JP2008537704A5 - - Google Patents
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- Publication number
- JP2008537704A5 JP2008537704A5 JP2008505303A JP2008505303A JP2008537704A5 JP 2008537704 A5 JP2008537704 A5 JP 2008537704A5 JP 2008505303 A JP2008505303 A JP 2008505303A JP 2008505303 A JP2008505303 A JP 2008505303A JP 2008537704 A5 JP2008537704 A5 JP 2008537704A5
- Authority
- JP
- Japan
- Prior art keywords
- slurry composition
- average molecular
- molecular weight
- weight average
- pyrrolidone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 14
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 14
- 239000002002 slurry Substances 0.000 claims description 13
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 11
- 238000005498 polishing Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- -1 pyrrolidone compound Chemical class 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 3
- 239000008367 deionised water Substances 0.000 claims 1
- 229910021641 deionized water Inorganic materials 0.000 claims 1
- 229920000620 organic polymer Polymers 0.000 claims 1
- 150000004040 pyrrolidinones Chemical class 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910001593 boehmite Inorganic materials 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/102,555 US7294044B2 (en) | 2005-04-08 | 2005-04-08 | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| US11/102,555 | 2005-04-08 | ||
| PCT/US2006/006306 WO2006110224A2 (en) | 2005-04-08 | 2006-02-22 | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008537704A JP2008537704A (ja) | 2008-09-25 |
| JP2008537704A5 true JP2008537704A5 (enExample) | 2012-06-28 |
| JP5193852B2 JP5193852B2 (ja) | 2013-05-08 |
Family
ID=37083726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008505303A Expired - Fee Related JP5193852B2 (ja) | 2005-04-08 | 2006-02-22 | 有機高分子眼科基材のスラリー組成物及び研磨方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7294044B2 (enExample) |
| EP (1) | EP1868769B1 (enExample) |
| JP (1) | JP5193852B2 (enExample) |
| CN (1) | CN101541910B (enExample) |
| AT (1) | ATE527328T1 (enExample) |
| TW (1) | TWI391350B (enExample) |
| WO (1) | WO2006110224A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7467988B2 (en) * | 2005-04-08 | 2008-12-23 | Ferro Corporation | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| SG10201605686XA (en) * | 2008-02-01 | 2016-08-30 | Fujimi Inc | Polishing Composition And Polishing Method Using The Same |
| KR20110013417A (ko) * | 2008-04-24 | 2011-02-09 | 피피티 리서치 , 인코포레이티드 | 안정한 수성 슬러리 현탁액 |
| US20100330884A1 (en) * | 2009-06-29 | 2010-12-30 | Ferro Corporation | Diatomaceous Earth-Containing Slurry Composition And Method For Polishing Organic Polymer-Based Ophthalmic Substrates Using The Same |
| US8449636B2 (en) * | 2010-08-09 | 2013-05-28 | Ferro Corporation | Easy rinsing polishing composition for polymer-based surfaces |
| WO2012119154A2 (en) * | 2011-03-03 | 2012-09-07 | Wisys Technology Foundation | Thermodynamic solutions of metal oxides and metal chalcogenides and mixed metal oxides and chalcogenides |
| US8821215B2 (en) * | 2012-09-07 | 2014-09-02 | Cabot Microelectronics Corporation | Polypyrrolidone polishing composition and method |
| US9633831B2 (en) | 2013-08-26 | 2017-04-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same |
| WO2017011115A1 (en) | 2015-07-10 | 2017-01-19 | Ferro Corporation | Slurry composition and additives and method for polishing organic polymer-based ophthalmic substrates |
| KR102463863B1 (ko) * | 2015-07-20 | 2022-11-04 | 삼성전자주식회사 | 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법 |
| JP6758984B2 (ja) * | 2016-07-29 | 2020-09-23 | キヤノン株式会社 | インクジェット記録装置及びクリーニング方法 |
| WO2018038885A1 (en) | 2016-08-26 | 2018-03-01 | Ferro Corporation | Slurry composition and method of selective silica polishing |
| US10037889B1 (en) | 2017-03-29 | 2018-07-31 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films |
| CN107299385A (zh) * | 2017-05-18 | 2017-10-27 | 当涂县宏宇金属炉料有限责任公司 | 一种改善不锈钢表面特性的电化学处理方法 |
| CN109015204B (zh) * | 2018-08-29 | 2020-11-27 | 包头市利晨科技有限公司 | 一种适用于cr39树脂镜片的抛光方法 |
| KR102837555B1 (ko) | 2018-12-14 | 2025-07-24 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 및 합성 수지 연마 방법 |
| CN113755842B (zh) * | 2021-10-18 | 2024-04-02 | 德米特（苏州）电子环保材料有限公司 | 一种金属抛光液及其制备方法和应用 |
| JP2024060831A (ja) | 2022-10-20 | 2024-05-07 | 山口精研工業株式会社 | プラスチックレンズ用研磨剤組成物 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4127697A (en) * | 1975-05-19 | 1978-11-28 | American Optical Corporation | Abrasion-resistant lenses and process of making |
| US4135792A (en) * | 1976-02-20 | 1979-01-23 | American Optical Corporation | All plastic spectacles |
| US4108827A (en) * | 1976-12-13 | 1978-08-22 | American Optical Corporation | Colorless allyl diglycol carbonate |
| JPS5489389A (en) | 1977-12-27 | 1979-07-16 | Fujimi Kenmazai Kougiyou Kk | Composition for polishing of moldings in synthetic resin |
| FR2414071A1 (fr) | 1978-01-05 | 1979-08-03 | Essilor Int | Materiau de polissage, notamment pour lentille ophtalmique en matiere organique |
| US4443588A (en) * | 1981-02-19 | 1984-04-17 | Toray Industries, Inc. | Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom |
| US4376751A (en) | 1981-05-29 | 1983-03-15 | The United States Of America As Represented By The Department Of Energy | Production of super-smooth articles |
| US4859719A (en) * | 1983-09-08 | 1989-08-22 | Minnesota Mining And Manufacturing Company | Polymer blends with high water absorption |
| JPS61182763A (ja) * | 1985-02-06 | 1986-08-15 | Sanyo Chem Ind Ltd | 研磨加工液 |
| JPS6243482A (ja) * | 1985-08-21 | 1987-02-25 | Sanyo Chem Ind Ltd | 研磨加工液 |
| FR2604443A1 (fr) * | 1986-09-26 | 1988-04-01 | Rhone Poulenc Chimie | Composition de polissage a base de cerium destinee au polissage des verres organiques |
| JPH0818241B2 (ja) * | 1987-03-19 | 1996-02-28 | キヤノン株式会社 | 研磨工具の製造方法 |
| JPH0899268A (ja) * | 1994-10-03 | 1996-04-16 | Olympus Optical Co Ltd | 研磨用工具とその製造方法 |
| US5989301A (en) * | 1998-02-18 | 1999-11-23 | Saint-Gobain Industrial Ceramics, Inc. | Optical polishing formulation |
| JP2000256654A (ja) * | 1999-03-04 | 2000-09-19 | Hitachi Chem Co Ltd | Ｃｍｐ研磨剤及び基板の研磨方法 |
| JP4729834B2 (ja) * | 1999-06-18 | 2011-07-20 | 日立化成工業株式会社 | Ｃｍｐ研磨剤、これを用いた基板の研磨方法及び半導体装置の製造方法並びにｃｍｐ研磨剤用添加剤 |
| EP1369906B1 (en) | 2001-02-20 | 2012-06-27 | Hitachi Chemical Company, Ltd. | Polishing compound and method for polishing substrate |
| JP2002305198A (ja) * | 2001-04-06 | 2002-10-18 | Toshiba Corp | 電子デバイスの製造方法 |
| JP4231632B2 (ja) | 2001-04-27 | 2009-03-04 | 花王株式会社 | 研磨液組成物 |
| US6638326B2 (en) * | 2001-09-25 | 2003-10-28 | Ekc Technology, Inc. | Compositions for chemical mechanical planarization of tantalum and tantalum nitride |
| WO2003036705A1 (en) * | 2001-10-26 | 2003-05-01 | Asahi Glass Company, Limited | Polishing compound, method for production thereof and polishing method |
| US6821897B2 (en) * | 2001-12-05 | 2004-11-23 | Cabot Microelectronics Corporation | Method for copper CMP using polymeric complexing agents |
| JP4387708B2 (ja) * | 2002-07-04 | 2009-12-24 | Ｈｏｙａ株式会社 | プラスチック製眼鏡レンズの研磨方法および製造方法 |
| TWI256971B (en) * | 2002-08-09 | 2006-06-21 | Hitachi Chemical Co Ltd | CMP abrasive and method for polishing substrate |
| US7300601B2 (en) * | 2002-12-10 | 2007-11-27 | Advanced Technology Materials, Inc. | Passivative chemical mechanical polishing composition for copper film planarization |
| US6916742B2 (en) * | 2003-02-27 | 2005-07-12 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Modular barrier removal polishing slurry |
| JP2004311967A (ja) * | 2003-03-27 | 2004-11-04 | Nippon Shokubai Co Ltd | Ｃｍｐ研磨剤用ポリマー及び組成物 |
| US6802878B1 (en) * | 2003-04-17 | 2004-10-12 | 3M Innovative Properties Company | Abrasive particles, abrasive articles, and methods of making and using the same |
| JP2004331852A (ja) | 2003-05-09 | 2004-11-25 | Tama Kagaku Kogyo Kk | 分散安定性に優れた研磨剤スラリー及び基板の製造方法 |
| JP4138610B2 (ja) * | 2003-08-29 | 2008-08-27 | 有限会社コスモテック | 研磨治具用曲率設定装置および研磨治具曲率設定方法 |
| US7344988B2 (en) * | 2003-10-27 | 2008-03-18 | Dupont Air Products Nanomaterials Llc | Alumina abrasive for chemical mechanical polishing |
| US20060216935A1 (en) * | 2005-03-28 | 2006-09-28 | Ferro Corporation | Composition for oxide CMP in CMOS device fabrication |
-
2005
- 2005-04-08 US US11/102,555 patent/US7294044B2/en not_active Expired - Lifetime
-
2006
- 2006-02-22 EP EP06735812A patent/EP1868769B1/en not_active Not-in-force
- 2006-02-22 WO PCT/US2006/006306 patent/WO2006110224A2/en not_active Ceased
- 2006-02-22 AT AT06735812T patent/ATE527328T1/de not_active IP Right Cessation
- 2006-02-22 JP JP2008505303A patent/JP5193852B2/ja not_active Expired - Fee Related
- 2006-02-22 CN CN2006800109633A patent/CN101541910B/zh not_active Expired - Fee Related
- 2006-04-06 TW TW095112122A patent/TWI391350B/zh not_active IP Right Cessation
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