JP2011522130A - 重合パラキシリレンまたは置換パラキシリレンの薄い層を堆積させるための堆積方法および堆積装置 - Google Patents

重合パラキシリレンまたは置換パラキシリレンの薄い層を堆積させるための堆積方法および堆積装置 Download PDF

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JP2011522130A
JP2011522130A JP2011512105A JP2011512105A JP2011522130A JP 2011522130 A JP2011522130 A JP 2011522130A JP 2011512105 A JP2011512105 A JP 2011512105A JP 2011512105 A JP2011512105 A JP 2011512105A JP 2011522130 A JP2011522130 A JP 2011522130A
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gas
deposition apparatus
process chamber
chamber
temperature
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JP2011522130A5 (enExample
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ゲルスドルフ、マーカス
ゴピ、バスカー、パガダラ
メーヤー、ニコ
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アイクストロン、アーゲー
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP2011512105A 2008-06-03 2009-06-03 重合パラキシリレンまたは置換パラキシリレンの薄い層を堆積させるための堆積方法および堆積装置 Pending JP2011522130A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008026974A DE102008026974A1 (de) 2008-06-03 2008-06-03 Verfahren und Vorrichtung zum Abscheiden dünner Schichten aus polymeren Para-Xylylene oder substituiertem Para-Xylylene
DE102008026974.3 2008-06-03
PCT/EP2009/056768 WO2009147156A1 (de) 2008-06-03 2009-06-03 Verfahren und vorrichtung zum abscheiden dünner schichten aus polymeren para-xylylene oder substituiertem para-xylylene

Publications (2)

Publication Number Publication Date
JP2011522130A true JP2011522130A (ja) 2011-07-28
JP2011522130A5 JP2011522130A5 (enExample) 2012-07-12

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JP2011512105A Pending JP2011522130A (ja) 2008-06-03 2009-06-03 重合パラキシリレンまたは置換パラキシリレンの薄い層を堆積させるための堆積方法および堆積装置

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US (1) US20110293832A1 (enExample)
EP (1) EP2293883B1 (enExample)
JP (1) JP2011522130A (enExample)
KR (1) KR101967778B1 (enExample)
CN (1) CN102056679B (enExample)
DE (1) DE102008026974A1 (enExample)
RU (1) RU2481901C2 (enExample)
TW (1) TWI463031B (enExample)
WO (1) WO2009147156A1 (enExample)

Cited By (2)

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JP2013519794A (ja) * 2010-02-17 2013-05-30 アイクストロン、エスイー コーティング装置及び遮蔽プレートを有するコーティング装置の操作方法
JP2013227176A (ja) * 2012-04-26 2013-11-07 Asahi Glass Co Ltd 光学素子の成形装置及び成形方法

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TWI458843B (zh) 2011-10-06 2014-11-01 Ind Tech Res Inst 蒸鍍裝置與有機薄膜的形成方法
US11060183B2 (en) * 2012-03-23 2021-07-13 Hzo, Inc. Apparatuses, systems and methods for applying protective coatings to electronic device assemblies
US9238865B2 (en) * 2012-02-06 2016-01-19 Asm Ip Holding B.V. Multiple vapor sources for vapor deposition
DE102013101534A1 (de) * 2013-02-15 2014-08-21 Aixtron Se Gasverteiler für einen CVD-Reaktor
KR102150625B1 (ko) * 2013-03-15 2020-10-27 삼성디스플레이 주식회사 코팅장치
TW201540772A (zh) * 2014-04-24 2015-11-01 美樺興業股份有限公司 高分子粒子及其製備方法
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KR101709344B1 (ko) * 2014-12-11 2017-03-08 한국과학기술원 종이기판 및 그 제조방법과 종이기판을 이용하는 센서 및 그 제조방법
US10743421B2 (en) * 2016-06-17 2020-08-11 Hzo, Inc. Mixing dimers for moisture resistant materials
CN108355855B (zh) * 2018-03-23 2020-05-29 德淮半导体有限公司 增粘剂涂布装置
GB201814231D0 (en) * 2018-08-31 2018-10-17 Univ Surrey Apparatus for forming a poly(p-xylylene) film on a component
WO2020251696A1 (en) 2019-06-10 2020-12-17 Applied Materials, Inc. Processing system for forming layers
US11788190B2 (en) 2019-07-05 2023-10-17 Asm Ip Holding B.V. Liquid vaporizer
GB201913140D0 (en) * 2019-09-12 2019-10-30 Ucl Business Plc Methods and apparatuses for fabricating polymeric conformal coatings, parts coated with polymeric conformal coatings, and optical apparatus
US11946136B2 (en) 2019-09-20 2024-04-02 Asm Ip Holding B.V. Semiconductor processing device
KR102433553B1 (ko) * 2020-07-30 2022-08-18 연세대학교 산학협력단 폴리머 증착기 및 폴리머 증착 방법
CN114277359B (zh) * 2021-12-28 2023-11-28 新美光(苏州)半导体科技有限公司 进气管道、化学气相沉积炉及向其通入前驱体的方法
DE102022122315A1 (de) * 2022-09-02 2024-03-07 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und vorrichtung zur herstellung einer tragstruktur, tragstruktur und optisches gerät mit einer tragstruktur
CN115572946B (zh) * 2022-09-16 2024-09-24 华为数字能源技术有限公司 一种钙钛矿的制备方法、制备设备及光电转换器

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Cited By (2)

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Publication number Priority date Publication date Assignee Title
JP2013519794A (ja) * 2010-02-17 2013-05-30 アイクストロン、エスイー コーティング装置及び遮蔽プレートを有するコーティング装置の操作方法
JP2013227176A (ja) * 2012-04-26 2013-11-07 Asahi Glass Co Ltd 光学素子の成形装置及び成形方法

Also Published As

Publication number Publication date
KR101967778B1 (ko) 2019-08-13
EP2293883B1 (de) 2018-03-21
WO2009147156A1 (de) 2009-12-10
RU2010154436A (ru) 2012-07-20
CN102056679B (zh) 2015-01-14
EP2293883A1 (de) 2011-03-16
DE102008026974A1 (de) 2009-12-10
TWI463031B (zh) 2014-12-01
US20110293832A1 (en) 2011-12-01
CN102056679A (zh) 2011-05-11
KR20110015661A (ko) 2011-02-16
TW201009109A (en) 2010-03-01
RU2481901C2 (ru) 2013-05-20

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