JP7413277B2 - 研磨用組成物及び合成樹脂研磨方法 - Google Patents
研磨用組成物及び合成樹脂研磨方法 Download PDFInfo
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- JP7413277B2 JP7413277B2 JP2020559320A JP2020559320A JP7413277B2 JP 7413277 B2 JP7413277 B2 JP 7413277B2 JP 2020559320 A JP2020559320 A JP 2020559320A JP 2020559320 A JP2020559320 A JP 2020559320A JP 7413277 B2 JP7413277 B2 JP 7413277B2
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- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical class CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical class C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- ODBLHEXUDAPZAU-UHFFFAOYSA-N threo-D-isocitric acid Natural products OC(=O)C(O)C(C(O)=O)CC(O)=O ODBLHEXUDAPZAU-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- OUYCCCASQSFEME-UHFFFAOYSA-N tyrosine Natural products OC(=O)C(N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-UHFFFAOYSA-N 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
(実施例1)
実施例1~1~1-21においては、アルミナ、ポリビニルピロリドン、0.01質量%以上15質量%以下の価数が1価の酸のアルミニウム塩である研磨促進剤、及び水を混合して研磨用組成物を調製した。実施例1-1~1-21の各研磨用組成物中のアルミナ、ポリビニルピロリドン、研磨促進剤の含有量、アルミナの体積基準の平均粒子径および水溶性ポリマーの重量平均分子量、各研磨組成物のゼータ電位の正負およびpHは表1に示すとおりである。比較例1-1~1-25においては、表2に示されるアルミナ、水溶性ポリマー、研磨促進剤及び水を混合して研磨用組成物を調製した。pHは、硝酸、または水酸化カリウムを適宜加えて調整した。なお、アルミナの体積基準の平均粒子径は株式会社堀場製作所社製のレーザー回折/散乱式粒子径分布測定装置LA-950で、研磨用組成物のゼータ電位は協和界面化学株式会社製の電気音響法高濃度ゼータ電位計ZetaProbeで正負を測定し、pHは株式会社堀場製作所社製のpHメーターF-72で測定した。
研磨対象物:アクリル樹脂(ロックウェル硬度M85)
研磨機:日本エンギス株式会社製EJ-380IN
研磨パッド:フジボウ愛媛株式会社製スエードパッドN17
研磨荷重:150g/cm2(14.7kPa)
研磨時間:3分
研磨用組成物の使用量:45ml
研磨用組成物の供給量:15ml/分
実施例2-1においては、表3に示されるシリカ、ポリビニルピロリドン、0.01質量%以上15質量%以下の価数が1価の酸のアルミニウム塩である研磨促進剤、及び水を混合して研磨用組成物を調製した。各研磨用組成物中のシリカ、ポリビニルピロリドン、研磨促進剤の含有量、アルミナの体積基準の平均粒子径および水溶性ポリマーの重量平均分子量、各研磨組成物のゼータ電位の正負およびpHは表3に示すとおりである。
比較例2-1~2-3においては、表3に示されるシリカ、水溶性ポリマー、研磨促進剤及び水を混合して研磨用組成物を調製した。pHは、硝酸、または水酸化カリウムを適宜加えて調整した。なお、シリカの体積基準の平均粒子径は株式会社堀場製作所社製のレーザー回折/散乱式粒子径分布測定装置LA-950で、研磨用組成物のゼータ電位は協和界面化学株式会社製の電気音響法高濃度ゼータ電位計ZetaProbeで正負を測定し、pHは株式会社堀場製作所社製のpHメーターF-72で測定した。評価条件は実施例1と同様の条件とし、評価を行った。
実施例3-1および3-2、並びに比較例3-1~3-3では、実施例1と同様に、表4に示されるアルミナ、水溶性ポリマー、研磨促進剤、及び水を混合して研磨用組成物を調製した。得られた研磨用組成物を使用して以下の研磨条件にてポリカーボネート樹脂を研磨した。なお、表4には、表1及び表2と同様に、各研磨用組成物中のアルミナ、ポリビニルピロリドン、価数が1価の酸のアルミニウム塩の含有量、アルミナの体積基準の平均粒子径および水溶性ポリマーの重量平均分子量、各研磨組成物のゼータ電位およびpHが示されている。
研磨対象物:ポリカーボネート樹脂(ロックウェル硬度M70)
研磨機:日本エンギス株式会社製EJ-380IN
研磨パッド:フジボウ愛媛株式会社製スエードパッドN17
研磨荷重:150g/cm2(14.7kPa)
研磨時間:3分
研磨用組成物の使用量:45ml
研磨用組成物の供給量:15ml/分
実施例4-1~4-2、並びに比較例4-1~4-6では、実施例1、実施例2と同様に、表5に示されるアルミナまたはシリカ、水溶性ポリマー、研磨促進剤、及び水を混合して研磨用組成物を調製した。得られた研磨用組成物を使用して以下の研磨条件にてポリイミド樹脂を研磨した。
研磨対象物:ポリイミド樹脂(ロックウェル硬度M50)
研磨機:日本エンギス株式会社製EJ-380IN
研磨パッド:フジボウ愛媛株式会社製スエードパッドN17
研磨荷重:200g/cm2(14.7kPa)
研磨時間:30分
研磨用組成物の使用量:45ml
研磨用組成物の供給量:15ml/分
なお、表5には、表1と同様に、各研磨用組成物中のアルミナまたはシリカ、ポリビニルピロリドン、価数が1価の酸のアルミニウム塩の含有量、アルミナの体積基準の平均粒子径および水溶性ポリマーの重量平均分子量、各研磨組成物のゼータ電位およびpHが示されている。
実施例5-1、並びに比較例5-1~5-3では、実施例1と同様に、表6に示されるアルミナ、水溶性ポリマー、研磨促進剤、及び水を混合して研磨用組成物を調製した。得られた研磨用組成物を使用して以下の研磨条件にてポリテトラフルオロエチレン(PTFE)を研磨した。
研磨対象物:ポリテトラフルオロエチレン(ロックウェル硬度R20)
研磨機:日本エンギス株式会社製EJ-380IN
研磨パッド:フジボウ愛媛株式会社製スエードパッドN17
研磨荷重:150g/cm2(14.7kPa)
研磨時間:3分
研磨用組成物の使用量:45ml
研磨用組成物の供給量:15ml/分
実施例6-1、並びに比較例6-1~6-3では、実施例1と同様に、表7に示されるアルミナ、水溶性ポリマー、研磨促進剤、及び水を混合して研磨用組成物を調製した。得られた研磨用組成物を使用して以下の研磨条件にてエポキシ樹脂を研磨した。
研磨対象物:エポキシ樹脂(ロックウェル硬度M80-110)
研磨機:日本エンギス株式会社製EJ-380IN
研磨パッド:フジボウ愛媛株式会社製スエードパッドN17
研磨荷重:150g/cm2(14.7kPa)
研磨時間:3分
研磨用組成物の使用量:45ml
研磨用組成物の供給量:15ml/分
Claims (11)
- 砥粒、0.01質量%以上15質量%以下の価数が1価の酸のアルミニウム塩、ピロリドン化合物又はカプロラクタム化合物、及び水を含有し、pHが3.0以上3.4以下である、研磨用組成物。
- 前記砥粒がアルミナである、請求項1に記載の研磨用組成物。
- 前記アルミナの体積基準の平均粒子径が0.1μm以上0.5μm以下である、請求項2に記載の研磨用組成物。
- 前記アルミナのBET比表面積が10m2/g以上50m2/g以下である、請求項2または3に記載の研磨用組成物。
- 前記アルミナのα化率が50%以上である、請求項2~4のいずれか1項に記載の研磨用組成物。
- 前記砥粒がシリカである、請求項1に記載の研磨用組成物。
- 前記シリカの体積基準の平均粒子径が0.02μm以上0.3μm以下である、請求項6に記載の研磨用組成物。
- 前記価数が1価の酸のアルミニウム塩の含有量が5質量%以上15質量%以下である、請求項1~7のいずれか1項に記載の研磨用組成物。
- 前記価数が1価の酸のアルミニウム塩が硝酸アルミニウムまたは塩化アルミニウムから選ばれる少なくとも1種である、請求項1~8のいずれか1項に記載の研磨用組成物。
- 合成樹脂の研磨に使用される請求項1~9のいずれか1項に記載の研磨用組成物。
- 請求項1~10のいずれか1項に記載の研磨用組成物を用いて合成樹脂研磨する、合成樹脂研磨方法。
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PCT/JP2019/048762 WO2020122191A1 (ja) | 2018-12-14 | 2019-12-12 | 研磨用組成物及び合成樹脂研磨方法 |
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JP2001342456A (ja) | 2000-01-18 | 2001-12-14 | Praxair St Technol Inc | 研磨性スラリー |
JP2008537704A (ja) | 2005-04-08 | 2008-09-25 | フエロ コーポレーション | 有機高分子眼科基材のスラリー組成物及び研磨方法 |
CN102516882A (zh) | 2011-12-19 | 2012-06-27 | 德米特(苏州)电子环保材料有限公司 | 一种氧化铝基质的树脂镜片抛光液制作方法 |
CN108188863A (zh) | 2017-12-27 | 2018-06-22 | 重庆市华阳光学仪器有限公司 | 一种望远镜镜片加工工艺 |
JP2018533071A (ja) | 2015-07-10 | 2018-11-08 | フエロ コーポレーション | 有機ポリマー系眼用基材を研磨するためのスラリー組成物及び方法、並びに眼用レンズ |
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JP3582017B2 (ja) | 1993-06-25 | 2004-10-27 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびプラスチック研磨用組成物 |
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JP2001342456A (ja) | 2000-01-18 | 2001-12-14 | Praxair St Technol Inc | 研磨性スラリー |
JP2008537704A (ja) | 2005-04-08 | 2008-09-25 | フエロ コーポレーション | 有機高分子眼科基材のスラリー組成物及び研磨方法 |
CN102516882A (zh) | 2011-12-19 | 2012-06-27 | 德米特(苏州)电子环保材料有限公司 | 一种氧化铝基质的树脂镜片抛光液制作方法 |
JP2018533071A (ja) | 2015-07-10 | 2018-11-08 | フエロ コーポレーション | 有機ポリマー系眼用基材を研磨するためのスラリー組成物及び方法、並びに眼用レンズ |
CN108188863A (zh) | 2017-12-27 | 2018-06-22 | 重庆市华阳光学仪器有限公司 | 一种望远镜镜片加工工艺 |
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US20220025212A1 (en) | 2022-01-27 |
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