JP2010080542A - Iii族窒化物半導体発光素子、およびその製造方法 - Google Patents
Iii族窒化物半導体発光素子、およびその製造方法 Download PDFInfo
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- JP2010080542A JP2010080542A JP2008244819A JP2008244819A JP2010080542A JP 2010080542 A JP2010080542 A JP 2010080542A JP 2008244819 A JP2008244819 A JP 2008244819A JP 2008244819 A JP2008244819 A JP 2008244819A JP 2010080542 A JP2010080542 A JP 2010080542A
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- electrode
- pad electrode
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- group iii
- iii nitride
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 55
- 150000004767 nitrides Chemical class 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims description 18
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 31
- 229910003437 indium oxide Inorganic materials 0.000 claims description 10
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000007669 thermal treatment Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 89
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 28
- 239000000758 substrate Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229910052684 Cerium Inorganic materials 0.000 description 5
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 4
- 229910002704 AlGaN Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- QBJCZLXULXFYCK-UHFFFAOYSA-N magnesium;cyclopenta-1,3-diene Chemical compound [Mg+2].C1C=CC=[C-]1.C1C=CC=[C-]1 QBJCZLXULXFYCK-UHFFFAOYSA-N 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
- H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
【解決手段】透明電極14上にNi/Auからなるpパッド電極15を、n型層11上に同じくNi/Auからなるn電極16を、同時に形成した。そして、570℃で熱処理を行った。これにより、pパッド電極とn電極の双方で良好なコンタクトを取ることができる。また、熱処理により透明電極14のpパッド電極15直下に位置する領域に、他の透明電極14の領域よりもp型層13とのコンタクト抵抗が高い領域17が形成され、活性層12の領域17下方に位置する領域12aが発光しないため、発光効率を向上させることができる。
【選択図】図1
Description
11:n型層
12:活性層
13:p型層
14、24:透明電極
15:pパッド電極
16:n電極
17、27:領域
18:保護膜
Claims (10)
- p型層上に酸化物からなる透明電極が形成され、前記透明電極上にpパッド電極が形成され、前記pパッド電極と同一面側にn電極が形成されたフェイスアップ型のIII 族窒化物半導体発光素子の製造方法において、
前記pパッド電極と前記n電極はNi/Auであり、
前記pパッド電極と前記n電極を同時に形成する、
ことを特徴とするIII 族窒化物半導体発光素子の製造方法。 - 前記pパッド電極と前記n電極を形成後、500〜650℃で熱処理を行うことにより、前記透明電極の前記pパッド電極直下に位置する領域に、前記p型層とのコンタクト抵抗が、他の前記透明電極の領域と前記p型層とのコンタクト抵抗よりも高い領域を形成することを特徴とする請求項1に記載のIII 族窒化物半導体発光素子の製造方法。
- 前記透明電極は、酸化インジウム系の材料からなることを特徴とする請求項1または請求項2に記載のIII 族窒化物半導体発光素子の製造方法。
- 前記透明電極は、ITOまたはICOからなることを特徴とする請求項3に記載のIII 族窒化物半導体発光素子の製造方法。
- p型層上に酸化物からなる透明電極が形成され、前記透明電極上にpパッド電極が形成され、前記pパッド電極と同一面側にn電極が形成されたフェイスアップ型のIII 族窒化物半導体発光素子において、
前記pパッド電極は、NiまたはTiを含む材料からなり、
熱処理によって、前記透明電極の前記pパッド電極直下に位置する領域に、前記p型層とのコンタクト抵抗が、他の前記透明電極の領域と前記p型層とのコンタクト抵抗よりも高い領域が形成されている、
ことを特徴とするIII 族窒化物半導体発光素子。 - 前記pパッド電極は、Ni/Auであることを特徴とする請求項5に記載のIII 族窒化物半導体発光素子。
- 前記n電極は、Ni/Auであることを特徴とする請求項6に記載のIII 族窒化物半導体発光素子。
- 前記透明電極は、酸化インジウム系の材料からなることを特徴とする請求項5ないし請求項7のいずれか1項に記載のIII 族窒化物半導体発光素子。
- 前記透明電極は、ITOまたはICOからなることを特徴とする請求項8に記載のIII 族窒化物半導体発光素子。
- 前記pパッド電極、前記n電極の一方または双方は、配線状の延伸電極を有することを特徴とする請求項5ないし請求項9のいずれか1項に記載のIII 族窒化物半導体発光素子。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008244819A JP5115425B2 (ja) | 2008-09-24 | 2008-09-24 | Iii族窒化物半導体発光素子 |
US12/585,630 US8323994B2 (en) | 2008-09-24 | 2009-09-21 | Group III nitride semiconductor light-emitting device and method for producing the same |
CN2009101756104A CN101714599B (zh) | 2008-09-24 | 2009-09-24 | 第ⅲ族氮化物半导体发光器件及其制造方法 |
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JP2008244819A JP5115425B2 (ja) | 2008-09-24 | 2008-09-24 | Iii族窒化物半導体発光素子 |
Publications (2)
Publication Number | Publication Date |
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JP2010080542A true JP2010080542A (ja) | 2010-04-08 |
JP5115425B2 JP5115425B2 (ja) | 2013-01-09 |
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JP2008244819A Active JP5115425B2 (ja) | 2008-09-24 | 2008-09-24 | Iii族窒化物半導体発光素子 |
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US (1) | US8323994B2 (ja) |
JP (1) | JP5115425B2 (ja) |
CN (1) | CN101714599B (ja) |
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Also Published As
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US8323994B2 (en) | 2012-12-04 |
US20100072508A1 (en) | 2010-03-25 |
CN101714599B (zh) | 2012-01-18 |
JP5115425B2 (ja) | 2013-01-09 |
CN101714599A (zh) | 2010-05-26 |
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