19 | 2011-08-25 | Aixtron Ag, 52134 | Vorrichtung zum Abscheiden einer organischen Schicht, insbesondere einer Polymerschicht mit einem Aerosolerzeuger sowie ein hierzu geeigneter Aerosolerzeuger |
| DE102010010819A1 (de) * | 2010-03-10 | 2011-09-15 | Osram Opto Semiconductors Gmbh | Verfahren und Vorrichtung zur Herstellung einer Parylen-Beschichtung |
| RU2461429C2 (ru) * | 2010-09-03 | 2012-09-20 | Российская Федерация, от имени которой выступает Министерство образования и науки РФ (Минобрнаука РФ) | Способ получения пленок полипараксилилена и его производных |
| TWI427839B (zh) * | 2010-12-03 | 2014-02-21 | Ind Tech Res Inst | 薄膜圖案的沉積裝置與方法 |
| KR101638765B1 (ko) * | 2011-04-29 | 2016-07-13 | 어플라이드 머티어리얼스, 인코포레이티드 | 반응성 증착 프로세스를 위한 가스 시스템 |
| DE102011051261A1 (de) * | 2011-06-22 | 2012-12-27 | Aixtron Se | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
| TWI458843B (zh) | 2011-10-06 | 2014-11-01 | Ind Tech Res Inst | 蒸鍍裝置與有機薄膜的形成方法 |
| US11060183B2 (en) * | 2012-03-23 | 2021-07-13 | Hzo, Inc. | Apparatuses, systems and methods for applying protective coatings to electronic device assemblies |
| US9238865B2 (en) * | 2012-02-06 | 2016-01-19 | Asm Ip Holding B.V. | Multiple vapor sources for vapor deposition |
| JP5953906B2 (ja) * | 2012-04-26 | 2016-07-20 | 旭硝子株式会社 | 光学素子の成形装置及び成形方法 |
| DE102013101534A1 (de) * | 2013-02-15 | 2014-08-21 | Aixtron Se | Gasverteiler für einen CVD-Reaktor |
| KR102150625B1 (ko) * | 2013-03-15 | 2020-10-27 | 삼성디스플레이 주식회사 | 코팅장치 |
| TW201540772A (zh) * | 2014-04-24 | 2015-11-01 | 美樺興業股份有限公司 | 高分子粒子及其製備方法 |
| DE102014115497A1 (de) * | 2014-10-24 | 2016-05-12 | Aixtron Se | Temperierte Gaszuleitung mit an mehreren Stellen eingespeisten Verdünnungsgasströmen |
| KR101709344B1 (ko) * | 2014-12-11 | 2017-03-08 | 한국과학기술원 | 종이기판 및 그 제조방법과 종이기판을 이용하는 센서 및 그 제조방법 |
| US10743421B2 (en) * | 2016-06-17 | 2020-08-11 | Hzo, Inc. | Mixing dimers for moisture resistant materials |
| CN108355855B (zh) * | 2018-03-23 | 2020-05-29 | 德淮半导体有限公司 | 增粘剂涂布装置 |
| GB201814231D0 (en) * | 2018-08-31 | 2018-10-17 | Univ Surrey | Apparatus for forming a poly(p-xylylene) film on a component |
| WO2020251696A1 (en) | 2019-06-10 | 2020-12-17 | Applied Materials, Inc. | Processing system for forming layers |
| US11788190B2 (en) | 2019-07-05 | 2023-10-17 | Asm Ip Holding B.V. | Liquid vaporizer |
| GB201913140D0 (en) * | 2019-09-12 | 2019-10-30 | Ucl Business Plc | Methods and apparatuses for fabricating polymeric conformal coatings, parts coated with polymeric conformal coatings, and optical apparatus |
| US11946136B2 (en) | 2019-09-20 | 2024-04-02 | Asm Ip Holding B.V. | Semiconductor processing device |
| KR102433553B1 (ko) * | 2020-07-30 | 2022-08-18 | 연세대학교 산학협력단 | 폴리머 증착기 및 폴리머 증착 방법 |
| CN114277359B (zh) * | 2021-12-28 | 2023-11-28 | 新美光(苏州)半导体科技有限公司 | 进气管道、化学气相沉积炉及向其通入前驱体的方法 |
| DE102022122315A1 (de) * | 2022-09-02 | 2024-03-07 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Verfahren und vorrichtung zur herstellung einer tragstruktur, tragstruktur und optisches gerät mit einer tragstruktur |
| CN115572946B (zh) * | 2022-09-16 | 2024-09-24 | 华为数字能源技术有限公司 | 一种钙钛矿的制备方法、制备设备及光电转换器 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3325628A (en) * | 1966-02-16 | 1967-06-13 | Union Carbide Corp | Vapor generator |
| US3288728A (en) | 1966-02-18 | 1966-11-29 | Union Carbide Corp | Para-xylylene copolymers |
| US3908046A (en) * | 1974-02-25 | 1975-09-23 | Xerox Corp | P-xylene vapor phase polymerization coating of electrostatographic particles |
| SU1840423A1 (ru) * | 1982-04-15 | 2007-03-20 | НПО "Астрофизика", Институт неорганической химии СО АН СССР | Способ получения покрытий из металлов |
| US5000113A (en) * | 1986-12-19 | 1991-03-19 | Applied Materials, Inc. | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
| US4945856A (en) | 1988-06-23 | 1990-08-07 | Jeffrey Stewart | Parylene deposition chamber |
| US4933129A (en) * | 1988-07-25 | 1990-06-12 | Ultrafibre, Inc. | Process for producing nonwoven insulating webs |
| US5268033A (en) * | 1991-07-01 | 1993-12-07 | Jeffrey Stewart | Table top parylene deposition chamber |
| US5264039A (en) * | 1992-02-24 | 1993-11-23 | Union Carbide Chemicals & Plastics Technology Corporation | Vapor deposition apparatus |
| RU2061786C1 (ru) * | 1992-11-06 | 1996-06-10 | Санкт-Петербургский государственный электротехнический университет им.В.И.Ульянова (Ленина) | Способ нанесения покрытий в вакууме и испаритель вакуумной установки для его осуществления |
| JP3247270B2 (ja) * | 1994-08-25 | 2002-01-15 | 東京エレクトロン株式会社 | 処理装置及びドライクリーニング方法 |
| US5776254A (en) * | 1994-12-28 | 1998-07-07 | Mitsubishi Denki Kabushiki Kaisha | Apparatus for forming thin film by chemical vapor deposition |
| DE69625615T2 (de) * | 1995-10-27 | 2003-09-11 | Specialty Coating Systems, Inc. | Verfahren und vorrichtung zur ablagerung von parylen af4 auf halbleiterwafern |
| US5709753A (en) * | 1995-10-27 | 1998-01-20 | Specialty Coating Sysetms, Inc. | Parylene deposition apparatus including a heated and cooled dimer crucible |
| US5536321A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter |
| US5536319A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including an atmospheric shroud and inert gas source |
| US5958510A (en) * | 1996-01-08 | 1999-09-28 | Applied Materials, Inc. | Method and apparatus for forming a thin polymer layer on an integrated circuit structure |
| US6849295B2 (en) * | 1996-08-22 | 2005-02-01 | Vacuumschmelze Gmbh | Method for producing a winding protection for tape-wound cores |
| US5804259A (en) * | 1996-11-07 | 1998-09-08 | Applied Materials, Inc. | Method and apparatus for depositing a multilayered low dielectric constant film |
| US5986874A (en) * | 1997-06-03 | 1999-11-16 | Watkins-Johnson Company | Electrostatic support assembly having an integral ion focus ring |
| US6362115B1 (en) * | 1998-12-09 | 2002-03-26 | Applied Materials, Inc. | In-situ generation of p-xylyiene from liquid precursors |
| JP2000260764A (ja) * | 1999-03-08 | 2000-09-22 | Nec Corp | 半導体装置の製造装置 |
| JP4226136B2 (ja) * | 1999-04-02 | 2009-02-18 | 株式会社Inax | 水廻り窯業製品における溶性シリカによるケイ酸析出防止方法 |
| US6709715B1 (en) * | 1999-06-17 | 2004-03-23 | Applied Materials Inc. | Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds |
| DE10007059A1 (de) * | 2000-02-16 | 2001-08-23 | Aixtron Ag | Verfahren und Vorrichtung zur Herstellung von beschichteten Substraten mittels Kondensationsbeschichtung |
| US6451692B1 (en) * | 2000-08-18 | 2002-09-17 | Micron Technology, Inc. | Preheating of chemical vapor deposition precursors |
| DE10136858A1 (de) * | 2001-02-15 | 2002-09-05 | Aixtron Ag | Beschichtungsvorrichtung |
| US20040255862A1 (en) * | 2001-02-26 | 2004-12-23 | Lee Chung J. | Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
| JP4301403B2 (ja) * | 2003-01-21 | 2009-07-22 | 日本碍子株式会社 | 半導体製造装置用ライナー |
| DE10320597A1 (de) * | 2003-04-30 | 2004-12-02 | Aixtron Ag | Verfahren und Vorrichtung zum Abscheiden von Halbleiterschichten mit zwei Prozessgasen, von denen das eine vorkonditioniert ist |
| US7390535B2 (en) * | 2003-07-03 | 2008-06-24 | Aeromet Technologies, Inc. | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| US7037834B2 (en) * | 2004-05-22 | 2006-05-02 | International Business Machines Corporation | Constant emissivity deposition member |
| JP4506953B2 (ja) * | 2004-05-28 | 2010-07-21 | 日本電気株式会社 | 共重合高分子膜およびその作製方法 |
| RU2317313C2 (ru) * | 2004-10-28 | 2008-02-20 | Самсунг Электроникс Ко., Лтд | Способ получения жидкокристаллической полимерной пленки |
| JP5140957B2 (ja) * | 2005-12-27 | 2013-02-13 | 東京エレクトロン株式会社 | 成膜装置 |
| JPWO2008012921A1 (ja) * | 2006-07-28 | 2009-12-17 | 第三化成株式会社 | 化学気相蒸着装置及び化学気相蒸着方法 |
| US20090095218A1 (en) * | 2007-10-16 | 2009-04-16 | Novellus Systems, Inc. | Temperature controlled showerhead |
| US20090260571A1 (en) * | 2008-04-16 | 2009-10-22 | Novellus Systems, Inc. | Showerhead for chemical vapor deposition |
-
2008
- 2008-06-03 DE DE102008026974A patent/DE102008026974A1/de not_active Withdrawn
-
2009
- 2009-06-03 US US12/995,170 patent/US20110293832A1/en not_active Abandoned
- 2009-06-03 RU RU2010154436/05A patent/RU2481901C2/ru not_active IP Right Cessation
- 2009-06-03 EP EP09757537.7A patent/EP2293883B1/de not_active Not-in-force
- 2009-06-03 KR KR1020107029891A patent/KR101967778B1/ko not_active Expired - Fee Related
- 2009-06-03 TW TW098118342A patent/TWI463031B/zh not_active IP Right Cessation
- 2009-06-03 JP JP2011512105A patent/JP2011522130A/ja active Pending
- 2009-06-03 WO PCT/EP2009/056768 patent/WO2009147156A1/de not_active Ceased
- 2009-06-03 CN CN200980120900.7A patent/CN102056679B/zh not_active Expired - Fee Related