JP2008174741A5 - - Google Patents
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- Publication number
- JP2008174741A5 JP2008174741A5 JP2007329086A JP2007329086A JP2008174741A5 JP 2008174741 A5 JP2008174741 A5 JP 2008174741A5 JP 2007329086 A JP2007329086 A JP 2007329086A JP 2007329086 A JP2007329086 A JP 2007329086A JP 2008174741 A5 JP2008174741 A5 JP 2008174741A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- formula
- hydrocarbon group
- group
- semiconductor lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims description 25
- 238000001459 lithography Methods 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000002723 alicyclic group Chemical group 0.000 claims description 6
- 238000004090 dissolution Methods 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 16
- 238000004519 manufacturing process Methods 0.000 claims 12
- 239000000178 monomer Substances 0.000 claims 12
- 239000004065 semiconductor Substances 0.000 claims 12
- 238000006116 polymerization reaction Methods 0.000 claims 9
- 229910052731 fluorine Inorganic materials 0.000 claims 8
- 125000001153 fluoro group Chemical group F* 0.000 claims 8
- 239000007788 liquid Substances 0.000 claims 8
- 238000007789 sealing Methods 0.000 claims 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- 229910052717 sulfur Inorganic materials 0.000 claims 3
- 125000004434 sulfur atom Chemical group 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000004292 cyclic ethers Chemical group 0.000 claims 2
- 125000000686 lactone group Chemical group 0.000 claims 2
- 239000003505 polymerization initiator Substances 0.000 claims 2
- 238000009835 boiling Methods 0.000 claims 1
- 238000004581 coalescence Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000000379 polymerizing effect Effects 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- -1 specifically Chemical group 0.000 description 4
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 3
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical group CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 description 3
- SNRUBQQJIBEYMU-NJFSPNSNSA-N dodecane Chemical group CCCCCCCCCCC[14CH3] SNRUBQQJIBEYMU-NJFSPNSNSA-N 0.000 description 3
- 230000002401 inhibitory effect Effects 0.000 description 3
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 3
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KKXHCBOPXFEJCO-UHFFFAOYSA-N CC[NH+](C(CN)(N)OC)[O-] Chemical compound CC[NH+](C(CN)(N)OC)[O-] KKXHCBOPXFEJCO-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007329086A JP5308660B2 (ja) | 2006-12-22 | 2007-12-20 | 半導体リソグラフィー用重合体の製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006346454 | 2006-12-22 | ||
| JP2006346454 | 2006-12-22 | ||
| JP2007329086A JP5308660B2 (ja) | 2006-12-22 | 2007-12-20 | 半導体リソグラフィー用重合体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008174741A JP2008174741A (ja) | 2008-07-31 |
| JP2008174741A5 true JP2008174741A5 (OSRAM) | 2011-01-13 |
| JP5308660B2 JP5308660B2 (ja) | 2013-10-09 |
Family
ID=39562205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007329086A Active JP5308660B2 (ja) | 2006-12-22 | 2007-12-20 | 半導体リソグラフィー用重合体の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8030419B2 (OSRAM) |
| JP (1) | JP5308660B2 (OSRAM) |
| KR (1) | KR101446819B1 (OSRAM) |
| TW (1) | TWI471337B (OSRAM) |
| WO (1) | WO2008078410A1 (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5631550B2 (ja) * | 2009-02-27 | 2014-11-26 | 丸善石油化学株式会社 | フォトレジスト用共重合体の製造方法 |
| JP2011026372A (ja) * | 2009-07-21 | 2011-02-10 | Maruzen Petrochem Co Ltd | 有機反射防止膜用共重合体の製造方法 |
| TWI648270B (zh) * | 2014-01-31 | 2019-01-21 | 日商三菱瓦斯化學股份有限公司 | （甲基）丙烯酸酯化合物、（甲基）丙烯酸共聚物及包含此之感光性樹脂組成物 |
| CN114682182A (zh) * | 2020-12-28 | 2022-07-01 | 中昊晨光化工研究院有限公司 | 一种用于气相法生产聚合物的装置系统和方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| JPS60164200A (ja) | 1984-02-03 | 1985-08-27 | 日本セメント株式会社 | Ａν−ｆｏ爆薬による低振動、低騒音破砕方法 |
| JPS60164200U (ja) * | 1984-04-11 | 1985-10-31 | 帝人化成株式会社 | 調圧液封装置 |
| US4603101A (en) | 1985-09-27 | 1986-07-29 | General Electric Company | Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials |
| DE3817012A1 (de) | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
| JP2964733B2 (ja) | 1991-10-23 | 1999-10-18 | 三菱電機株式会社 | パターン形成材料 |
| KR940003917A (ko) * | 1992-08-20 | 1994-03-14 | 고지마 아끼로 | 반응 제어방법 |
| JP3310061B2 (ja) * | 1992-08-20 | 2002-07-29 | ダイセル化学工業株式会社 | 反応制御方法 |
| JP3751065B2 (ja) | 1995-06-28 | 2006-03-01 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
| JP3380128B2 (ja) | 1996-11-29 | 2003-02-24 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
| JP3297272B2 (ja) | 1995-07-14 | 2002-07-02 | 富士通株式会社 | レジスト組成物及びレジストパターンの形成方法 |
| JP3712218B2 (ja) | 1997-01-24 | 2005-11-02 | 東京応化工業株式会社 | 化学増幅型ホトレジスト組成物 |
| US6471869B1 (en) * | 1998-02-27 | 2002-10-29 | Mitsubishi Rayon Co., Ltd. | Device and method for processing crude oil |
| JP4164942B2 (ja) | 1998-05-29 | 2008-10-15 | Ｊｓｒ株式会社 | アクリル系共重合体およびそれを含有する反射防止膜形成組成物並びにレジスト膜の形成方法 |
| JP3042618B2 (ja) | 1998-07-03 | 2000-05-15 | 日本電気株式会社 | ラクトン構造を有する（メタ）アクリレート誘導体、重合体、フォトレジスト組成物、及びパターン形成方法 |
| JP2000313779A (ja) | 1999-04-30 | 2000-11-14 | Jsr Corp | 反射防止膜形成組成物 |
| KR100359862B1 (ko) | 1999-12-23 | 2002-11-09 | 주식회사 하이닉스반도체 | 난반사 방지막용 중합체와 그 제조방법 |
| KR100549574B1 (ko) * | 1999-12-30 | 2006-02-08 | 주식회사 하이닉스반도체 | 유기 반사 방지막용 중합체 및 그의 제조방법 |
| JP4135848B2 (ja) | 2000-02-28 | 2008-08-20 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| JP4654544B2 (ja) | 2000-07-12 | 2011-03-23 | 日産化学工業株式会社 | リソグラフィー用ギャップフィル材形成組成物 |
| TWI349831B (en) * | 2003-02-20 | 2011-10-01 | Maruzen Petrochem Co Ltd | Resist polymer and method for producing the polymer |
| JP3720827B2 (ja) * | 2003-02-20 | 2005-11-30 | 丸善石油化学株式会社 | レジストポリマーの製造方法 |
| US7696292B2 (en) * | 2003-09-22 | 2010-04-13 | Commonwealth Scientific And Industrial Research Organisation | Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography |
| US7408013B2 (en) * | 2003-09-23 | 2008-08-05 | Commonwealth Scientific And Industrial Research Organization | Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| KR101191687B1 (ko) | 2004-04-30 | 2012-10-16 | 마루젠 세끼유가가꾸 가부시키가이샤 | 반도체 리소그래피용 공중합체와 그 제조 방법, 및 조성물 |
| JP4484690B2 (ja) * | 2004-12-21 | 2010-06-16 | ダイセル化学工業株式会社 | フォトレジスト用樹脂の製造方法 |
| JP4635614B2 (ja) | 2005-01-17 | 2011-02-23 | Ｊｓｒ株式会社 | 共重合体および液浸上層膜用樹脂組成物 |
| JP4552697B2 (ja) | 2005-03-03 | 2010-09-29 | Ｊｓｒ株式会社 | 液浸上層膜用重合体および液浸上層膜用樹脂組成物 |
| JP4731200B2 (ja) * | 2005-05-10 | 2011-07-20 | 丸善石油化学株式会社 | 半導体リソグラフィー用共重合体の製造方法 |
| JP2006343492A (ja) | 2005-06-08 | 2006-12-21 | Fujifilm Holdings Corp | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
-
2007
- 2007-12-20 KR KR1020097012579A patent/KR101446819B1/ko active Active
- 2007-12-20 JP JP2007329086A patent/JP5308660B2/ja active Active
- 2007-12-20 US US12/519,371 patent/US8030419B2/en active Active
- 2007-12-20 WO PCT/JP2007/001447 patent/WO2008078410A1/ja not_active Ceased
- 2007-12-21 TW TW96149582A patent/TWI471337B/zh active
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