CN101009353B - 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 - Google Patents
具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 Download PDFInfo
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- CN101009353B CN101009353B CN2007100631013A CN200710063101A CN101009353B CN 101009353 B CN101009353 B CN 101009353B CN 2007100631013 A CN2007100631013 A CN 2007100631013A CN 200710063101 A CN200710063101 A CN 200710063101A CN 101009353 B CN101009353 B CN 101009353B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
- H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
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- Engineering & Computer Science (AREA)
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- Computer Hardware Design (AREA)
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Abstract
Description
Claims (9)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007100631013A CN101009353B (zh) | 2007-01-26 | 2007-01-26 | 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 |
PCT/CN2008/000178 WO2008092378A1 (en) | 2007-01-26 | 2008-01-24 | A light emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007100631013A CN101009353B (zh) | 2007-01-26 | 2007-01-26 | 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 |
Publications (2)
Publication Number | Publication Date |
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CN101009353A CN101009353A (zh) | 2007-08-01 |
CN101009353B true CN101009353B (zh) | 2010-07-21 |
Family
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Application Number | Title | Priority Date | Filing Date |
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CN2007100631013A Expired - Fee Related CN101009353B (zh) | 2007-01-26 | 2007-01-26 | 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 |
Country Status (2)
Country | Link |
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CN (1) | CN101009353B (zh) |
WO (1) | WO2008092378A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709204A (zh) * | 2012-05-30 | 2012-10-03 | 杭州士兰明芯科技有限公司 | 一种led芯片的键合方法 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101009353B (zh) * | 2007-01-26 | 2010-07-21 | 北京太时芯光科技有限公司 | 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 |
JP5115425B2 (ja) | 2008-09-24 | 2013-01-09 | 豊田合成株式会社 | Iii族窒化物半導体発光素子 |
CN102054912A (zh) * | 2009-11-04 | 2011-05-11 | 大连路美芯片科技有限公司 | 一种发光二极管及其制造方法 |
KR20120040448A (ko) * | 2010-10-19 | 2012-04-27 | 삼성엘이디 주식회사 | 수직형 발광 소자 |
TWI553903B (zh) | 2010-12-20 | 2016-10-11 | Lg伊諾特股份有限公司 | 發光元件及其製造方法 |
CN102097560B (zh) * | 2010-12-31 | 2012-11-14 | 厦门市三安光电科技有限公司 | 具有复合式双电流扩展层的氮化物发光二极管 |
CN103078026A (zh) * | 2012-10-11 | 2013-05-01 | 光达光电设备科技(嘉兴)有限公司 | 半导体发光元件及其制造方法 |
CN110265517B (zh) * | 2013-07-17 | 2024-03-29 | 晶元光电股份有限公司 | 发光元件 |
WO2015074353A1 (zh) * | 2013-11-25 | 2015-05-28 | 扬州中科半导体照明有限公司 | 一种半导体发光二极管芯片 |
CN104952993B (zh) * | 2014-03-24 | 2018-02-09 | 山东浪潮华光光电子股份有限公司 | 一种电流扩展层带有二维光学结构的反极性AlGaInP发光二极管 |
CN104269478A (zh) * | 2014-09-24 | 2015-01-07 | 杭州士兰明芯科技有限公司 | Led衬底结构及其制作方法 |
CN105206721B (zh) * | 2015-10-29 | 2018-01-19 | 天津三安光电有限公司 | 发光二极管 |
CN106057998A (zh) * | 2016-08-10 | 2016-10-26 | 山东浪潮华光光电子股份有限公司 | 一种具有电流阻挡层及电流扩展层的GaAs基发光二极管芯片及其制备方法 |
DE102017104719A1 (de) | 2017-03-07 | 2018-09-13 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterkörper und Halbleiterchip |
CN109326952B (zh) * | 2017-07-31 | 2020-07-07 | 山东华光光电子股份有限公司 | 一种高电流密度、高散热系数的半导体激光器制备方法 |
TW201924086A (zh) * | 2017-11-15 | 2019-06-16 | 南韓商Auk公司 | 改善反射率的光反射型紅外線發光二極體晶片及其製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH114020A (ja) * | 1997-04-15 | 1999-01-06 | Toshiba Corp | 半導体発光素子及びその製造方法、並びに半導体発光装置 |
JP2004200303A (ja) * | 2002-12-17 | 2004-07-15 | Sharp Corp | 発光ダイオード |
CN1758493A (zh) * | 2004-10-08 | 2006-04-12 | 晶元光电股份有限公司 | 具有微反射结构层的发光元件 |
KR100580751B1 (ko) * | 2004-12-23 | 2006-05-15 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
CN101009353B (zh) * | 2007-01-26 | 2010-07-21 | 北京太时芯光科技有限公司 | 具有电流输运增透窗口层和高反射图形转移衬底结构的发光二极管 |
-
2007
- 2007-01-26 CN CN2007100631013A patent/CN101009353B/zh not_active Expired - Fee Related
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2008
- 2008-01-24 WO PCT/CN2008/000178 patent/WO2008092378A1/zh active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102709204A (zh) * | 2012-05-30 | 2012-10-03 | 杭州士兰明芯科技有限公司 | 一种led芯片的键合方法 |
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Publication number | Publication date |
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WO2008092378A1 (en) | 2008-08-07 |
CN101009353A (zh) | 2007-08-01 |
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Owner name: BEIJING TAISHIXINGUANG SCIENCE CO., LTD. Free format text: FORMER OWNER: BEIJING POLYTECHNIC UNIV. Effective date: 20081024 |
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Effective date of registration: 20081024 Address after: Branch of Beijing economic and Technological Development Zone two Beijing street, No. 4 Building 2 layer 1-4 South Post encoding: 100176 Applicant after: Beijing TimesLED Technology Co.,Ltd. Address before: No. 100, Ping Tian Park, Beijing, Chaoyang District: 100022 Applicant before: Beijing University of Technology |
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Denomination of invention: LED with current-transfer enhanced window layer and the high reflection graph shift substrate structure Effective date of registration: 20140404 Granted publication date: 20100721 Pledgee: Zhongguancun Beijing technology financing Company limited by guarantee Pledgor: Beijing TimesLED Technology Co.,Ltd. Registration number: 2014990000234 |
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Date of cancellation: 20160705 Granted publication date: 20100721 Pledgee: Zhongguancun Beijing technology financing Company limited by guarantee Pledgor: Beijing TimesLED Technology Co.,Ltd. Registration number: 2014990000234 |
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