JP2010219210A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP2010219210A JP2010219210A JP2009062851A JP2009062851A JP2010219210A JP 2010219210 A JP2010219210 A JP 2010219210A JP 2009062851 A JP2009062851 A JP 2009062851A JP 2009062851 A JP2009062851 A JP 2009062851A JP 2010219210 A JP2010219210 A JP 2010219210A
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Classifications
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
- H01L23/3677—Wire-like or pin-like cooling fins or heat sinks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/284—Applying non-metallic protective coatings for encapsulating mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2223/6644—Packaging aspects of high-frequency amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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Abstract
【解決手段】モジュール基板51の部品搭載面に複数の実装部品を搭載した後、実装部品を覆うように樹脂56を形成し、さらに樹脂56の表面(上面および側面)にCuめっき膜およびNiめっき膜との積層膜からなるシールド層SLを形成する。シールド層SLには、結晶粒界に沿ってランダムに、かつ一直線に繋がることなく、網目状に複数のマイクロチャンネルクラックが形成されており、複数のマイクロチャンネルクラックによって樹脂56からシールド層SLの表面へ通じる複数の経路が形成されている。
【選択図】図4
Description
Cu/Ni積層膜からなるシールド層の水蒸気透過性について図6〜図10を用いて説明する。図6はシールド層の表面模式図、図7はシールド層の断面写真、図8はシールド層の水蒸気透過度を測定する試料の説明図、図9はシールド層の水蒸気透過度の測定結果を示すグラフ図、図10はシールド層の水蒸気透過度とシールド層の厚さとの関係を示すグラフ図である。
Cu/Ni積層膜からなるシールド層の必要な材料の厚さについて、図11〜図13を用いて説明する。
ここで、ωは周波数、μは透磁率、μsは比透磁率、μ0は自由空間の誘電率(4π×10−7[H/m])である。この(式1)とCuの導電率(5.82×107S/m)とを用いて、周波数1GHzでのCuの表皮深さδを計算したところ、その結果は2μmとなった。
樹脂の表面に記載した溝形状(幅150μm〜300μm)のレーザーマーク文字に対して、めっき膜は追従するので、めっき後もレーザーマーク文字を認識することができる。前述したように、例えば厚さ3μmのCuめっき膜と厚さ0.25μmのNiめっき膜との積層膜において電磁波シールド効果が得られる。従って、レーザーマーク文字をつぶすことなく、電磁波シールド効果を有するシールド層を形成することができる。また、汎用性の高いエポキシ系樹脂モールド用のレーザーマーカをそのまま使用できるので、製造コストの増加を抑えることができる。
シールド層は無電解めっき法により形成され、また、シールド層専用の外部電極や電極等の形成が不要である。従って、モジュール基板や表面実装部品のサイズが変更されても、常均一な材質および厚さのシールド層を形成することができるので、安定した電磁波シールド効果を得ることができる。
(1)プリエッチングプロセスとして、70℃の水酸化ナトリウム(20g/L)と有機溶剤(500g/L)との混合溶液に5分浸漬し、その後水洗する。
(2)過マンガン酸塩エッチングプロセスとして、80℃の過マンガン酸カリウム(50g/L)と水酸化ナトリウム(20g/L)との混合溶液に5分浸漬し、その後水洗する。
(3)中和プロセスとして、50℃のヒドロキシルアミン(20g/L)と濃硫酸(50ml/L)との混合溶液に5分浸漬し、その後水洗する。
(4)コンディショニングプロセスとして、60℃のエタノールアミン(20g/L)に5分浸漬し、その後水洗する。
(5)ソフトエッチングプロセスとして、25℃の過硫酸ナトリウム(150g/L)と濃硫酸(10ml/L)との混合溶液に2分浸漬し、その後水洗する。
(6)予備浸漬プロセスとして、室温の濃塩酸(300ml/L)に1分浸漬し、その後水洗する。
(7)触媒化として、25℃の濃硫酸(300ml/L)と塩化パラジウム(170mg/L)と塩化第一スズ(10g/L)との混合溶液に3分浸漬し、その後水洗する。
(8)促進化として、25℃の濃硫酸(50ml/L)とヒドラジン(0.5g/L)との混合溶液に5分浸漬し、その後水洗する。
(9)無電解Cuめっきとして、70℃の硫酸銅(10g/L)とEDTA2Na(エチレンジアミン四酢酸ナトリウム)(30g/L)と37%ホルムアルデヒド(3ml/L)と安定剤(ビピリジンなど)(若干)とポリエチレングリコールとの混合溶液を水酸化ナトリウムでpH12.2に調整しためっき浴に45分〜150分浸漬し、その後水洗する。
(10)ソフトエッチングプロセスとして、25℃の過酸化ナトリウム(150g/L)と濃硫酸(10ml/L)との混合溶液に2分浸漬し、その後水洗する。
(11)活性化プロセスとして、室温の濃硫酸(100ml/L)に2分浸漬し、その後水洗する。
(12)触媒化プロセスとして、25℃の塩化パラジウム(170mg/L)と濃塩酸(1ml/L)と添加剤(銅塩など)との混合溶液に5分浸漬し、その後水洗する。
(13)アルカリ性無電解Niめっきとして、90℃の硫酸ニッケル26g/Lとクエン酸ナトリウム(60g/L)と次亜リン酸ナトリウム(21g/L)とほう酸(30g/L)との混合溶液(pH8〜9に水酸化ナトリウムで調整)に5〜18分浸漬し、その後水洗し、さらに150℃で60分の乾燥を行う。
2 ベースバンド回路
3 変復調用回路
4a,4b スイッチ回路
5 分波器
6 周辺回路
6A 制御回路
6B バイアス回路
6A1 電源制御回路
6A2 バイアス電圧生成回路
7a,7b 入力端子
8a,8b 出力端子
9a1〜9a5,9b1〜9b5,9c 伝送線路
10a,10b 入力端子
11a1〜11a3,11b1〜11b3 電源端子
12a,12b 出力端子
13 制御端子
21 基板
22 エピタキシャル層
23 p型ウエル
24 ゲート絶縁膜
25 ゲート電極
26 サイドウォール
27 n−型オフセットドレイン領域
28 n型オフセットドレイン領域
29 n+型ドレイン領域
30 n−型ソース領域
31 n+型ソース領域
32 p型ハロー領域
33 p型打ち抜き層
34 p+型半導体領域
35 溝
36 窒化シリコン膜
37 酸化シリコン膜
38 コンタクトホール
39 プラグ
40 ソース電極
41 ドレイン電極
42 酸化シリコン膜
43 スルーホール
44 配線
45 表面保護膜
46 ソース裏面電極
51 モジュール基板
51A 第1配線基板
52 基板側端子
53G,53S 電極
54 単体チップ部品
55 集積チップ部品
56 樹脂
57 半田
58 放熱ビア
59a,59b 半田
60 コア材
61 プリプレグ
62 内層用Cu配線
62A 内層用Cu配線
63 外層用Cu配線
64 チップ部品
66 マザーボード
67 チップ部品
68 半田
69 切り込み
70 半田
71 空間
A 電力増幅回路
A1〜A3 増幅段
AM1〜AM3 整合回路
ANT アンテナ
B 電力増幅回路
B1〜B3 増幅段
BM1〜BM3 整合回路
BW ボンディングワイヤ
C1,C2,Cm1〜Cm12 コンデンサ
CNT1,CNT2 切換信号
DB ダイヤモンドカッター
FLT1,FLT2 フィルタ
GND 接地電位
IC1 半導体チップ
LPF1,LPF2 ロウパスフィルタ
MA モジュール
MCAP 金属キャップ
MR 金属リング
MN1,MN2 インピーダンス整合回路
PM 電力増幅器
SL シールド層
Claims (26)
- モジュール基板と、
前記モジュール基板の部品搭載面に搭載された複数の実装部品と、
前記複数の実装部品を覆うように形成された樹脂と、
前記樹脂の表面に形成された金属膜からなるシールド層と、
を含み、
前記シールド層に、複数のマイクロチャンネルクラックが形成されていることを特徴とする半導体装置。 - 請求項1記載の半導体装置において、前記シールド層に、結晶粒界に沿ってランダムに、かつ一直線に繋がることなく、網目状に前記複数のマイクロチャンネルクラックが形成されており、前記複数のマイクロチャンネルクラックによって前記樹脂の表面から前記シールド層の表面へ通じる複数の経路が形成されていることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記マイクロチャンネルクラックの幅は1〜60nmであることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記シールド層は無電解めっき法により形成された電磁波の遮蔽機能を有する第1膜と、前記第1膜上に無電解めっき法により形成された防触機能を有する第2膜との積層膜により構成されることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記シールド層は無電解めっき法により形成された銅膜と、前記銅膜上に無電解めっき法により形成されたニッケル膜との積層膜により構成されることを特徴とする半導体装置。
- 請求項5記載の半導体装置において、前記銅膜の厚さは2〜10μmであることを特徴とする半導体装置。
- 請求項6記載の半導体装置において、前記ニッケル膜の厚さは0.1〜0.3μmであることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記シールド層は無電解めっき法により形成された銅膜と、前記銅膜上に無電解めっき法により形成された錫膜、亜鉛膜、ビスマス膜または金膜との積層膜により構成されることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記モジュール基板の内層用配線の一部が前記モジュール基板の側面に引き出され、前記モジュール基板の側面に引き出された前記内層用配線の一部と前記シールド層とが前記モジュール基板の側面で電気的に接続していることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、前記シールド層と電気的に接続する内層用配線の一部はグランド配線であることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、内層用配線の一部の配線層がグランド配線に用いられ、前記内層用配線の一部の配線層の過半部分が前記グランド配線であることを特徴とする半導体装置。
- 請求項1記載の半導体装置において、
前記モジュール基板の裏面に設けられた複数の電極をさらに含み、
前記複数の電極を介して、前記モジュール基板がマザーボードの主面に搭載されていることを特徴とする半導体装置。 - 高周波電力増幅回路を含む半導体装置であって、
モジュール基板と、
前記モジュール基板の主面上に実装された、前記高周波電力増幅回路を構成するトランジスタを含む半導体チップと、
前記モジュール基板の主面上に実装された、受動素子を含むチップ部品と、
前記モジュール基板の主面、前記半導体チップおよび前記チップ部品を覆うように形成された樹脂と、
前記樹脂の表面に形成された金属膜からなるシールド層と、
を含み、
前記シールド層に、複数のマイクロチャンネルクラックが形成されていることを特徴とする半導体装置。 - 請求項13記載の半導体装置において、前記シールド層は、銅膜と前記銅膜上に形成されたニッケル膜との積層膜により構成されることを特徴とする半導体装置。
- 請求項14記載の半導体装置において、前記銅膜および前記ニッケル膜は無電解めっき法により形成されていることを特徴とする半導体装置。
- 請求項13記載の半導体装置において、前記マイクロチャンネルクラックの幅は1〜60nmであることを特徴とする半導体装置。
- 請求項13記載の半導体装置において、前記半導体装置は移動通信機器に搭載されることを特徴とする半導体装置。
- (a)複数のモジュール領域が第1方向と前記第1方向と直交する第2方向に配列されたシート状の第1配線基板を準備する工程と、
(b)前記第1配線基板の部品搭載面に複数の実装部品を実装する工程と、
(c)前記複数の実装部品を樹脂で封止する工程と、
(d)前記第1方向および前記第2方向に、前記樹脂の上から前記樹脂と前記第1配線基板の一部とを切断して、個々のモジュール領域の周囲に切り込みを入れる工程と、
(e)前記樹脂の表面および前記第1配線基板の切り込み部分に無電解めっき法により電磁波の遮蔽機能を有する第1膜と防触機能を有する第2膜との積層膜からなるシールド層を形成する工程と、
(f)前記第1配線基板の切り込み部分の下の前記第1配線基板を切断して、個々のモジュールに切り分ける工程と、
を含むことを特徴とする半導体装置の製造方法。 - 請求項18記載の半導体装置の製造方法において、前記第1膜は銅膜であり、前記第2膜はニッケル膜であることを特徴とする半導体装置の製造方法。
- 請求項19記載の半導体装置の製造方法において、前記銅膜の厚さは2〜10μmであることを特徴とする半導体装置の製造方法。
- 請求項19記載の半導体装置の製造方法において、前記ニッケル膜の厚さは0.1〜0.3μmであることを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記第1膜は銅膜であり、前記第2膜は錫膜、亜鉛膜、ビスマス膜または金膜との積層膜により構成されることを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記(f)工程の後に、さらに
(g)半田を介して前記モジュールをマザーボードの主面に配置し、その後、リフロー加熱を行う工程を含むことを特徴とする半導体装置の製造方法。 - 請求項23記載の半導体装置の製造方法において、前記リフロー加熱は250℃以上の温度で行われることを特徴とする半導体装置の製造方法。
- 請求項18記載の半導体装置の製造方法において、前記(d)工程では、前記モジュール領域の内層用配線の一部が前記モジュール領域の側面に露出するように、前記第1配線基板の一部が切断され、前記(e)工程では、前記シールド層が、前記モジュール領域の側面に露出した前記内層用配線の一部と電気的に接続するように、前記シールド層が形成されることを特徴とする半導体装置の製造方法。
- 請求項25記載の半導体装置の製造方法において、前記シールド層と電気的に接続する前記内層用配線の一部はグランド配線であることを特徴とする半導体装置の製造方法。
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