JP5193852B2 - 有機高分子眼科基材のスラリー組成物及び研磨方法 - Google Patents

有機高分子眼科基材のスラリー組成物及び研磨方法 Download PDF

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Publication number
JP5193852B2
JP5193852B2 JP2008505303A JP2008505303A JP5193852B2 JP 5193852 B2 JP5193852 B2 JP 5193852B2 JP 2008505303 A JP2008505303 A JP 2008505303A JP 2008505303 A JP2008505303 A JP 2008505303A JP 5193852 B2 JP5193852 B2 JP 5193852B2
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Prior art keywords
pyrrolidone
slurry composition
slurry
polishing
organic polymer
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JP2008505303A
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English (en)
Japanese (ja)
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JP2008537704A (ja
JP2008537704A5 (enExample
Inventor
スティーブン，エー． フェランティ
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フエロ コーポレーション
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Eyeglasses (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2008505303A 2005-04-08 2006-02-22 有機高分子眼科基材のスラリー組成物及び研磨方法 Expired - Fee Related JP5193852B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/102,555 US7294044B2 (en) 2005-04-08 2005-04-08 Slurry composition and method for polishing organic polymer-based ophthalmic substrates
US11/102,555 2005-04-08
PCT/US2006/006306 WO2006110224A2 (en) 2005-04-08 2006-02-22 Slurry composition and method for polishing organic polymer-based ophthalmic substrates

Publications (3)

Publication Number Publication Date
JP2008537704A JP2008537704A (ja) 2008-09-25
JP2008537704A5 JP2008537704A5 (enExample) 2012-06-28
JP5193852B2 true JP5193852B2 (ja) 2013-05-08

Family

ID=37083726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008505303A Expired - Fee Related JP5193852B2 (ja) 2005-04-08 2006-02-22 有機高分子眼科基材のスラリー組成物及び研磨方法

Country Status (7)

Country Link
US (1) US7294044B2 (enExample)
EP (1) EP1868769B1 (enExample)
JP (1) JP5193852B2 (enExample)
CN (1) CN101541910B (enExample)
AT (1) ATE527328T1 (enExample)
TW (1) TWI391350B (enExample)
WO (1) WO2006110224A2 (enExample)

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US20100330884A1 (en) * 2009-06-29 2010-12-30 Ferro Corporation Diatomaceous Earth-Containing Slurry Composition And Method For Polishing Organic Polymer-Based Ophthalmic Substrates Using The Same
US8449636B2 (en) * 2010-08-09 2013-05-28 Ferro Corporation Easy rinsing polishing composition for polymer-based surfaces
WO2012119154A2 (en) * 2011-03-03 2012-09-07 Wisys Technology Foundation Thermodynamic solutions of metal oxides and metal chalcogenides and mixed metal oxides and chalcogenides
US8821215B2 (en) * 2012-09-07 2014-09-02 Cabot Microelectronics Corporation Polypyrrolidone polishing composition and method
US9633831B2 (en) 2013-08-26 2017-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same
WO2017011115A1 (en) 2015-07-10 2017-01-19 Ferro Corporation Slurry composition and additives and method for polishing organic polymer-based ophthalmic substrates
KR102463863B1 (ko) * 2015-07-20 2022-11-04 삼성전자주식회사 연마용 조성물 및 이를 이용한 반도체 장치의 제조 방법
JP6758984B2 (ja) * 2016-07-29 2020-09-23 キヤノン株式会社 インクジェット記録装置及びクリーニング方法
WO2018038885A1 (en) 2016-08-26 2018-03-01 Ferro Corporation Slurry composition and method of selective silica polishing
US10037889B1 (en) 2017-03-29 2018-07-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films
CN107299385A (zh) * 2017-05-18 2017-10-27 当涂县宏宇金属炉料有限责任公司 一种改善不锈钢表面特性的电化学处理方法
CN109015204B (zh) * 2018-08-29 2020-11-27 包头市利晨科技有限公司 一种适用于cr39树脂镜片的抛光方法
KR102837555B1 (ko) 2018-12-14 2025-07-24 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물 및 합성 수지 연마 방법
CN113755842B (zh) * 2021-10-18 2024-04-02 德米特（苏州）电子环保材料有限公司 一种金属抛光液及其制备方法和应用
JP2024060831A (ja) 2022-10-20 2024-05-07 山口精研工業株式会社 プラスチックレンズ用研磨剤組成物

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Also Published As

Publication number Publication date
TW200642978A (en) 2006-12-16
JP2008537704A (ja) 2008-09-25
CN101541910A (zh) 2009-09-23
EP1868769A2 (en) 2007-12-26
WO2006110224A2 (en) 2006-10-19
ATE527328T1 (de) 2011-10-15
CN101541910B (zh) 2012-09-05
EP1868769B1 (en) 2011-10-05
WO2006110224A3 (en) 2009-04-16
US20060228999A1 (en) 2006-10-12
EP1868769A4 (en) 2010-03-10
US7294044B2 (en) 2007-11-13
TWI391350B (zh) 2013-04-01

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