JP2014017428A5 - - Google Patents

Download PDF

Info

Publication number
JP2014017428A5
JP2014017428A5 JP2012155204A JP2012155204A JP2014017428A5 JP 2014017428 A5 JP2014017428 A5 JP 2014017428A5 JP 2012155204 A JP2012155204 A JP 2012155204A JP 2012155204 A JP2012155204 A JP 2012155204A JP 2014017428 A5 JP2014017428 A5 JP 2014017428A5
Authority
JP
Japan
Prior art keywords
substrate
pressure
pressure chamber
polishing
holding surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012155204A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014017428A (ja
JP5856546B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012155204A priority Critical patent/JP5856546B2/ja
Priority claimed from JP2012155204A external-priority patent/JP5856546B2/ja
Priority to US13/932,062 priority patent/US9105516B2/en
Publication of JP2014017428A publication Critical patent/JP2014017428A/ja
Publication of JP2014017428A5 publication Critical patent/JP2014017428A5/ja
Application granted granted Critical
Publication of JP5856546B2 publication Critical patent/JP5856546B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012155204A 2012-07-03 2012-07-11 研磨装置および研磨方法 Active JP5856546B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012155204A JP5856546B2 (ja) 2012-07-11 2012-07-11 研磨装置および研磨方法
US13/932,062 US9105516B2 (en) 2012-07-03 2013-07-01 Polishing apparatus and polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012155204A JP5856546B2 (ja) 2012-07-11 2012-07-11 研磨装置および研磨方法

Publications (3)

Publication Number Publication Date
JP2014017428A JP2014017428A (ja) 2014-01-30
JP2014017428A5 true JP2014017428A5 (enExample) 2015-10-01
JP5856546B2 JP5856546B2 (ja) 2016-02-09

Family

ID=50111852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012155204A Active JP5856546B2 (ja) 2012-07-03 2012-07-11 研磨装置および研磨方法

Country Status (1)

Country Link
JP (1) JP5856546B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6190286B2 (ja) * 2014-02-14 2017-08-30 株式会社荏原製作所 基板保持装置および研磨装置
SG10202100910UA (en) 2015-08-18 2021-03-30 Ebara Corp Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control m
SG10201606197XA (en) 2015-08-18 2017-03-30 Ebara Corp Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus
JP6463303B2 (ja) * 2016-05-13 2019-01-30 株式会社荏原製作所 弾性膜、基板保持装置、基板研磨装置、基板保持装置における基板吸着判定方法および圧力制御方法
EP4079451A4 (en) * 2019-12-18 2024-01-03 Ebara Corporation SLIDE, SUBSTRATE TRANSPORT DEVICE AND SUBSTRATE TREATMENT DEVICE
JP6847286B2 (ja) * 2020-04-02 2021-03-24 株式会社荏原製作所 基板処理装置
US12138732B2 (en) 2020-12-14 2024-11-12 Applied Materials, Inc. Polishing system apparatus and methods for defect reduction at a substrate edge

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005123485A (ja) * 2003-10-17 2005-05-12 Ebara Corp 研磨装置
US7044832B2 (en) * 2003-11-17 2006-05-16 Applied Materials Load cup for chemical mechanical polishing
JP5155517B2 (ja) * 2005-04-21 2013-03-06 株式会社荏原製作所 ウエハ受渡装置及びポリッシング装置
JP5390807B2 (ja) * 2008-08-21 2014-01-15 株式会社荏原製作所 研磨方法および装置
JP5597033B2 (ja) * 2010-06-07 2014-10-01 株式会社荏原製作所 研磨装置および方法

Similar Documents

Publication Publication Date Title
JP2014017428A5 (enExample)
JP2007268654A5 (enExample)
JP2014053333A5 (enExample)
JP2015193070A5 (enExample)
PH12016501335A1 (en) Composite sheet for protective-film formation
EP2881801A3 (en) Image heating device
JP2015502893A5 (enExample)
JP2013222856A5 (enExample)
RU2014109345A (ru) Устройство нагрева изображения
EP2532478A3 (en) Method and appartus for conditioning a polishing pad
EP2525272A3 (en) Apparatus and method for supporting eraser function of digitizer pen in digitizer system
MY182612A (en) Coated compressive subpad for chemical mechanical polishing
JP2014061580A5 (enExample)
EP2722714A3 (en) Detection device, exposure apparatus and device manufacturing method using such an exposure apparatus
JP2011066342A5 (enExample)
WO2014037257A3 (de) Temperaturmessvorrichtung zur bestimmung der temperatur an der oberfläche einer rohrleitung
MX2012011551A (es) Aparato y metodo de limpieza de pantalla.
JP2013219248A5 (enExample)
JP2009208214A5 (enExample)
EP3296966A4 (en) Device for detecting foreign object attached on surface of sheet-like medium
JP2009302808A5 (enExample)
JP2010238765A5 (enExample)
JP2015136775A5 (enExample)
JP2015026688A5 (enExample)
GB201223508D0 (en) Apparatus for detecting the thickness of sheet material