JP2008537704A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008537704A5 JP2008537704A5 JP2008505303A JP2008505303A JP2008537704A5 JP 2008537704 A5 JP2008537704 A5 JP 2008537704A5 JP 2008505303 A JP2008505303 A JP 2008505303A JP 2008505303 A JP2008505303 A JP 2008505303A JP 2008537704 A5 JP2008537704 A5 JP 2008537704A5
- Authority
- JP
- Japan
- Prior art keywords
- slurry composition
- average molecular
- molecular weight
- weight average
- pyrrolidone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 14
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 14
- 239000002002 slurry Substances 0.000 claims description 13
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 11
- 238000005498 polishing Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- -1 pyrrolidone compound Chemical class 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 3
- 239000008367 deionised water Substances 0.000 claims 1
- 229910021641 deionized water Inorganic materials 0.000 claims 1
- 229920000620 organic polymer Polymers 0.000 claims 1
- 150000004040 pyrrolidinones Chemical class 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/102,555 | 2005-04-08 | ||
| US11/102,555 US7294044B2 (en) | 2005-04-08 | 2005-04-08 | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| PCT/US2006/006306 WO2006110224A2 (en) | 2005-04-08 | 2006-02-22 | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008537704A JP2008537704A (ja) | 2008-09-25 |
| JP2008537704A5 true JP2008537704A5 (enExample) | 2012-06-28 |
| JP5193852B2 JP5193852B2 (ja) | 2013-05-08 |
Family
ID=37083726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008505303A Expired - Fee Related JP5193852B2 (ja) | 2005-04-08 | 2006-02-22 | 有機高分子眼科基材のスラリー組成物及び研磨方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7294044B2 (enExample) |
| EP (1) | EP1868769B1 (enExample) |
| JP (1) | JP5193852B2 (enExample) |
| CN (1) | CN101541910B (enExample) |
| AT (1) | ATE527328T1 (enExample) |
| TW (1) | TWI391350B (enExample) |
| WO (1) | WO2006110224A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7467988B2 (en) * | 2005-04-08 | 2008-12-23 | Ferro Corporation | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| KR101564673B1 (ko) * | 2008-02-01 | 2015-10-30 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 및 이를 이용한 연마 방법 |
| JP5539321B2 (ja) * | 2008-04-24 | 2014-07-02 | ピーピーティー リサーチ，インク． | 安定な水性スラリー懸濁物 |
| US20100330884A1 (en) * | 2009-06-29 | 2010-12-30 | Ferro Corporation | Diatomaceous Earth-Containing Slurry Composition And Method For Polishing Organic Polymer-Based Ophthalmic Substrates Using The Same |
| US8449636B2 (en) * | 2010-08-09 | 2013-05-28 | Ferro Corporation | Easy rinsing polishing composition for polymer-based surfaces |
| CN103732538B (zh) | 2011-03-03 | 2016-08-31 | 维西斯技术基金会 | 金属氧化物和金属硫属化物以及混合金属氧化物与硫属化物的热力学溶液 |
| US8821215B2 (en) * | 2012-09-07 | 2014-09-02 | Cabot Microelectronics Corporation | Polypyrrolidone polishing composition and method |
| US9633831B2 (en) | 2013-08-26 | 2017-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same |
| CN107735471B (zh) * | 2015-07-10 | 2021-02-12 | 费罗公司 | 用于抛光有机聚合物基眼用基材的浆液组合物和添加剂以及方法 |
| KR102463863B1 (ko) * | 2015-07-20 | 2022-11-04 | 삼성전자주식회사 | 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법 |
| JP6758984B2 (ja) * | 2016-07-29 | 2020-09-23 | キヤノン株式会社 | インクジェット記録装置及びクリーニング方法 |
| KR102226055B1 (ko) | 2016-08-26 | 2021-03-10 | 페로 코포레이션 | 슬러리 조성물 및 선택적인 실리카 연마 방법 |
| US10037889B1 (en) | 2017-03-29 | 2018-07-31 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films |
| CN107299385A (zh) * | 2017-05-18 | 2017-10-27 | 当涂县宏宇金属炉料有限责任公司 | 一种改善不锈钢表面特性的电化学处理方法 |
| CN109015204B (zh) * | 2018-08-29 | 2020-11-27 | 包头市利晨科技有限公司 | 一种适用于cr39树脂镜片的抛光方法 |
| JP7413277B2 (ja) * | 2018-12-14 | 2024-01-15 | 株式会社フジミインコーポレーテッド | 研磨用組成物及び合成樹脂研磨方法 |
| CN113755842B (zh) * | 2021-10-18 | 2024-04-02 | 德米特（苏州）电子环保材料有限公司 | 一种金属抛光液及其制备方法和应用 |
| JP2024060831A (ja) | 2022-10-20 | 2024-05-07 | 山口精研工業株式会社 | プラスチックレンズ用研磨剤組成物 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4127697A (en) * | 1975-05-19 | 1978-11-28 | American Optical Corporation | Abrasion-resistant lenses and process of making |
| US4135792A (en) * | 1976-02-20 | 1979-01-23 | American Optical Corporation | All plastic spectacles |
| US4108827A (en) * | 1976-12-13 | 1978-08-22 | American Optical Corporation | Colorless allyl diglycol carbonate |
| JPS5489389A (en) * | 1977-12-27 | 1979-07-16 | Fujimi Kenmazai Kougiyou Kk | Composition for polishing of moldings in synthetic resin |
| FR2414071A1 (fr) * | 1978-01-05 | 1979-08-03 | Essilor Int | Materiau de polissage, notamment pour lentille ophtalmique en matiere organique |
| US4443588A (en) * | 1981-02-19 | 1984-04-17 | Toray Industries, Inc. | Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom |
| US4376751A (en) * | 1981-05-29 | 1983-03-15 | The United States Of America As Represented By The Department Of Energy | Production of super-smooth articles |
| US4859719A (en) * | 1983-09-08 | 1989-08-22 | Minnesota Mining And Manufacturing Company | Polymer blends with high water absorption |
| JPS61182763A (ja) * | 1985-02-06 | 1986-08-15 | Sanyo Chem Ind Ltd | 研磨加工液 |
| JPS6243482A (ja) * | 1985-08-21 | 1987-02-25 | Sanyo Chem Ind Ltd | 研磨加工液 |
| FR2604443A1 (fr) * | 1986-09-26 | 1988-04-01 | Rhone Poulenc Chimie | Composition de polissage a base de cerium destinee au polissage des verres organiques |
| JPH0818241B2 (ja) * | 1987-03-19 | 1996-02-28 | キヤノン株式会社 | 研磨工具の製造方法 |
| JPH0899268A (ja) * | 1994-10-03 | 1996-04-16 | Olympus Optical Co Ltd | 研磨用工具とその製造方法 |
| US5989301A (en) * | 1998-02-18 | 1999-11-23 | Saint-Gobain Industrial Ceramics, Inc. | Optical polishing formulation |
| JP2000256654A (ja) * | 1999-03-04 | 2000-09-19 | Hitachi Chem Co Ltd | Ｃｍｐ研磨剤及び基板の研磨方法 |
| DE60031857T2 (de) * | 1999-06-18 | 2007-09-13 | Hitachi Chemical Co., Ltd. | Verwendung eines cmp schleifmittels |
| WO2002067309A1 (en) * | 2001-02-20 | 2002-08-29 | Hitachi Chemical Co., Ltd. | Polishing compound and method for polishing substrate |
| JP2002305198A (ja) * | 2001-04-06 | 2002-10-18 | Toshiba Corp | 電子デバイスの製造方法 |
| JP4231632B2 (ja) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | 研磨液組成物 |
| US6638326B2 (en) * | 2001-09-25 | 2003-10-28 | Ekc Technology, Inc. | Compositions for chemical mechanical planarization of tantalum and tantalum nitride |
| KR100939472B1 (ko) * | 2001-10-26 | 2010-01-29 | 아사히 가라스 가부시키가이샤 | 연마제, 그 제조방법 및 연마방법 |
| US6821897B2 (en) * | 2001-12-05 | 2004-11-23 | Cabot Microelectronics Corporation | Method for copper CMP using polymeric complexing agents |
| JP4387708B2 (ja) * | 2002-07-04 | 2009-12-24 | Ｈｏｙａ株式会社 | プラスチック製眼鏡レンズの研磨方法および製造方法 |
| TWI256971B (en) * | 2002-08-09 | 2006-06-21 | Hitachi Chemical Co Ltd | CMP abrasive and method for polishing substrate |
| US7300601B2 (en) * | 2002-12-10 | 2007-11-27 | Advanced Technology Materials, Inc. | Passivative chemical mechanical polishing composition for copper film planarization |
| US6916742B2 (en) * | 2003-02-27 | 2005-07-12 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Modular barrier removal polishing slurry |
| JP2004311967A (ja) * | 2003-03-27 | 2004-11-04 | Nippon Shokubai Co Ltd | Ｃｍｐ研磨剤用ポリマー及び組成物 |
| US6802878B1 (en) * | 2003-04-17 | 2004-10-12 | 3M Innovative Properties Company | Abrasive particles, abrasive articles, and methods of making and using the same |
| JP2004331852A (ja) * | 2003-05-09 | 2004-11-25 | Tama Kagaku Kogyo Kk | 分散安定性に優れた研磨剤スラリー及び基板の製造方法 |
| JP4138610B2 (ja) * | 2003-08-29 | 2008-08-27 | 有限会社コスモテック | 研磨治具用曲率設定装置および研磨治具曲率設定方法 |
| US7344988B2 (en) * | 2003-10-27 | 2008-03-18 | Dupont Air Products Nanomaterials Llc | Alumina abrasive for chemical mechanical polishing |
| US20060216935A1 (en) * | 2005-03-28 | 2006-09-28 | Ferro Corporation | Composition for oxide CMP in CMOS device fabrication |
-
2005
- 2005-04-08 US US11/102,555 patent/US7294044B2/en not_active Expired - Lifetime
-
2006
- 2006-02-22 WO PCT/US2006/006306 patent/WO2006110224A2/en not_active Ceased
- 2006-02-22 CN CN2006800109633A patent/CN101541910B/zh not_active Expired - Fee Related
- 2006-02-22 AT AT06735812T patent/ATE527328T1/de not_active IP Right Cessation
- 2006-02-22 EP EP06735812A patent/EP1868769B1/en not_active Expired - Lifetime
- 2006-02-22 JP JP2008505303A patent/JP5193852B2/ja not_active Expired - Fee Related
- 2006-04-06 TW TW095112122A patent/TWI391350B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008537704A5 (enExample) | ||
| JP6762390B2 (ja) | 研磨用組成物、研磨方法および基板の製造方法 | |
| JP5592276B2 (ja) | 水溶性酸化剤を用いた炭化ケイ素の研磨方法 | |
| JP5385141B2 (ja) | 水に可溶性酸化剤を使用する炭化ケイ素の研磨方法 | |
| CN101553550B (zh) | 用于抛光镶嵌结构中的铝/铜及钛的组合物 | |
| JP2011530166A5 (enExample) | ||
| WO2012172983A1 (ja) | 研磨用組成物 | |
| JP2006245598A5 (enExample) | ||
| JP2009510797A5 (enExample) | ||
| RU2006104117A (ru) | Абразивные частицы для механической полировки | |
| TWI596202B (zh) | 用於鎳-磷記憶碟之拋光組合物 | |
| GB2412917A (en) | Polishing composition | |
| JP5491530B2 (ja) | ニッケル−リンメモリーディスク用の研磨組成物 | |
| CN102089865A (zh) | 抛光镍-磷的方法 | |
| CN107922786B (zh) | 浆料组合物和使用方法 | |
| JP2012516911A5 (enExample) | ||
| JP5193852B2 (ja) | 有機高分子眼科基材のスラリー組成物及び研磨方法 | |
| JP6407503B2 (ja) | 研磨用組成物 | |
| KR20180101331A (ko) | 연마용 조성물 및 실리콘 기판의 연마 방법 | |
| US20050072054A1 (en) | Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces | |
| JP2006156825A5 (enExample) | ||
| JP2009509784A (ja) | 研磨スラリー及び当該研磨スラリーを利用する方法 | |
| JP2010228009A (ja) | 研磨用パッド及び研磨方法 | |
| JP4784614B2 (ja) | 化学機械研磨用水系分散体 | |
| Tian et al. | Polymer coated γ-aminopropyltriethoxysilane-modified α-alumina non-spherical nanocomposite abrasives and their chemical mechanical polishing behavior on glass-ceramic substrate |