JP2010109390A5 - - Google Patents

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Publication number
JP2010109390A5
JP2010109390A5 JP2010022217A JP2010022217A JP2010109390A5 JP 2010109390 A5 JP2010109390 A5 JP 2010109390A5 JP 2010022217 A JP2010022217 A JP 2010022217A JP 2010022217 A JP2010022217 A JP 2010022217A JP 2010109390 A5 JP2010109390 A5 JP 2010109390A5
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JP
Japan
Prior art keywords
article
backfill gas
gas pressure
support structure
clamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010022217A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010109390A (ja
JP5118711B2 (ja
Filing date
Publication date
Priority claimed from US10/734,641 external-priority patent/US6897945B1/en
Application filed filed Critical
Publication of JP2010109390A publication Critical patent/JP2010109390A/ja
Publication of JP2010109390A5 publication Critical patent/JP2010109390A5/ja
Application granted granted Critical
Publication of JP5118711B2 publication Critical patent/JP5118711B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2010022217A 2003-12-15 2010-02-03 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP5118711B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/734,641 US6897945B1 (en) 2003-12-15 2003-12-15 Lithographic apparatus and device manufacturing method
US10/734641 2003-12-15

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004361720A Division JP4477480B2 (ja) 2003-12-15 2004-12-14 リソグラフィ装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010109390A JP2010109390A (ja) 2010-05-13
JP2010109390A5 true JP2010109390A5 (enExample) 2010-09-16
JP5118711B2 JP5118711B2 (ja) 2013-01-16

Family

ID=34552774

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004361720A Expired - Fee Related JP4477480B2 (ja) 2003-12-15 2004-12-14 リソグラフィ装置およびデバイス製造方法
JP2010022217A Expired - Fee Related JP5118711B2 (ja) 2003-12-15 2010-02-03 リソグラフィ装置およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2004361720A Expired - Fee Related JP4477480B2 (ja) 2003-12-15 2004-12-14 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (2) US6897945B1 (enExample)
EP (1) EP1548502A1 (enExample)
JP (2) JP4477480B2 (enExample)
KR (1) KR100644419B1 (enExample)
CN (2) CN102645852A (enExample)
SG (1) SG112968A1 (enExample)
TW (1) TWI248562B (enExample)

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US7649611B2 (en) * 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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SG176059A1 (en) 2009-05-15 2011-12-29 Entegris Inc Electrostatic chuck with polymer protrusions
US8861170B2 (en) 2009-05-15 2014-10-14 Entegris, Inc. Electrostatic chuck with photo-patternable soft protrusion contact surface
WO2011149918A2 (en) 2010-05-28 2011-12-01 Entegris, Inc. High surface resistivity electrostatic chuck
JP5960154B2 (ja) * 2010-12-08 2016-08-02 エーエスエムエル ホールディング エヌ．ブイ． 静電クランプ、リソグラフィ装置、および静電クランプの製造方法
NL2009689A (en) * 2011-12-01 2013-06-05 Asml Netherlands Bv Support, lithographic apparatus and device manufacturing method.
NL2009858A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Substrate holder, lithographic apparatus, and device manufacturing method.
CN103576464B (zh) * 2012-07-20 2016-03-09 上海微电子装备有限公司 一种推顶机构及具有该推顶机构的光刻装置
JP2014086701A (ja) * 2012-10-26 2014-05-12 Canon Inc 保持装置、リソグラフィ装置及び物品の製造方法
NL2011592A (en) 2012-10-31 2014-05-06 Asml Netherlands Bv Compensation for patterning device deformation.
CN108780773B (zh) * 2016-02-10 2022-10-21 恩特格里斯公司 具有改善粒子性能的晶片接触表面突部轮廓
CN107272351A (zh) * 2017-07-28 2017-10-20 武汉华星光电技术有限公司 承载装置及具有该承载装置的曝光设备
JP7104531B2 (ja) * 2018-03-19 2022-07-21 キヤノン株式会社 基板保持装置および基板処理装置
EP3575873A1 (en) 2018-05-28 2019-12-04 ASML Netherlands B.V. Particle beam apparatus
EP3921701A1 (en) * 2019-02-08 2021-12-15 ASML Netherlands B.V. Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus
EP3832391A1 (en) * 2019-12-03 2021-06-09 ASML Netherlands B.V. Clamp assembly

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US6897945B1 (en) * 2003-12-15 2005-05-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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