JP2011505592A - Duv素子のための緻密で均質なフッ化物膜及びその作製方法 - Google Patents
Duv素子のための緻密で均質なフッ化物膜及びその作製方法 Download PDFInfo
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title abstract description 54
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000000463 material Substances 0.000 claims abstract description 72
- 238000000576 coating method Methods 0.000 claims abstract description 55
- 230000003287 optical effect Effects 0.000 claims abstract description 47
- 239000011248 coating agent Substances 0.000 claims abstract description 45
- 229910001512 metal fluoride Inorganic materials 0.000 claims abstract description 10
- -1 Rare earth metal fluorides Chemical class 0.000 claims abstract description 8
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 7
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims abstract description 6
- 229910052692 Dysprosium Inorganic materials 0.000 claims abstract description 3
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract description 3
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims abstract description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims abstract description 3
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical class [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 claims abstract description 3
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 42
- 239000013078 crystal Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 13
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 238000009499 grossing Methods 0.000 claims description 6
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims 1
- 229910052688 Gadolinium Inorganic materials 0.000 claims 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims 1
- 229910001632 barium fluoride Inorganic materials 0.000 claims 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910001637 strontium fluoride Inorganic materials 0.000 claims 1
- 229910005690 GdF 3 Inorganic materials 0.000 abstract description 51
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 abstract description 7
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 abstract description 6
- 239000011737 fluorine Substances 0.000 abstract description 5
- 229910052731 fluorine Inorganic materials 0.000 abstract description 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011777 magnesium Substances 0.000 abstract description 4
- 229910052749 magnesium Inorganic materials 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 abstract description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052788 barium Inorganic materials 0.000 abstract description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052791 calcium Inorganic materials 0.000 abstract description 2
- 239000011575 calcium Substances 0.000 abstract description 2
- MEANOSLIBWSCIT-UHFFFAOYSA-K gadolinium trichloride Chemical compound Cl[Gd](Cl)Cl MEANOSLIBWSCIT-UHFFFAOYSA-K 0.000 abstract description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 105
- 239000010408 film Substances 0.000 description 66
- 229910016569 AlF 3 Inorganic materials 0.000 description 47
- 229910004298 SiO 2 Inorganic materials 0.000 description 29
- 238000000151 deposition Methods 0.000 description 28
- 229910004261 CaF 2 Inorganic materials 0.000 description 23
- 229910017768 LaF 3 Inorganic materials 0.000 description 14
- 239000000565 sealant Substances 0.000 description 9
- 239000011247 coating layer Substances 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 238000000869 ion-assisted deposition Methods 0.000 description 6
- 101000643895 Homo sapiens Ubiquitin carboxyl-terminal hydrolase 6 Proteins 0.000 description 5
- 101150097620 TRE1 gene Proteins 0.000 description 5
- 102100021015 Ubiquitin carboxyl-terminal hydrolase 6 Human genes 0.000 description 5
- 238000010549 co-Evaporation Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000001659 ion-beam spectroscopy Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 3
- 238000000089 atomic force micrograph Methods 0.000 description 3
- 238000004630 atomic force microscopy Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- TYIZUJNEZNBXRS-UHFFFAOYSA-K trifluorogadolinium Chemical compound F[Gd](F)F TYIZUJNEZNBXRS-UHFFFAOYSA-K 0.000 description 3
- 102100039939 Growth/differentiation factor 8 Human genes 0.000 description 2
- 101000886562 Homo sapiens Growth/differentiation factor 8 Proteins 0.000 description 2
- 229910002319 LaF3 Inorganic materials 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000000391 spectroscopic ellipsometry Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910005693 GdF3 Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 101000929049 Xenopus tropicalis Derriere protein Proteins 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 210000004204 blood vessel Anatomy 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 210000001508 eye Anatomy 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
光学素子を提供する工程、及び
光学素子を、
(a)L-H層を形成するために高屈折率希土類金属フッ化物及び低屈折率金属フッ化物を含む少なくとも1つの膜層の共デポジション、及び
(b)L層を形成するためノ低屈折率材料のコーティングによる共デポジション膜層のコーティング、
により少なくとも1つのコーティングスタックを有するようにコーティングする工程、
を含み、
層(a)及び層(b)はそれぞれ、互いに独立に、5nm〜70nmの範囲にある厚さを有し、L-H層(a)及びL層(b)は合わせてスタックをなす。
50 共デポジションAlF3-GdF3層(L-H層)
70 表面シーラント層
100 SiO2またはCaF2の基板
Claims (10)
- コーテッド光学素子において、前記光学素子が、基板であって、該基板上に被着された高屈折率希土類金属フッ化物材料及び低屈折率金属フッ化物材料を含む少なくとも1つの均質な共デポジションL-H層、及び前記共デポジションL-H層の上面に被着された低屈折率金属フッ化物材料のL層を有する基板を備え、
前記共デポジションL-H層が5nm〜70nmの範囲にある厚さを有し、前記L層が5nm〜70nmの範囲にある厚さを有する、
ことを特徴とするコーテッド光学素子。 - 前記高屈折率希土類金属フッ化物の金属が、ネオジム、ランタン、ジスプロシウム、イットリウム及びガドリニウムからなる群から選ばれることを特徴とする請求項1に記載のコーテッド光学素子。
- 前記低屈折率金属フッ化物が、フッ化アルミニウム、フッ化カルシウム、フッ化マグネシウム、フッ化バリウム及びフッ化ストロンチウムからなる群から選ばれることを特徴とする請求項1に記載のコーテッド光学素子。
- 前記基板が、シリカ基板、石英ガラス基板、高純度石英ガラス基板及びフッ化カルシウム単結晶基板からなる群から選ばれることを特徴とする請求項1に記載のコーテッド光学素子。
- 前記コーテッド光学素子の上面の最終層として施されるシール層をさらに有し、前記シール層が、シリカ、石英ガラス、高純度石英ガラス及びフッ素ドープ石英ガラスからなる群から選ばれ、5〜70nmの範囲にある厚さを有することを特徴とする請求項1に記載のコーテッド光学素子。
- 前記光学素子が複数のL/(L-H)層対を有し、
必要に応じて、少なくとも1つの界面平滑化層が少なくとも1つの前記L/(L-H)層対間に挿入され、前記平滑化層が、シリカ、石英ガラス、高純度石英ガラス及びフッ素ドープ石英ガラスからなる群から選ばれる、
ことを特徴とする請求項1に記載のコーテッド光学素子。 - 前記共デポジション層が2〜30重量%の低屈折率金属フッ化物及び70〜98重量%の高屈折率材料を含むことを特徴とする請求項1に記載のコーテッド光学素子。
- 光学素子をコーティングする方法において、前記方法が、
光学素子を提供する工程、
前記光学素子を、少なくとも1つのコーティングスタックを有するように、
(a)L-H層を形成するために高屈折率希土類金属フッ化物及び低屈折率金属フッ化物からなる少なくとも1つの膜層の共デポジション、及び
(b)L層を形成するために低屈折率材料のコーティングによる前記共デポジション膜層のコーティング、
によってコーティングする工程、
を含み、
前記層(a)及び層(b)はそれぞれ、互いに独立に、5nm〜70nmの範囲にある厚さを有し、
前記L-H層(a)及び前記L層(b)は合わせて1つのスタックをなす、
ことを特徴とする方法。 - 前記方法が最終スタックの上面にシール層を施す工程をさらに含むことを特徴とする請求項8に記載の方法。
- 前記共デポジションL-H層及び前記L層がそれぞれ、独立に、5〜70nmの範囲にある厚さを有することを特徴とする請求項8に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US478407P | 2007-11-30 | 2007-11-30 | |
US61/004,784 | 2007-11-30 | ||
PCT/US2008/012912 WO2009070227A1 (en) | 2007-11-30 | 2008-11-19 | Dense homogeneous fluoride films for duv elements and method of preparing same |
Publications (2)
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JP2011505592A true JP2011505592A (ja) | 2011-02-24 |
JP5543357B2 JP5543357B2 (ja) | 2014-07-09 |
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JP2010535959A Active JP5543357B2 (ja) | 2007-11-30 | 2008-11-19 | Duv素子のための緻密で均質なフッ化物膜及びその作製方法 |
Country Status (5)
Country | Link |
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US (1) | US8169705B2 (ja) |
EP (1) | EP2215502B1 (ja) |
JP (1) | JP5543357B2 (ja) |
CN (1) | CN101925837B (ja) |
WO (1) | WO2009070227A1 (ja) |
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JP2017508180A (ja) * | 2014-02-27 | 2017-03-23 | コーニング インコーポレイテッド | 金属フッ化物光学素子の酸化皮膜のための耐久性コーティング |
JP2017095805A (ja) * | 2011-05-31 | 2017-06-01 | コーニング インコーポレイテッド | 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法 |
JP2023531547A (ja) * | 2020-06-29 | 2023-07-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Vuv波長域用の光学素子、光学装置、及び光学素子を製造する方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN114479457A (zh) * | 2022-01-10 | 2022-05-13 | 南方科技大学 | 一种介电复合材料及其制备方法与应用 |
WO2024155532A1 (en) * | 2023-01-17 | 2024-07-25 | University Of Rochester | Multilayer optical thin films with continuously varying refractive index |
CN117991427B (zh) * | 2024-03-13 | 2024-08-09 | 同济大学 | 一种低损耗、高反射率的193nm薄膜及其制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5659201A (en) * | 1979-10-18 | 1981-05-22 | Hoya Corp | Multilayer reflection preventing film |
JPH07110403A (ja) * | 1993-08-20 | 1995-04-25 | Olympus Optical Co Ltd | 複合型光学部品 |
JPH11101903A (ja) * | 1997-09-29 | 1999-04-13 | Nikon Corp | エキシマレーザ用高反射鏡 |
JP2001515542A (ja) * | 1997-12-31 | 2001-09-18 | コミツサリア タ レネルジー アトミーク | 光学的に使用可能なフッ化物薄膜の製造方法およびそのようにして製造された薄膜 |
JP2003021702A (ja) * | 2001-07-10 | 2003-01-24 | Olympus Optical Co Ltd | 反射防止膜及び光学素子 |
JP2005202375A (ja) * | 2003-12-15 | 2005-07-28 | Carl Zeiss Smt Ag | 液浸リソグラフィー用投影対物レンズ |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4783373A (en) * | 1986-04-18 | 1988-11-08 | Optical Coating Laboratory, Inc. | Article with thin film coating having an enhanced emissivity and reduced absorption of radiant energy |
US4934788A (en) * | 1987-03-20 | 1990-06-19 | Rockwell International Corporation | Deposition of gradient index coatings using coevaporation with rate control |
JP4161387B2 (ja) * | 1997-01-23 | 2008-10-08 | 株式会社ニコン | 多層反射防止膜 |
JP4118008B2 (ja) * | 1999-10-29 | 2008-07-16 | 株式会社ニデック | 多層膜反射ミラー |
JPWO2003009015A1 (ja) * | 2001-07-18 | 2004-11-11 | 株式会社ニコン | フッ化ランタン膜を備えた光学素子 |
JP2003149404A (ja) * | 2001-11-09 | 2003-05-21 | Canon Inc | 光学薄膜およびその製造方法、及び光学薄膜による光学素子、光学系、該光学系を備える撮像装置、記録装置、露光装置 |
US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
JP2004260080A (ja) * | 2003-02-27 | 2004-09-16 | Nikon Corp | 紫外域用反射ミラー及びそれを用いた投影露光装置 |
JP2005003806A (ja) * | 2003-06-10 | 2005-01-06 | Sun Tec Kk | 光学素子、波長可変光フィルタおよび光アドドロップモジュール |
CN1657976A (zh) * | 2004-02-16 | 2005-08-24 | 柯尼卡美能达精密光学株式会社 | 光学元件和光接收装置 |
JP4423119B2 (ja) * | 2004-06-16 | 2010-03-03 | キヤノン株式会社 | 反射防止膜及びそれを用いた光学素子 |
US20060262389A1 (en) * | 2005-05-23 | 2006-11-23 | Christoph Zaczek | Reflective optical element for ultraviolet radiation, projection optical system and projection exposure system therewith, and method for forming the same |
JP2007193060A (ja) * | 2006-01-19 | 2007-08-02 | Shimadzu Corp | 固体レーザ用ミラー |
-
2008
- 2008-11-19 WO PCT/US2008/012912 patent/WO2009070227A1/en active Application Filing
- 2008-11-19 CN CN2008801258988A patent/CN101925837B/zh active Active
- 2008-11-19 EP EP08854604.9A patent/EP2215502B1/en active Active
- 2008-11-19 JP JP2010535959A patent/JP5543357B2/ja active Active
- 2008-11-25 US US12/277,596 patent/US8169705B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5659201A (en) * | 1979-10-18 | 1981-05-22 | Hoya Corp | Multilayer reflection preventing film |
JPH07110403A (ja) * | 1993-08-20 | 1995-04-25 | Olympus Optical Co Ltd | 複合型光学部品 |
JPH11101903A (ja) * | 1997-09-29 | 1999-04-13 | Nikon Corp | エキシマレーザ用高反射鏡 |
JP2001515542A (ja) * | 1997-12-31 | 2001-09-18 | コミツサリア タ レネルジー アトミーク | 光学的に使用可能なフッ化物薄膜の製造方法およびそのようにして製造された薄膜 |
JP2003021702A (ja) * | 2001-07-10 | 2003-01-24 | Olympus Optical Co Ltd | 反射防止膜及び光学素子 |
JP2005202375A (ja) * | 2003-12-15 | 2005-07-28 | Carl Zeiss Smt Ag | 液浸リソグラフィー用投影対物レンズ |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017095805A (ja) * | 2011-05-31 | 2017-06-01 | コーニング インコーポレイテッド | 赤外光反射防止膜用耐久MgO−MgF2複合膜を形成する方法 |
JP2017508180A (ja) * | 2014-02-27 | 2017-03-23 | コーニング インコーポレイテッド | 金属フッ化物光学素子の酸化皮膜のための耐久性コーティング |
JP2023531547A (ja) * | 2020-06-29 | 2023-07-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Vuv波長域用の光学素子、光学装置、及び光学素子を製造する方法 |
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US20090141358A1 (en) | 2009-06-04 |
US8169705B2 (en) | 2012-05-01 |
EP2215502A1 (en) | 2010-08-11 |
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WO2009070227A1 (en) | 2009-06-04 |
JP5543357B2 (ja) | 2014-07-09 |
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