JP2009224354A - 薄膜トランジスタおよび表示装置 - Google Patents
薄膜トランジスタおよび表示装置 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims abstract description 22
- 239000010408 film Substances 0.000 claims abstract description 105
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 131
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- 238000004544 sputter deposition Methods 0.000 description 4
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
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- 238000005229 chemical vapour deposition Methods 0.000 description 1
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- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
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- 229910052737 gold Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
- AHLBNYSZXLDEJQ-FWEHEUNISA-N orlistat Chemical compound CCCCCCCCCCC[C@H](OC(=O)[C@H](CC(C)C)NC=O)C[C@@H]1OC(=O)[C@H]1CCCCCC AHLBNYSZXLDEJQ-FWEHEUNISA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
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- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
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- 239000007790 solid phase Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
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- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
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- H—ELECTRICITY
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
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Abstract
【解決手段】TFT12のゲート絶縁膜52を、窒化シリコン(SiN)よりなる第1絶縁膜52Aと、420nm以下の光を吸収する材料よりなる第1光吸収層52Bと、二酸化シリコン(SiO2 )よりなる第2絶縁膜53Bとの積層構造とする。第1光吸収層52Bと活性層53との距離を極めて近づけ、活性層53への光の入射を確実に抑制する。第1光吸収層52Bの構成材料は例えばアモルファスシリコン、厚みは10nm以上100nm以下であることが好ましい。
【選択図】図3
Description
(A)ゲート電極
(B)活性層
(C)ゲート電極および活性層の間に設けられ、ゲート電極に接して設けられた第1絶縁膜と、第1絶縁膜に接して設けられ、420nm以下の光を吸収する材料よりなる第1光吸収層と、第1光吸収層および活性層の間に設けられた第2絶縁膜とを有するゲート絶縁膜
図1は、本発明の第1の実施の形態に係る液晶表示装置の構成を表したものである。この液晶表示装置は、液晶テレビ等に用いられるものであり、例えば、液晶表示パネル1と、バックライト部2と、画像処理部3と、フレームメモリ4と、ゲートドライバ5と、データドライバ6と、タイミング制御部7と、バックライト駆動部8とを備えている。
図10は、本発明の第2の実施の形態に係るTFTの構成を表したものである。このTFTは、層間絶縁膜56の上に、第2光吸収層58を設けたことを除いては、第1の実施の形態で説明したTFT12と同様である。
図12は、本発明を有機発光表示装置(有機EL表示装置)に適用した場合の構成の一例を表したものである。本実施の形態は、表示素子を有機発光素子により構成したことを除いては、上記第1の実施の形態と全く同一であり、その作用および効果も同一である。よって、対応する構成要素には同一の符号を付して説明する。
以下、上記実施の形態で説明した表示装置の適用例について説明する。上記実施の形態の表示装置は、テレビジョン装置,デジタルカメラ,ノート型パーソナルコンピュータ、携帯電話等の携帯端末装置あるいはビデオカメラなど、外部から入力された映像信号あるいは内部で生成した映像信号を、画像あるいは映像として表示するあらゆる分野の電子機器の表示装置に適用することが可能である。
上記実施の形態の表示装置は、例えば、図15に示したようなモジュールとして、後述する適用例1〜5などの種々の電子機器に組み込まれる。このモジュールは、例えば、基板11の一辺に、封止用基板81および接着層80から露出した領域210を設け、この露出した領域210に、データドライバ6およびゲートドライバ5の配線を延長して外部接続端子(図示せず)を形成したものである。外部接続端子には、信号の入出力のためのフレキシブルプリント配線基板(FPC;Flexible Printed Circuit)220が設けられていてもよい。
図16は、上記実施の形態の表示装置が適用されるテレビジョン装置の外観を表したものである。このテレビジョン装置は、例えば、フロントパネル310およびフィルターガラス320を含む映像表示画面部300を有しており、この映像表示画面部300は、上記各実施の形態に係る表示装置により構成されている。
図17は、上記実施の形態の表示装置が適用されるデジタルカメラの外観を表したものである。このデジタルカメラは、例えば、フラッシュ用の発光部410、表示部420、メニュースイッチ430およびシャッターボタン440を有しており、その表示部420は、上記各実施の形態に係る表示装置により構成されている。
図18は、上記実施の形態の表示装置が適用されるノート型パーソナルコンピュータの外観を表したものである。このノート型パーソナルコンピュータは、例えば、本体510,文字等の入力操作のためのキーボード520および画像を表示する表示部530を有しており、その表示部530は、上記各実施の形態に係る表示装置により構成されている。
図19は、上記実施の形態の表示装置が適用されるビデオカメラの外観を表したものである。このビデオカメラは、例えば、本体部610,この本体部610の前方側面に設けられた被写体撮影用のレンズ620,撮影時のスタート/ストップスイッチ630および表示部640を有しており、その表示部640は、上記各実施の形態に係る表示装置により構成されている。
図20は、上記実施の形態の表示装置が適用される携帯電話機の外観を表したものである。この携帯電話機は、例えば、上側筐体710と下側筐体720とを連結部(ヒンジ部)730で連結したものであり、ディスプレイ740,サブディスプレイ750,ピクチャーライト760およびカメラ770を有している。そのディスプレイ740またはサブディスプレイ750は、上記各実施の形態に係る表示装置により構成されている。
Claims (6)
- ゲート電極と、
活性層と、
前記ゲート電極および前記活性層の間に設けられ、前記ゲート電極に接して設けられた第1絶縁膜と、前記第1絶縁膜に接して設けられ、420nm以下の光を吸収する材料よりなる第1光吸収層と、前記第1光吸収層および前記活性層の間に設けられた第2絶縁膜とを有するゲート絶縁膜と
を備えた薄膜トランジスタ。 - 前記第1絶縁膜および前記第2絶縁膜は、酸化シリコンおよび窒化シリコンの少なくとも一方により構成され、
前記第1光吸収層は、アモルファスシリコンにより構成されている
請求項1記載の薄膜トランジスタ。 - 前記第1光吸収層の厚みは、10nm以上100nm以下である
請求項2記載の薄膜トランジスタ。 - 前記ゲート電極,前記ゲート絶縁膜および前記活性層を覆う層間絶縁膜と、
前記層間絶縁膜に接して形成された第2光吸収層と
を備えた請求項3記載の薄膜トランジスタ。 - 前記活性層は酸化物半導体により構成されている
請求項1ないし4のいずれか1項に記載の薄膜トランジスタ。 - 基板に、薄膜トランジスタと、表示素子とを備えた表示装置であって、
前記薄膜トランジスタは、
ゲート電極と、
活性層と、
前記ゲート電極および前記活性層の間に設けられ、前記ゲート電極に接して設けられた第1絶縁膜と、前記第1絶縁膜に接して設けられ、420nm以下の光を吸収する材料よりなる第1光吸収層と、前記第1光吸収層および前記活性層の間に設けられた第2絶縁膜とを有するゲート絶縁膜と
を備えた表示装置。
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US13/400,845 US8618545B2 (en) | 2008-03-13 | 2012-02-21 | Thin film transistor and display |
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Also Published As
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TW200952179A (en) | 2009-12-16 |
US20090230390A1 (en) | 2009-09-17 |
US8134154B2 (en) | 2012-03-13 |
US8618545B2 (en) | 2013-12-31 |
KR20090098679A (ko) | 2009-09-17 |
CN101533857A (zh) | 2009-09-16 |
JP4626659B2 (ja) | 2011-02-09 |
TWI393262B (zh) | 2013-04-11 |
CN101533857B (zh) | 2013-07-24 |
US20120146039A1 (en) | 2012-06-14 |
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