US20090215225A1 - Tellurium compounds useful for deposition of tellurium containing materials - Google Patents

Tellurium compounds useful for deposition of tellurium containing materials Download PDF

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Publication number
US20090215225A1
US20090215225A1 US12/392,009 US39200909A US2009215225A1 US 20090215225 A1 US20090215225 A1 US 20090215225A1 US 39200909 A US39200909 A US 39200909A US 2009215225 A1 US2009215225 A1 US 2009215225A1
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US
United States
Prior art keywords
tellurium
silyl
independently
alkyl
aryl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/392,009
Inventor
Matthias Stender
Chongying Xu
Tianniu Chen
William Hunks
Philip S.H. Chen
Jeffrey F. Roeder
Thomas H. Baum
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Advanced Technology Materials Inc
Original Assignee
Advanced Technology Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US3098008P priority Critical
Priority to US5018308P priority
Application filed by Advanced Technology Materials Inc filed Critical Advanced Technology Materials Inc
Priority to US12/392,009 priority patent/US20090215225A1/en
Assigned to ADVANCED TECHNOLOGY MATERIALS, INC. reassignment ADVANCED TECHNOLOGY MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ROEDER, JEFFREY F., BAUM, THOMAS H., STENDER, MATTHIAS, HUNKS, WILLIAM, CHEN, PHILIP S. H., CHEN, TIANNIU, XU, CHONGYING
Publication of US20090215225A1 publication Critical patent/US20090215225A1/en
Abandoned legal-status Critical Current

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