JP2009529579A5 - - Google Patents

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Publication number
JP2009529579A5
JP2009529579A5 JP2009500578A JP2009500578A JP2009529579A5 JP 2009529579 A5 JP2009529579 A5 JP 2009529579A5 JP 2009500578 A JP2009500578 A JP 2009500578A JP 2009500578 A JP2009500578 A JP 2009500578A JP 2009529579 A5 JP2009529579 A5 JP 2009529579A5
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strontium
precursor
bis
alkyl
precursor composition
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JP2009500578A
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JP2009529579A (ja
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Priority claimed from PCT/US2007/063825 external-priority patent/WO2007106788A2/en
Publication of JP2009529579A publication Critical patent/JP2009529579A/ja
Publication of JP2009529579A5 publication Critical patent/JP2009529579A5/ja
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JP2009500578A 2006-03-10 2007-03-12 チタネート、ランタネート及びタンタレート誘電体の膜の原子層堆積及び化学蒸着のための前駆体組成物 Pending JP2009529579A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US78129106P 2006-03-10 2006-03-10
US79129906P 2006-04-12 2006-04-12
US84486706P 2006-09-15 2006-09-15
US88472807P 2007-01-12 2007-01-12
PCT/US2007/063825 WO2007106788A2 (en) 2006-03-10 2007-03-12 Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films

Related Child Applications (1)

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JP2013003639A Division JP2013093606A (ja) 2006-03-10 2013-01-11 チタネート、ランタネート及びタンタレート誘電体の膜の原子層堆積及び化学蒸着のための前駆体組成物

Publications (2)

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JP2009529579A JP2009529579A (ja) 2009-08-20
JP2009529579A5 true JP2009529579A5 (enExample) 2012-06-21

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JP2009500578A Pending JP2009529579A (ja) 2006-03-10 2007-03-12 チタネート、ランタネート及びタンタレート誘電体の膜の原子層堆積及び化学蒸着のための前駆体組成物
JP2013003639A Withdrawn JP2013093606A (ja) 2006-03-10 2013-01-11 チタネート、ランタネート及びタンタレート誘電体の膜の原子層堆積及び化学蒸着のための前駆体組成物

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JP2013003639A Withdrawn JP2013093606A (ja) 2006-03-10 2013-01-11 チタネート、ランタネート及びタンタレート誘電体の膜の原子層堆積及び化学蒸着のための前駆体組成物

Country Status (6)

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US (4) US7638074B2 (enExample)
EP (1) EP1994555A4 (enExample)
JP (2) JP2009529579A (enExample)
KR (3) KR101488855B1 (enExample)
TW (1) TWI421366B (enExample)
WO (1) WO2007106788A2 (enExample)

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KR102618630B1 (ko) * 2019-10-10 2023-12-26 삼성에스디아이 주식회사 박막 증착용 조성물, 박막 증착용 조성물을 이용한 박막의 제조 방법, 박막 증착용 조성물로부터 제조된 박막, 및 박막을 포함하는 반도체 소자
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KR102639298B1 (ko) * 2020-10-30 2024-02-20 삼성에스디아이 주식회사 유기금속 화합물을 포함하는 박막 증착용 조성물, 박막 증착용 조성물을 이용한 박막의 제조 방법, 박막 증착용 조성물로부터 제조된 박막, 및 박막을 포함하는 반도체 소자
KR102741165B1 (ko) * 2020-11-20 2024-12-09 삼성에스디아이 주식회사 유기금속 화합물, 유기금속 화합물을 포함하는 박막 증착용 조성물, 박막 증착용 조성물을 이용한 박막의 제조 방법, 박막 증착용 조성물로부터 제조된 박막, 및 박막을 포함하는 반도체 소자
CN112961166B (zh) * 2021-03-07 2022-02-25 苏州大学 一种催化制备吡喃并[2,3-b]吲哚-2-酮化合物的方法
KR102588453B1 (ko) 2021-11-04 2023-10-12 한국화학연구원 신규한 스트론튬 유기금속화합물, 이의 제조방법 및 이를 이용하여 박막을 제조하는 방법
KR102846838B1 (ko) 2023-08-18 2025-08-18 한국화학연구원 신규한 유기금속화합물, 이의 제조방법 및 이를 이용하여 박막을 제조하는 방법

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