JP2008527413A5 - - Google Patents
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- Publication number
- JP2008527413A5 JP2008527413A5 JP2007549456A JP2007549456A JP2008527413A5 JP 2008527413 A5 JP2008527413 A5 JP 2008527413A5 JP 2007549456 A JP2007549456 A JP 2007549456A JP 2007549456 A JP2007549456 A JP 2007549456A JP 2008527413 A5 JP2008527413 A5 JP 2008527413A5
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- display
- acrylate
- hard coat
- acrylate monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 125000003118 aryl group Chemical group 0.000 claims description 19
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 18
- 239000000178 monomer Substances 0.000 claims description 12
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 10
- 239000011593 sulfur Substances 0.000 claims description 10
- 239000002105 nanoparticle Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 239000003431 cross linking reagent Substances 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical class O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 0 CNC(C(*)=C)=O Chemical compound CNC(C(*)=C)=O 0.000 description 5
- BIYKAFTXSGVFGA-UHFFFAOYSA-N C=CC(O)=O.C=CC(O)=O.S Chemical compound C=CC(O)=O.C=CC(O)=O.S BIYKAFTXSGVFGA-UHFFFAOYSA-N 0.000 description 4
- 239000004971 Cross linker Substances 0.000 description 3
- -1 acryloyloxy-ethylsulfanyl Chemical group 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- FTYRSURTZHQSDS-UHFFFAOYSA-N 2-[7-(2-prop-2-enoyloxyethylsulfanyl)naphthalen-2-yl]sulfanylethyl prop-2-enoate Chemical group C1=CC(SCCOC(=O)C=C)=CC2=CC(SCCOC(=O)C=C)=CC=C21 FTYRSURTZHQSDS-UHFFFAOYSA-N 0.000 description 1
- ZUPCBOLPHAENQR-UHFFFAOYSA-N C=CC(=O)OCC(CSC1=CC2=CC=CC=C2C=C1)CSC3=CC4=CC=CC=C4C=C3 Chemical compound C=CC(=O)OCC(CSC1=CC2=CC=CC=C2C=C1)CSC3=CC4=CC=CC=C4C=C3 ZUPCBOLPHAENQR-UHFFFAOYSA-N 0.000 description 1
- QYZQRQYHIRNMQA-UHFFFAOYSA-N [2,2-bis(naphthalen-2-ylsulfanylmethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C1=CC=CC2=CC(SCC(COC(=O)C=C)(CSC=3C=C4C=CC=CC4=CC=3)COC(=O)C=C)=CC=C21 QYZQRQYHIRNMQA-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/026,573 US7491441B2 (en) | 2004-12-30 | 2004-12-30 | High refractive index, durable hard coats |
| PCT/US2005/045876 WO2006073773A2 (en) | 2004-12-30 | 2005-12-19 | High refractive index, durable hard coats |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008527413A JP2008527413A (ja) | 2008-07-24 |
| JP2008527413A5 true JP2008527413A5 (https=) | 2009-02-12 |
Family
ID=36355357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007549456A Withdrawn JP2008527413A (ja) | 2004-12-30 | 2005-12-19 | 高屈折率、耐久性ハードコート |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7491441B2 (https=) |
| EP (1) | EP1831728B1 (https=) |
| JP (1) | JP2008527413A (https=) |
| KR (1) | KR20070089979A (https=) |
| CN (1) | CN100555002C (https=) |
| AT (1) | ATE438112T1 (https=) |
| DE (1) | DE602005015757D1 (https=) |
| TW (1) | TW200630229A (https=) |
| WO (1) | WO2006073773A2 (https=) |
Families Citing this family (69)
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| DE112006002940T5 (de) | 2005-11-05 | 2008-12-11 | 3M Innovative Properties Co., St. Paul | Optische Filme, umfassend einen hohen Brechungsindex aufweisende und antireflektierende Beschichtungen |
| JP2007314773A (ja) * | 2006-04-28 | 2007-12-06 | Mitsubishi Chemicals Corp | 高屈折率粒子含有樹脂組成物 |
| US20070285778A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
| US20070285779A1 (en) * | 2006-06-13 | 2007-12-13 | Walker Christopher B | Optical films comprising high refractive index and antireflective coatings |
| US20080145545A1 (en) * | 2006-12-15 | 2008-06-19 | Bret Ja Chisholm | Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom |
| KR20090115797A (ko) * | 2007-02-20 | 2009-11-06 | 바스프 에스이 | 고굴절률 단량체, 이의 조성물 및 용도 |
| CN101611080B (zh) * | 2007-02-26 | 2011-12-28 | 贝卡尔特股份有限公司 | 含纳米颗粒的层状结构 |
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| KR101535676B1 (ko) * | 2008-10-28 | 2015-07-09 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치 |
| CN101941001B (zh) | 2009-07-03 | 2014-04-02 | 3M创新有限公司 | 亲水涂层、制品、涂料组合物和方法 |
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| US6653425B1 (en) | 2002-11-27 | 2003-11-25 | Corning Incorporated | High refractive index and high photosensitive optical materials and method for preparing the same |
| JP4404336B2 (ja) | 2003-02-20 | 2010-01-27 | 大日本印刷株式会社 | 反射防止積層体 |
| US7282272B2 (en) | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
| US6998425B2 (en) * | 2003-12-23 | 2006-02-14 | General Electric Company | UV curable coating compositions and uses thereof |
-
2004
- 2004-12-30 US US11/026,573 patent/US7491441B2/en not_active Expired - Fee Related
-
2005
- 2005-12-19 KR KR1020077014985A patent/KR20070089979A/ko not_active Ceased
- 2005-12-19 CN CNB2005800456278A patent/CN100555002C/zh not_active Expired - Fee Related
- 2005-12-19 WO PCT/US2005/045876 patent/WO2006073773A2/en not_active Ceased
- 2005-12-19 DE DE200560015757 patent/DE602005015757D1/de not_active Expired - Lifetime
- 2005-12-19 AT AT05857124T patent/ATE438112T1/de not_active IP Right Cessation
- 2005-12-19 EP EP20050857124 patent/EP1831728B1/en not_active Expired - Lifetime
- 2005-12-19 JP JP2007549456A patent/JP2008527413A/ja not_active Withdrawn
- 2005-12-29 TW TW094147350A patent/TW200630229A/zh unknown
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