JP2009013417A5 - - Google Patents

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Publication number
JP2009013417A5
JP2009013417A5 JP2008203642A JP2008203642A JP2009013417A5 JP 2009013417 A5 JP2009013417 A5 JP 2009013417A5 JP 2008203642 A JP2008203642 A JP 2008203642A JP 2008203642 A JP2008203642 A JP 2008203642A JP 2009013417 A5 JP2009013417 A5 JP 2009013417A5
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JP
Japan
Prior art keywords
cleaning solution
acid
ascorbic acid
solution according
corrosion inhibitor
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JP2008203642A
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Japanese (ja)
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JP5097640B2 (ja
JP2009013417A (ja
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Priority claimed from US09/781,859 external-priority patent/US6723691B2/en
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Publication of JP2009013417A5 publication Critical patent/JP2009013417A5/ja
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Publication of JP5097640B2 publication Critical patent/JP5097640B2/ja
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JP2008203642A 2001-02-12 2008-08-06 化学機械平坦化（ｃｍｐ）後の洗浄組成物 Expired - Lifetime JP5097640B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/781,859 2001-02-12
US09/781,859 US6723691B2 (en) 1999-11-16 2001-02-12 Post chemical-mechanical planarization (CMP) cleaning composition

Related Parent Applications (1)

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JP2002564755A Division JP2004518819A (ja) 2001-02-12 2002-02-06 化学機械平坦化（ｃｍｐ）後の洗浄組成物

Publications (3)

Publication Number Publication Date
JP2009013417A JP2009013417A (ja) 2009-01-22
JP2009013417A5 true JP2009013417A5 (https=) 2009-11-12
JP5097640B2 JP5097640B2 (ja) 2012-12-12

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JP2002564755A Withdrawn JP2004518819A (ja) 2001-02-12 2002-02-06 化学機械平坦化（ｃｍｐ）後の洗浄組成物
JP2008203642A Expired - Lifetime JP5097640B2 (ja) 2001-02-12 2008-08-06 化学機械平坦化（ｃｍｐ）後の洗浄組成物

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JP2002564755A Withdrawn JP2004518819A (ja) 2001-02-12 2002-02-06 化学機械平坦化（ｃｍｐ）後の洗浄組成物

Country Status (7)

Country Link
US (1) US6723691B2 (https=)
EP (2) EP1845555B8 (https=)
JP (2) JP2004518819A (https=)
AT (1) ATE373873T1 (https=)
DE (1) DE60222532T2 (https=)
TW (1) TWI299885B (https=)
WO (1) WO2002065538A2 (https=)

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